Patents by Inventor Johanna Antoinette Maria Sondag-Huethorst

Johanna Antoinette Maria Sondag-Huethorst has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus, removable member and device manufacturing method
    Patent number: 8823919
    Abstract: A member is provided to prevent immersion liquid ingress to a gap between components or to adhere to at least one component to provide a surface to a feature of an immersion system. The member has a plastic sealing portion that is adhered to the component(s). The plastic sealing portion is opaque to DUV radiation. It may be resistant to degradation through exposure to DUV radiation. It may have a liquid phobic coating or property.
    Type: Grant
    Filed: November 15, 2010
    Date of Patent: September 2, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Nina Vladimirovna Dziomkina, Roelof Frederik De Graaf, Marcus Adrianus Van De Kerkhof, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Gerardus Martinus Antonius De Rooij, Martijn Houben, Vijay Kumar Badam, Johanna Antoinette Maria Sondag-Huethorst, Niek Elout De Kruijf
  • Fluid handling structure, a lithographic apparatus and a device manufacturing method
    Patent number: 8711326
    Abstract: A fluid handling structure to confine immersion liquid in a space between a projection system and a facing surface of a substrate, of a table to support the substrate, or both, is disclosed. The fluid handling structure includes a transponder to dissolve at least some of the gas in a bubble in the immersion liquid or to control a bubble in the immersion liquid so that it avoids entering an optical path of a beam from the projection system.
    Type: Grant
    Filed: May 2, 2011
    Date of Patent: April 29, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Ronald Van Der Ham, Martinus Hendrikus Antonius Leenders, Johannes Catharinus Hubertus Mulkens, Richard Moerman, Michel Riepen, Sergei Shulepov, Koen Steffens, Jan Willem Cromwijk, Johanna Antoinette Maria Sondag-Huethorst, Marco Baragona, Robertus Leonardus Maria In 'T Groen, Ralph Theodorus Hubertus Maessen, Jacob Marinus Jan Den Toonder, Milica Kovacevic-Milivojevic
  • Lithographic apparatus, removable member and device manufacturing method
    Patent number: 8659741
    Abstract: A sealing member is provided to prevent immersion liquid ingress to a gap between components. The sealing member has a plastic or polymer sealing portion that is adhered to the components forming the gap being sealed. The sealing member is constructed so as to reduce the force-coupling, in particular the time-related force-coupling, between the components being sealed.
    Type: Grant
    Filed: November 15, 2010
    Date of Patent: February 25, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Roelof Frederik De Graaf, Marcus Adrianus Van De Kerkhof, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Gerardus Martinus Antonius De Rooij, Martijn Houben, Nina Vladimirovna Dziomkina, Johanna Antoinette Maria Sondag-Huethorst, Niek Elout De Kruijf, Vijay Kumar Badam
  • FLUID HANDLING STRUCTURE, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD
    Publication number: 20110292357
    Abstract: A fluid handling structure to confine immersion liquid in a space between a projection system and a facing surface of a substrate, of a table to support the substrate, or both, is disclosed. The fluid handling structure includes a transponder to dissolve at least some of the gas in a bubble in the immersion liquid or to control a bubble in the immersion liquid so that it avoids entering an optical path of a beam from the projection system.
    Type: Application
    Filed: May 2, 2011
    Publication date: December 1, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Ronald Van Der Ham, Martinus Hendrikus Antonius Leenders, Johannes Catharinus Hubertus Mulkens, Richard Moerman, Michel Riepen, Sergei Shulepov, Koen Steffens, Jan Willem Cromwijk, Johanna Antoinette Maria Sondag-Huethorst, Marco Baragona, Robertus Leonardus Maria In 'T Groen, Ralph Theodorus Hubertus Maessen, Jacob Marinus Jan Den Toonder, Milica Kovacevic-Milivojevic
  • LITHOGRAPHIC APPARATUS, REMOVABLE MEMBER AND DEVICE MANUFACTURING METHOD
    Publication number: 20110199592
    Abstract: A sealing member is provided to prevent immersion liquid ingress to a gap between components. The sealing member has a plastic or polymer sealing portion that is adhered to the components forming the gap being sealed. The sealing member is constructed so as to reduce the force-coupling, in particular the time-related force-coupling, between the components being sealed.
    Type: Application
    Filed: November 15, 2010
    Publication date: August 18, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Roelof Frederik De Graff, Marcus Adrianus Van De Kerkhof, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Gerardus Martinus Antonius De Rooij, Martijn Houben, Nina Vladimirovna Dziomkina, Johanna Antoinette Maria Sondag-Huethorst, Niek Elout De Kruijf, Vijay Kumar Badam
  • LITHOGRAPHIC APPARATUS, REMOVABLE MEMBER AND DEVICE MANUFACTURING METHOD
    Publication number: 20110116060
    Abstract: A member is provided to prevent immersion liquid ingress to a gap between components or to adhere to at least one component to provide a surface to a feature of an immersion system. The member has a plastic sealing portion that is adhered to the component(s). The plastic sealing portion is opaque to DUV radiation. It may be resistant to degradation through exposure to DUV radiation. It may have a liquid phobic coating or property.
    Type: Application
    Filed: November 15, 2010
    Publication date: May 19, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Nina Vladimirovna Dziomkina, Roelof Frederik De Graaf, Marcus Adrianus Van De Kerkhof, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Gerardus Martinus Antonius De Rooij, Martijn Houben, Vijay Kumar Badam, Johanna Antoinette Maria Sondag-Huethorst, Niek Elout De Kruijf