Abstract: A particle beam system is configured to perform a method which includes: preventing at least one of generation of induced particles and incidence of the induced particles onto a detection area of a detector configured to output a detection signal; generating a residual signal by processing the detection signal outputted during the preventing using a control value; adjusting, based on the residual signal, the control value so that the residual signal takes a value within a predetermined limited residual-signal target range; directing a primary particle beam onto an object while allowing generation of the induced particles due to the primary particle beam and incidence of the induced particles onto the detection area; generating a result signal by processing the detection signal outputted during the directing using the control value.

Abstract: An electron beam microscope includes an energy-sensitive detector to detect backscattered electrons and a signal processor for processing detection signals of the detector. The signal processor includes an analog amplifier. The signal processor also includes a window comparator having a signal input connected to an output of the analog amplifier. A signal generated at an output of the signal processor is generated based on a signal provided at an output the window comparator. The window comparator is configured to output a predetermined signal only if the amplified signal supplied to its signal input is less than or equal to an upper threshold and greater than or equal to a lower threshold.

Abstract: The system described herein relates to a high-voltage supply unit for providing an output voltage for a particle beam apparatus, wherein the particle beam apparatus is embodied as, for example, an electron beam apparatus and/or an ion beam apparatus. The system described herein is based on the fact that it was recognized that a bipolar voltage supply unit can be formed by means of a unipolar first current source and a unipolar second current source, said bipolar voltage supply unit enabling a load current in two directions. The high-voltage supply unit according to the system described herein can be operated in the 4-quadrant operation. In the 4-quadrant operation, a first voltage source for supplying the first current source and a second voltage source for supplying the second current source are embodied as different voltage sources.

Abstract: An electron beam microscope includes an energy-sensitive detector to detect backscattered electrons and a signal processor for processing detection signals of the detector. The signal processor includes an analog amplifier. The signal processor also includes a window comparator having a signal input connected to an output of the analog amplifier. A signal generated at an output of the signal processor is generated based on a signal provided at an output the window comparator. The window comparator is configured to output a predetermined signal only if the amplified signal supplied to its signal input is less than or equal to an upper threshold and greater than or equal to a lower threshold.

Abstract: The system described herein relates to a high-voltage supply unit for providing an output voltage for a particle beam apparatus, wherein the particle beam apparatus is embodied as, for example, an electron beam apparatus and/or an ion beam apparatus. The system described herein is based on the fact that it was recognized that a bipolar voltage supply unit can be formed by means of a unipolar first current source and a unipolar second current source, said bipolar voltage supply unit enabling a load current in two directions. The high-voltage supply unit according to the system described herein can be operated in the 4-quadrant operation. In the 4-quadrant operation, a first voltage source for supplying the first current source and a second voltage source for supplying the second current source are embodied as different voltage sources.

Abstract: The system described herein relates to a high-voltage supply unit for providing an output voltage for a particle beam apparatus, wherein the particle beam apparatus is embodied as, for example, an electron beam apparatus and/or an ion beam apparatus. The system described herein is based on the fact that it was recognized that a bipolar voltage supply unit can be formed by means of a unipolar first current source and a unipolar second current source, said bipolar voltage supply unit enabling a load current in two directions. The high-voltage supply unit according to the system described herein can be operated in the 4-quadrant operation. In the 4-quadrant operation, a first voltage source for supplying the first current source and a second voltage source for supplying the second current source are embodied as different voltage sources.

Abstract: The system described herein relates to a high-voltage supply unit for providing an output voltage for a particle beam apparatus, wherein the particle beam apparatus is embodied as, for example, an electron beam apparatus and/or an ion beam apparatus. The system described herein is based on the fact that it was recognized that a bipolar voltage supply unit can be formed by means of a unipolar first current source and a unipolar second current source, said bipolar voltage supply unit enabling a load current in two directions. The high-voltage supply unit according to the system described herein can be operated in the 4-quadrant operation. In the 4-quadrant operation, a first voltage source for supplying the first current source and a second voltage source for supplying the second current source are embodied as different voltage sources.

Abstract: A particle beam device comprises a beam generator for generating a particle beam having charged particles and an electrode unit having a first electrode and a second electrode, wherein the first electrode interacts with the second electrode, in particular for guiding, shaping, aligning or correcting the particle beam. Moreover, the particle beam device comprises a low-pass filter being connected with at least one of: the first electrode and the second electrode, using an electrical connection. Additionally, the particle beam device comprises a mounting unit having an opening for the passage of the particle beam, wherein the at least one low-pass filter, the first electrode and the second electrode are arranged at the mounting unit. The electrode unit may comprise more than two electrodes, for example up to 16 electrodes.

Abstract: A high-voltage supply unit is provided for a particle beam device. The high-voltage supply unit includes at least one high-voltage cable for feeding a high voltage, and at least one measuring device for measuring the high voltage. The measuring device has at least one first capacitor, and the first capacitor is formed by at least one first section of the high-voltage cable.

Abstract: A transmission electron microscope comprises a high-voltage source for outputting a high voltage at two high-voltage outputs and outputting a control signal at a controller output; a focusing lens for focusing a beam; a monochromator which allows only those particles of the particle beam to pass whose kinetic energy is within an adjustable energy interval; an energy-dispersive component which deflects particles of different kinetic energies differently; a detector; and a controller connected to the controller output, which controls a beam deflector, arranged between the energy-dispersive component and the detector, the monochromator, or the energy-dispersive component in dependence on the control signal, or superposes plural of intensity distributions detected by the detector with an offset relative to one another, which offset is set in dependence on the control signal.

Abstract: A transmission electron microscope comprises a high-voltage source for outputting a high voltage at two high-voltage outputs and outputting a control signal at a controller output; a focusing lens for focusing a beam; a monochromator which allows only those particles of the particle beam to pass whose kinetic energy is within an adjustable energy interval; an energy-dispersive component which deflects particles of different kinetic energies differently; a detector; and a controller connected to the controller output, which controls a beam deflector, arranged between the energy-dispersive component and the detector, the monochromator, or the energy-dispersive component in dependence on the control signal, or superposes plural of intensity distributions detected by the detector with an offset relative to one another, which offset is set in dependence on the control signal.

Abstract: A high-voltage supply unit is provided for a particle beam device. The high-voltage supply unit includes at least one high-voltage cable for feeding a high voltage, and at least one measuring device for measuring the high voltage. The measuring device has at least one first capacitor, and the first capacitor is formed by at least one first section of the high-voltage cable.