Patents by Inventor Johan ?man

Johan ?man has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11510068
    Abstract: A method and a network agent for providing cell assignment for a wireless device served by a network node. An input vector is created for a set of candidate cells based on measurements by the wireless device and/or by the network node related to performance and signals. A future effect of assigning the wireless device to a candidate cell is estimated for each candidate cell by applying the created input vector to an effect estimation function which may be a Q-learning function. A cell in the set of candidate cells is then determined and assigned for the wireless device, based on the estimated future effects of the candidate cells. The cell that provides the best future effect may be selected for cell assignment.
    Type: Grant
    Filed: June 7, 2018
    Date of Patent: November 22, 2022
    Assignee: Telefonaktiebolaget LM Ericsson (publ)
    Inventors: Andreas Johnsson, Ola Angelsmark, Mats Klingberg, Filip Oredsson, Rakesh Ranjan, Johan Åman
  • Patent number: 6844123
    Abstract: The present invention relates to a method and a system for producing large area display panels with improved precision. The system according to the invention comprises a first mask producing means (1) for producing a mask with a predetermined pattern according to input data and microlithographic exposing means (2) for exposing a photosensitive substrate with light and with use of a mask to impose the pattern of the mask on the substrate, whereby said substrate has a layer being sensitive to said light. Further, the system comprises measuring means (3) for measuring the pattern on the substrate and detecting deviations relative to the intended pattern as given by the input data, and second mask producing means (1) for producing a second mask according to second input data, and being controllable according to said measurement, to modify the pattern on the mask to compensate for the measured deviations, and thus compensate for production distortions.
    Type: Grant
    Filed: January 18, 2000
    Date of Patent: January 18, 2005
    Assignee: Micronic Laser Systems AB
    Inventors: Peter Ekberg, Johan Åman