Patents by Inventor Johan Bejhed
Johan Bejhed has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8684034Abstract: A micromechanical pressure relief valve arrangement comprises a stack of wafers. An active pressure relief valve is realized within the stack of wafers. A passive pressure relief valve is also realized within the stack of wafers, arranged in parallel to the active pressure relief valve. A check valve, also realized within the stack of wafers, is arranged in series with both the active pressure relief valve and the passive pressure relief valve.Type: GrantFiled: October 19, 2009Date of Patent: April 1, 2014Assignee: Nanospace ABInventors: Tor-Arne Grönland, Pelle Rangsten, Kerstin Jonsson, Johan Bejhed
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Patent number: 8395057Abstract: A wafer assembly (30) includes a substrate (71), in turn including a wafer (70) or a stack of wafers. The wafer assembly (30) further includes an electrical connection (32) arranged through at least a part of the substrate (71). The electrical connection (32) is made by low-resistance silicon. The electrical connection (32) is positioned in a hole (84) penetrating at least a part of the substrate (71). A surface (78) of the substrate (71) confining the hole (84) is electrically insulating. The electrical connection (32) has at least one protrusion (75), which protrudes transversally to a main extension (83) of the hole (84) and the protrusion (75) protrudes outside a minimum hole diameter (85), as projected in the main extension (83) of the hole (84). Preferably, the protrusion (75) is supported by a support surface (81) of the substrate (71). A manufacturing method is also disclosed.Type: GrantFiled: September 4, 2007Date of Patent: March 12, 2013Assignee: NanoSpace ABInventors: Pelle Rangsten, Hakan Johansson, Johan Bejhed
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Patent number: 8336314Abstract: A nozzle arrangement for use in a gas thruster is presented. At least one heater micro structure (20) is arranged in a stagnation chamber (12) of the gas thruster. The heater microstructure (20) comprises a core of silicon or a silicon compound coated by a surface metal or metal compound coating. The heater microstructure (20) is manufactured in silicon or a silicon compound and covered by a surface metal coating. The heater microstructure (20) is mounted in the stagnation chamber (12) before or after the coverage of the surface metal or metal compound coating. The coverage is performed by heating the heater microstructure and flowing a gas comprising low quantities of a metal compound. The compound decomposes at the heated heater microstructure (20), forming the surface metal or metal compound coating. The same principles of coating can be used for repairing the heater microstructure (20) in situ.Type: GrantFiled: September 4, 2007Date of Patent: December 25, 2012Assignee: NanoSpace ABInventors: Tor-Arne Gronland, Pelle Ransten, Hakan Johansson, Johan Bejhed
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Patent number: 8316873Abstract: A single use valve (10) comprises a plate (12) having an internal filter structure (28). A sealing substance (20) covers an inlet (14) to the filter structure (28). A heater arrangement (16) is arranged at the plate (12) in the vicinity of the sealing substance (20) for converting electrical current into heat and thereby melting or evaporating the sealing substance (20). The heater arrangement (16) conducts at least a part of the current, and preferably the entire current, along a conduction path not including the sealing substance (20). The melting of the sealing substance (20) thereby becomes independent on the existence of a complete electrical connection through the sealing substance (20). The heater arrangement (16) has therefore preferably its main heat emission in an area surrounding the sealing substance (20). The sealing substance (20) can be of any non-porous material.Type: GrantFiled: December 28, 2006Date of Patent: November 27, 2012Assignee: NanoSpace ABInventors: Johan Bejhed, Mikael Karlsson
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Publication number: 20110204266Abstract: A micromechanical pressure relief valve arrangement (10) comprises a stack of wafers (13). An active pressure relief valve (20) is realized within the stack of wafers (13). A passive pressure relief valve (30) is also realized within said stack of wafers (13), arranged in parallel to the active pressure relief valve (20). A check valve (50), also realized within the stack of wafers (13), is arranged in series with both the active pressure relief valve (20) and the passive pressure relief valve (30).Type: ApplicationFiled: October 19, 2009Publication date: August 25, 2011Applicant: NANOSPACE ABInventors: Tor-Arne Gronland, Pelle Rangsten, Kerstin Jonsson, Johan Bejhed
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Publication number: 20100139239Abstract: A nozzle arrangement for use in a gas thruster is presented. At least one heater micro structure (20) is arranged in a stagnation chamber (12) of the gas thruster. The heater microstructure (20) comprises a core of silicon or a silicon compound coated by a surface metal or metal compound coating. The heater microstructure (20) is manufactured in silicon or a silicon compound and covered by a surface metal coating. The heater microstructure (20) is mounted in the stagnation chamber (12) before or after the coverage of the surface metal or metal compound coating. The coverage is performed by heating the heater microstructure and flowing a gas comprising low quantities of a metal compound. The compound decomposes at the heated heater microstructure (20), forming the surface metal or metal compound coating. The same principles of coating can be used for repairing the heater microstructure (20) in situ.Type: ApplicationFiled: September 4, 2007Publication date: June 10, 2010Applicant: NANOSPACE ABInventors: Tor-Arne Gronland, Pelle Ransten, Hakan Johansson, Johan Bejhed
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Publication number: 20100018764Abstract: A wafer assembly (30) includes a substrate (71), in turn including a wafer (70) or a stack of wafers. The wafer assembly (30) further includes an electrical connection (32) arranged through at least a part of the substrate (71). The electrical connection (32) is made by low-resistance silicon. The electrical connection (32) is positioned in a hole (84) penetrating at least a part of the substrate (71). A surface (78) of the substrate (71) confining the hole (84) is electrically insulating. The electrical connection (32) has at least one protrusion (75), which protrudes transversally to a main extension (83) of the hole (84) and the protrusion (75) protrudes outside a minimum hole diameter (85), as projected in the main extension (83) of the hole (84). Preferably, the protrusion (75) is supported by a support surface (81) of the substrate (71). A manufacturing method is also disclosed.Type: ApplicationFiled: September 4, 2007Publication date: January 28, 2010Applicant: NANOSPACE ABInventors: Pelle Rangsten, Hakan Johansson, Johan Bejhed
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Publication number: 20090001303Abstract: A single use valve (10) comprises a plate (12) having an internal filter structure (28). A sealing substance (20) covers an inlet (14) to the filter structure (28). A heater arrangement (16) is arranged at the plate (12) in the vicinity of the sealing substance (20) for converting electrical current into heat and thereby melting or evaporating the sealing substance (20). The heater arrangement (16) conducts at least a part of the current, and preferably the entire current, along a conduction path not including the sealing substance (20). The melting of the sealing substance (20) thereby becomes independent on the existence of a complete electrical connection through the sealing substance (20). The heater arrangement (16) has therefore preferably its main heat emission in an area surrounding the sealing substance (20). The sealing substance (20) can be of any non-porous material.Type: ApplicationFiled: December 28, 2006Publication date: January 1, 2009Applicant: Nanospace ABInventors: Johan Bejhed, Mikael Karlsson