Abstract: The invention relates to a filling machine (1, 1?) for filling packages (2) with fluid products with a continuously circulating transport device (14) for transporting the packages (2) through the filling machine (1, 1?), comprising a plurality of cells (15) for receiving the packages (2), wherein a supply device (13) for supplying packages (2) to be filled is assigned to a supply region (16) of the transport device (14), and an output device (27) for outputting the packages (2) is assigned to an output region (28) of the transport device (14), wherein a filling region (17) is provided between the supply region (16) and the output region (28) in the transport direction (14) of the transport device (14), and a return region (29) of the respective transport device (14) is provided between the output region (28) and the supply region (16), and wherein at least one nozzle (38, 38?) for spraying the cells (15) with a cleaning fluid (40) is associated with the return region (29) of the transport device (14).

Abstract: The invention relates to a filling machine (1, 1?) for filling packages (2) with fluid products with a continuously circulating transport device (14) for transporting the packages (2) through the filling machine (1, 1?), comprising a plurality of cells (15) for receiving the packages (2), wherein a supply device (13) for supplying packages (2) to be filled is assigned to a supply region (16) of the transport device (14), and an output device (27) for outputting the packages (2) is assigned to an output region (28) of the transport device (14), wherein a filling region (17) is provided between the supply region (16) and the output region (28) in the transport direction (14) of the transport device (14), and a return region (29) of the respective transport device (14) is provided between the output region (28) and the supply region (16), and wherein at least one nozzle (38, 38?) for spraying the cells (15) with a cleaning fluid (40) is associated with the return region (29) of the transport device (14).

Abstract: The present invention relates to a container that delimits a container interior from the surroundings and that is formed at least in part from a sheet-like composite.

Abstract: A method for improving computation efficiency for diffraction signals in optical metrology is described. The method includes simulating a set of diffraction orders for a three-dimensional structure. The diffraction orders within the set of diffraction orders are then prioritized. The set of diffraction orders is truncated to provide a truncated set of diffraction orders based on the prioritizing. Finally, a simulated spectrum is provided based on the truncated set of diffraction orders.

Abstract: Disclosed herein is a container featuring at least one hole, and process for making the same. The container is prepared from a sheet-like composite having (i) a polymer outer layer facing the surroundings; (ii) a carrier layer following the polymer outer layer in the direction of the container interior; (iii) a barrier layer following the carrier layer in the direction of the container interior; (iv) an adhesive layer following the barrier layer in the direction of the container interior; and (v) a polymer inner layer following the adhesive layer in the direction of the container interior. The sheet-like composite is prepared by laminating the individual layers, wherein at least the polymer inner layer or the adhesive layer are stretched during application.

Abstract: Disclosed herein is a container featuring at least one hole, and process for making the same. The container is prepared from a sheet-like composite having (i) a polymer outer layer facing the surroundings; (ii) a carrier layer following the polymer outer layer in the direction of the container interior; (iii) a barrier layer following the carrier layer in the direction of the container interior; (iv) an adhesive layer following the barrier layer in the direction of the container interior; and (v) a polymer inner layer following the adhesive layer in the direction of the container interior. The sheet-like composite is prepared by laminating the individual layers, wherein at least the polymer inner layer or the adhesive layer are stretched during application.

Abstract: Provided are techniques for numerically integrating an intensity distribution function over a numerical aperture in a manner dependent on a determination of whether the numerical aperture spans a Rayleigh singularity. Where a singularity exists, Gaussian quadrature (cubature) is performed using a set of weights and points (nodes) that account for the effect of the Wood anomaly present within the aperture space. The numerical aperture may be divided into subregions separated by curves where the Wood anomaly condition is satisfied. Each subregion is then numerically integrated and a weighted sum of the subregion contributions is the estimate of the integral. Alternatively, generalized Gaussian quadrature (cubature) is performed where an analytical polynomial function which accounts for the effect of the Wood anomaly present within the aperture space is integrated. Points and nodes generated from a fit of the analytical polynomial function are then used for integration of the intensity distribution function.

Abstract: The present invention relates to a container that delimits a container interior from the surroundings and that is formed at least in part from a sheet-like composite.

Abstract: The present invention relates to a process for the production of a container that delimits a container interior from the surroundings and that is formed at least in part from a sheet-like composite.

Abstract: The present invention relates to a process for the production of a container that delimits a container interior from the surroundings and that is formed at least in part from a sheet-like composite.

Abstract: Diffraction modeling of a diffracting structure employing at least two distinct differential equation solution methods. In an embodiment, a rigorous coupled wave (RCW) method and a coordinate transform (C) method are coupled with a same S-matrix algorithm to provide a model profile for a scatterometry measurement of a diffracting structure having unknown parameters. In an embodiment, a rigorous coupled wave (RCW) method and a coordinate transform (C) method generate a modeled angular spectrum of diffracted orders as a prediction for how a diffracting photolithographic mask images onto a substrate.

Abstract: To train a machine learning system, a set of different values of one or more photoresist parameters, which characterize behavior of photoresist when the photoresist undergoes processing steps in a wafer application, is obtained. A set of diffraction signals is obtained using the set of different values of the one or more photoresist parameters. The machine learning system is trained using the set of measured diffraction signals as inputs to the machine learning system and the set of different values of the one or more photoresist parameters as expected outputs of the machine learning system.

Abstract: Diffraction modeling of a diffracting structure employing at least two distinct differential equation solution methods. In an embodiment, a rigorous coupled wave (RCW) method and a coordinate transform (C) method are coupled with a same S-matrix algorithm to provide a model profile for a scatterometry measurement of a diffracting structure having unknown parameters. In an embodiment, a rigorous coupled wave (RCW) method and a coordinate transform (C) method generate a modeled angular spectrum of diffracted orders as a prediction for how a diffracting photolithographic mask images onto a substrate.

Abstract: To generate a simulated diffraction signal, one or more values of one or more photoresist parameters, which characterize behavior of photoresist when the photoresist undergoes processing steps in a wafer application, are obtained. One or more values of one or more profile parameters are derived using the one or more values of the one or more photoresist parameters. The one or more profile parameters characterize one or more geometric features of the structure. A simulated diffraction signal is generated using the one or more values of the one or more profile parameters. The simulated diffraction signal characterizes behavior of light diffracted from the structure. The generated simulated diffraction signal is associated with the one or more values of the one or more photoresist parameters.

Abstract: A method for improving computation efficiency for diffraction signals in optical metrology is described. The method includes simulating a set of diffraction orders for a three-dimensional structure. The diffraction orders within the set of diffraction orders are then prioritized. The set of diffraction orders is truncated to provide a truncated set of diffraction orders based on the prioritizing. Finally, a simulated spectrum is provided based on the truncated set of diffraction orders.

Abstract: Embodiments of an apparatus for deriving an iso-dense bias are generally described herein. Other embodiments may be described and claimed.

Abstract: Eigensolutions for use in determining the profile of a structure formed on a semiconductor wafer can be approximated by obtaining a known set of eigenvectors associated with a first section of a hypothetical profile of the structure, where the known set of eigenvectors is used to generate a simulated diffraction signal for the hypothetical profile. A known characteristic matrix associated with a second section of a hypothetical profile is obtained, and an approximated set of eigenvalues for the second section is determined based on the known set of eigenvectors associated with the first section and the known characteristic matrix associated with the second section.

Abstract: An optical metrology model for a structure to be formed on a wafer is developed by characterizing a top-view profile and a cross-sectional view profile of the structure using profile parameters. The profile parameters of the top-view profile and the cross-sectional view profile are integrated together into the optical metrology model. The profile parameters of the optical metrology model are saved.

Abstract: Embodiments of controlling a fabrication process using an iso-dense bias are generally described herein. Other embodiments may be described and claimed.

Abstract: The profile of a single feature formed on a wafer can be determined by obtaining an optical signature of the single feature using a beam of light focused on the single feature. The obtained optical signature can then be compared to a set of simulated optical signatures, where each simulated optical signature corresponds to a hypothetical profile of the single feature and is modeled based on the hypothetical profile.