Patents by Inventor Johannes Baselmans
Johannes Baselmans has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20060132746Abstract: An apparatus and system that form a hexagonal exposed spot grid on a substrate. This is accomplished by using a patterning device that directs a patterned beam onto a microlens array, which forms Fourier transformed spots of the pattered beam at the substrate. Through at least one of (a) moving of the substrate that is patterned by the patterning device and/or changing a frequency of a beam of radiation or (b) through a hexagonal configuration of the patterning device and the microlens array, the spots from the microlens array form the hexagonal exposed spot grid on the substrate.Type: ApplicationFiled: December 22, 2004Publication date: June 22, 2006Applicant: ASML Netherlands B.V.Inventors: Johannes Baselmans, Patricius Tinnemans, Willem Venema
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Lithographic apparatus and device manufacturing method utilizing an microlens array at a image plane
Publication number: 20060132751Abstract: A lithographic apparatus includes a radiation system, a patterning device, and a projection system. The patterning device patterns a beam of radiation from the radiation system. The projection system projects the patterned beam onto a target portion of a substrate. The projection system comprising a pupil positioned at a pupil plane of the projection system and an array of lenses positioned at an image plane of the projection system. The patterning device is conjugate to the array of lenses and the pupil is conjugate to the substrate.Type: ApplicationFiled: December 17, 2004Publication date: June 22, 2006Applicant: ASML Netherlands B.V.Inventors: Johannes Baselmans, Huibert Visser -
Publication number: 20060119807Abstract: An immersion lithographic apparatus is disclosed which includes a liquid supply system having an inlet configured to supply a liquid to a space between a projection system of the lithographic apparatus and a substrate and an outlet configured to remove at least part of the liquid, the liquid supply system configured to rotate the inlet, the outlet, or both, about an axis substantially perpendicular to an exposure plane of the substrate.Type: ApplicationFiled: December 2, 2004Publication date: June 8, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Johannes Baselmans, Sjoerd Donders, Christiaan Hoogendam, Jeroen Johannes Mertens, Johannes Catharinus Mulkens, Bob Streefkerk
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Publication number: 20060114437Abstract: A lithographic projection apparatus includes a measurement system for measuring changes in projection system aberrations with time, and a predictive control system for predicting variation of projection system aberrations with time on the basis of model parameters and for generating a control signal for compensating a time-varying property of the apparatus, such as the OVL values (X-Y adjustment) and the FOC values (Z adjustment) of a lens of the projection system for example. An inline model identification system is provided for estimating model parameter errors on the basis of projection system aberration values provided by the predictive control system and measured projection system aberration values provided by the measurement system, and an updating system utilizes the model parameter errors for updating the model parameters of the predictive control system in order to maintain the time-varying property within acceptable performance criteria.Type: ApplicationFiled: December 1, 2004Publication date: June 1, 2006Applicant: ASML NETHERLANDS B.V.Inventors: M'hamed Akhssay, Johannes Baselmans, Franciscus Antonius Chrysogonus Commissaris, Simon De Groot, Andre Jeunink, Wim Tel, Alexander Hendrikus Van Der Hoff, Arnout Van De Stadt
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Publication number: 20060103826Abstract: A lithographic apparatus is arranged to project a patterned radiation beam from a patterning device onto a substrate using a projection system.Type: ApplicationFiled: November 16, 2004Publication date: May 18, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Haico Kok, Johannes Baselmans
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Publication number: 20060055905Abstract: Use of a refraction grating to divide a beam of radiation into a plurality of sub-beams that are each directed onto an array of individually controllable elements, modulated thereby and projected onto a substrate as an array of spots.Type: ApplicationFiled: September 14, 2004Publication date: March 16, 2006Inventors: Johannes Baselmans, Anastasius Bruinsma, Pieter De Jager, Henri Vink
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Publication number: 20060055904Abstract: According to one embodiment, a method for aligning a first alignment marker with respect to a second alignment marker, a lens being positioned in between the markers, includes providing an alignment beam and imaging the first alignment marker on the second alignment marker with the alignment beam through the lens. A lens interferometer is provided as a measurement device arranged to measure a relative position of at least one of the first and second alignment markers. The method further includes measuring the relative position and aligning the position of at least one of the first and second alignment markers based on the measured relative position.Type: ApplicationFiled: December 17, 2004Publication date: March 16, 2006Applicant: ASML NETHERLANDS B.V.Inventor: Johannes Baselmans
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Publication number: 20060038969Abstract: An array of individually controllable elements, comprising a plurality of control areas consisting of a plurality of rows of reflectors. Alternate rows of reflectors are actuated in a common manner such that the control areas function as a grating to provide a control element that can be used as a diffractive optical element.Type: ApplicationFiled: August 17, 2004Publication date: February 23, 2006Inventors: Johannes Baselmans, Arno Bleeker, Pieter De Jager, Kars Troost
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Publication number: 20060007419Abstract: In immersion lithography after exposure of a substrate is complete, a detector is used to detect any residual liquid remaining on the substrate and/or substrate table.Type: ApplicationFiled: July 7, 2004Publication date: January 12, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Bob Streefkerk, Johannes Baselmans, Sjoerd Donders, Christiaan Hoogendam, Jeroen Johannes Mertens, Johannes Catharinus Mulkens
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Publication number: 20060008716Abstract: A manufacturing method is utilized in lithographic projection apparatus in order to enable all aberrations to be compensated for but with those aberrations that are of most significance to the particular application (the particular pattern, illumination mode, etc.) being given precedence over aberrations that are of lesser significance in relation to that particular application. The method uses a substrate having a target portion for receiving an image, a mask for applying a pattern in accordance with a required patterning application, and a projection system to project a selected beam of radiation onto the mask to produce a specific required patterned beam providing an image of the pattern on the target portion.Type: ApplicationFiled: July 8, 2004Publication date: January 12, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Andre Jeunink, M'Hamed Akhssay, Johannes Baselmans, Franciscus Antonius Commissaris, Simon De Groot, Wim Tel, Alexander Hendrikus Van Der Hoff, Arnout Van De Stadt, Remco Van Dijk
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Publication number: 20050219483Abstract: An immersion lithography apparatus is disclosed having a liquid supply system configured to at least partially fill a space between a final element of a projection system and a substrate table, with a first liquid, and a measurement system configured to measure a location of each of a plurality of points on the substrate, the measurement system being arranged such that measurements take place through a second liquid, the second liquid not being supplied by the liquid supply system.Type: ApplicationFiled: March 30, 2005Publication date: October 6, 2005Applicant: ASML NETHERLANDS B.V.Inventors: Johannes Baselmans, Sjoerd Nicolaas Donders, Christiaan Hoogendam, Hans Jansen, Jeroen Johannes Sophia Mertens, Johannes Catharinus Mulkens, Bob Streefkerk
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Publication number: 20050213097Abstract: A method of determining aberration of a projection system of a lithographic includes projecting a reference test pattern, projecting a second test pattern, measuring relative displacements between items in the resulting images of said reference test pattern and said second test pattern, and using said measurements to determine information on the aberration of the projection system, wherein a filter is used when imaging the second test pattern to select particular radiation paths though the projection system, and wherein the measuring is performed for a plurality of images of the second test pattern obtained at planes displaced along the optical axis relative to each other.Type: ApplicationFiled: March 25, 2004Publication date: September 29, 2005Applicant: ASML NETHERLANDS B.V.Inventors: Johannes Baselmans, Haico Kok
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Publication number: 20050175776Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.Type: ApplicationFiled: November 12, 2004Publication date: August 11, 2005Applicant: ASML NETHERLANDS B.V.Inventors: Bod Streefkerk, Johannes Baselmans, Richard Bruls, Marcel Mathijs Dierichs, Sjoerd Donders, Christiaan Hoogendam, Hans Jansen, Erik Loopstra, Jeroen Johannes Mertens, Johannes Mulkens, Ronald Severijns, Sergei Shulepov, Herman Boom, Timotheus Sengers
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Publication number: 20050146702Abstract: The present invention provides a lithographic apparatus comprising an illumination system for providing a projection beam of radiation. The illumination system comprises at least one movable optical element (7), such that a projection beam of radiation (4) can be shifted around a central position. This ensures that inhomogeneities in the intensity distribution in the projection beam (4) will be smeared out, which in turn provides an improved homogeneity of the exposure of a surface to be illuminated by the system, such as a wafer or other substrate. The optical element (7) may comprise a motor movable mirror, prism, filter, lens, axicon, diffuser, diffractive optical array, optical integrator, etc. The invention further provides a device manufacturing method, using a lithographic apparatus according to the invention, wherein the optical element is moved, in order to provide an optimum homogeneity for the projection beam of radiation.Type: ApplicationFiled: October 29, 2004Publication date: July 7, 2005Applicant: ASML NETHERLANDS B.V.Inventors: Markus Eurlings, Johannes Baselmans, Hako Botma, Jan Bruining, Marcel Mathijs Dierichs, Antonius Johannes Dijsseldonk, Judocus Stoeldraijer
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Publication number: 20050136340Abstract: Without changing the initial illumination setting and resist process condition, a method according to one embodiment includes manipulating the design shape by application of additional and non-printable assist features (“sub-resolution assist features” or “SRAF”), such that CD sensitivities of the pattern feature are minimized. The SRAF may comprise chrome dots, or any other design objects of different sizes, shapes, and/or types, which can modulate the intensity and/or phase of the original pattern. to minimize an aberration sensitivity of selected ones of the plurality of pattern features A pattern that was not designed to include SRAF may be modified to include SRAF. In such a method, one or more aspects of the assist features are selected to reduce the aberration-induced image variation for a pattern and its sensitivity to aberrations.Type: ApplicationFiled: October 26, 2004Publication date: June 23, 2005Applicant: ASML NETHERLANDS B.V.Inventors: Johannes Baselmans, Hugo Cramer, Adtianus Engelen, Jozef Finders, Carsten Kohler, Shih-En Tseng
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Publication number: 20050110973Abstract: The joint between the projection system element and its support comprises an inorganic layer or a direct bond and is thus liquid tight, which can prevent deformation by an immersion liquid. The joint can be made either warm or cold. Solders, glue, and glue protection can all be used in the formation of this joint. In an embodiment, the elements and its support are made of quartz.Type: ApplicationFiled: November 24, 2003Publication date: May 26, 2005Applicants: ASML NETHERLANDS B.V., CARL ZEISS SMT AGInventors: Bob Streefkerk, Johannes Baselmans, Paul Graupner, Jan Haisma, Nicodemus Hattu, Christiaan Hoogendam, Erik Loopstra, Johannes Hubertus Mulkens, Bernard Gellrich
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Publication number: 20050094119Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.Type: ApplicationFiled: August 27, 2004Publication date: May 5, 2005Applicant: ASML Netherlands B.V.Inventors: Erik Loopstra, Johannes Baselmans, Marcel Mathijs Theodore Dierichs, Johannes Jasper, Hendricus Meijer, Uwe MicKan, Johannes Catharinus Mulkens, Matthew Lipson, Tammo Utterdijk
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Publication number: 20050007569Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.Type: ApplicationFiled: May 13, 2004Publication date: January 13, 2005Applicant: ASML NETHERLANDS B.V.Inventors: Bob Streefkerk, Levinus Bakker, Johannes Baselmans, Hendrikus Cox, Antonius Theodorus Derksen, Sjoerd Donders, Christiaan Hoogendam, Joeri Lof, Erik Loopstra, Jeroen Johannes Mertens, Frits Van Der Meulen, Johannes Mulkens, Gerardus Van Nunen, Klaus Simon, Bernardus Slaghekke, Alexander Straaijer, Jan-Gerard Van Der Toorn, Martijn Houkes