Patents by Inventor Johannes Blok
Johannes Blok has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9939738Abstract: A lithographic apparatus comprising an object table which carries an object. The lithographic apparatus may further comprise at least one sensor as part of a measurement system to measure a characteristic of the object table, the environment surrounding the lithographic apparatus or another component of the lithographic apparatus. The measured characteristic may be used to estimate the deformation of the object due to varying loads during operation of the lithographic apparatus, for example varying loads induced by a two-phase flow in a channel formed within the object table. Additionally, or alternatively, the lithographic apparatus comprises a predictor to estimate the deformation of the object based on a model. The positioning of the object table carrying the object can be controlled based on the estimated deformation.Type: GrantFiled: July 16, 2015Date of Patent: April 10, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Adrianus Hendrik Koevoets, Christianus Wilhelmus Johannes Berendsen, Rogier Hendrikus Magdalena Cortie, Jim Vincent Overkamp, Patricius Jacobus Neefs, Putra Saputra, Ruud Hendrikus Martinus Johannes Bloks, Michael Johannes Hendrika Wilhelmina Renders, Johan Gertrudis Cornelis Kunnen, Thibault Simon Mathieu Laurent
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Publication number: 20180074411Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.Type: ApplicationFiled: November 20, 2017Publication date: March 15, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Thibault Simon Mathieu Laurent, Gerardus Adrianus Antonius Maria Kusters, Bastiaan Andreas Wilhelmus Hubertus Knarren, Raymond Wilhelmus Louis Lafarre, Koen Steffens, Takeshi Kaneko, Robbert Jan Voogd, Gregory Martin Mason Corcoran, Ruud Henrikus Martinus Johannes Bloks, Johan Gertrudis Cornelis Kunnen, Ramin Badie
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Patent number: 9915877Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.Type: GrantFiled: June 21, 2017Date of Patent: March 13, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Thibault Simon Mathieu Laurent, Johannes Henricus Wilhelmus Jacobs, Wilhelmus Franciscus Johannes Simons, Martijn Houben, Raymond Wilhelmus Louis Lafarre, Koen Steffens, Han Henricus Aldegonda Lempens, Rogier Hendrikus Magdalena Cortie, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Siegfried Alexander Tromp, Theodorus Wilhelmus Polet, Jim Vincent Overkamp, Van Vuong Vy
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Patent number: 9904177Abstract: A fluid handling structure, lithographic apparatus and device manufacturing method are disclosed. According to a disclosed embodiment, the fluid handling structure is configured to confine an immersion fluid in a space between a final element of a projection system and a facing surface during movement of the facing surface relative to the structure, wherein the structure has at least one heater to heat a portion of the facing surface adjacent to the heater, the at least one heater having a fluid heater to heat fluid flow from the structure onto the facing surface, the heater thereby heating the portion.Type: GrantFiled: August 22, 2012Date of Patent: February 27, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Ivo Adam Johannes Thomas, Coen Cornelis Wilhelmus Verspaget, Ronald Van Der Ham, Thibault Simon Mathieu Laurent, Gregory Martin Mason Corcoran, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Pieter Lein Joseph Gunter
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Patent number: 9897928Abstract: A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.Type: GrantFiled: August 15, 2012Date of Patent: February 20, 2018Assignee: ASML Netherlands B.V.Inventors: Johan Gertrudis Cornelis Kunnen, Johannes Henricus Wilhelmus Jacobs, Coen Cornelis Wilhelmus Verspaget, Ronald Van Der Ham, Ivo Adam Johannes Thomas, Martijn Houben, Thibault Simon Mathieu Laurent, Gregory Martin Mason Corcoran, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Pieter Lein Joseph Gunter, Marinus Jan Remie, Sander Catharina Reinier Derks
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Patent number: 9823589Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.Type: GrantFiled: March 23, 2016Date of Patent: November 21, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Thibault Simon Mathieu Laurent, Gerardus Adrianus Antonius Maria Kusters, Bastiaan Andreas Wilhelmus Hubertus Knarren, Raymond Wilhelmus Louis Lafarre, Koen Steffens, Takeshi Kaneko, Robbert Jan Voogd, Gregory Martin Mason Corcoran, Ruud Hendrikus Martinus Johannes Bloks, Johan Gertrudis Cornelis Kunnen, Ramin Badie
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Publication number: 20170315454Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.Type: ApplicationFiled: June 21, 2017Publication date: November 2, 2017Applicant: ASML Netherlands B.V.Inventors: Thibault Simon Mathieu LAURENT, Johannes Henricus Wilhelmus JACOBS, Wilhelmus Franciscus Johannes SIMONS, Martijn HOUBEN, Raymond Wilhelmus Louis LAFARRE, Koen STEFFENS, Han Henricus Aldegonda LEMPENS, Rogier Hendrikus Magdalena CORTIE, Ruud Hendrikus Martinus Johannes BLOKS, Gerben PIETERSE, Siegfried Alexander TROMP, Theodorus Wilhelmus POLET, Jim Vincent OVERKAMP, Van Vuong VY
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Patent number: 9785055Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.Type: GrantFiled: May 7, 2013Date of Patent: October 10, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Thibault Simon Mathieu Laurent, Johannes Henricus Wilhelmus Jacobs, Wilhelmus Franciscus Johannes Simons, Martijn Houben, Raymond Wilhelmus Louis Lafarre, Koen Steffens, Han Henricus Aldegonda Lempens, Rogier Hendrikus Magdalena Cortie, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Siegfried Alexander Tromp, Theodorus Wilhelmus Polet, Jim Vincent Overkamp, Van Vuong Vy
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Publication number: 20170212421Abstract: An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.Type: ApplicationFiled: April 7, 2017Publication date: July 27, 2017Applicant: ASML NETHERLANDS B.V.Inventors: Hrishikesh PATEL, Johannes Henricus Wilhelmus JACOBS, Gerardus Adrianus Antonius Maria KUSTERS, Thibault Simon Mathieu LAURENT, Marcio Alexandre Cano MIRANDA, Ruud Hendricus Martinus Johannes BLOKS, Peng FENG, Johan Gertrudis Cornelis KUNNEN
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Publication number: 20170212429Abstract: A lithographic apparatus comprising an object table which carries an object. The lithographic apparatus may further comprise at least one sensor as part of a measurement system to measure a characteristic of the object table, the environment surrounding the lithographic apparatus or another component of the lithographic apparatus. The measured characteristic may be used to estimate the deformation of the object due to varying loads during operation of the lithographic apparatus, for example varying loads induced by a two- phase flow in a channel formed within the object table. Additionally, or alternatively, the lithographic apparatus comprises a predictor to estimate the deformation of the object based on a model. The positioning of the object table carrying the object can be controlled based on the estimated deformation.Type: ApplicationFiled: July 16, 2015Publication date: July 27, 2017Applicant: ASML Netherlands B.V.Inventors: Adrianus Hendrik KOEVOETS, Christianus Wilhelmus Johannes BERENDSEN, Rogier Hendrikus Magdalena CORTIE, Jim Vincent OVERKAMP, Patricius Jacobus NEEFS, Putra SAPUTRA, Ruud Hendrikus Martinus Johannes BLOKS, Michael Johannes Hendrika Wilhelmina RENDERS, Johan Gertrudis Cornelis KUNNEN, Thibault Simon Mathieu LAURENT
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Patent number: 9618858Abstract: An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.Type: GrantFiled: January 20, 2011Date of Patent: April 11, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Hrishikesh Patel, Johannes Henricus Wilhelmus Jacobs, Gerardus Adrianus Antonius Maria Kusters, Thibault Simon Mathieu Laurent, Marcio Alexandre Cano Miranda, Ruud Hendrikus Martinus Johannes Bloks, Peng Feng, Johan Gertrudis Cornelis Kunnen
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Publication number: 20170068175Abstract: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.Type: ApplicationFiled: November 17, 2016Publication date: March 9, 2017Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Jan Steven Christiaan WESTERLAKEN, Ruud Hendrikus Martinus Johannes BLOKS, Peter A. DELMASTRO, Thibault Simon Mathieu LAURENT, Martinus Hendrikus Antonius LEENDERS, Mark Josef SCHUSTER, Christopher Charles WARD, Frank Johannes Jacobus VAN BOXTEL, Justin Matthew VERDIRAME, Samir A. NAYFEH
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Patent number: 9513568Abstract: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.Type: GrantFiled: June 5, 2013Date of Patent: December 6, 2016Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Jan Steven Christiaan Westerlaken, Ruud Hendrikus Martinus Johannes Bloks, Peter A. Delmastro, Thibault Simon Mathieu Laurent, Martinus Hendrikus Antonius Leenders, Mark Josef Schuster, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Justin Matthew Verdirame, Samir A. Nayfeh
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Publication number: 20160202618Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.Type: ApplicationFiled: March 23, 2016Publication date: July 14, 2016Applicant: ASML NETHERLANDS B.V.Inventors: Thibault Simon Mathieu LAURENT, Gerardus Adrianus Antonius Maria KUSTERS, Bastiaan Andreas Wilhelmus Hubertus KNARREN, Raymond Wilhelmus Louis LAFARRE, Koen STEFFENS, Takeshi KANEKO, Robbert Jan VOOGD, Gregory Martin Mason CORCORAN, Ruud Hendrikus Martinus Johannes BLOKS, Johan Gertrudis Cornelis KUNNEN, Ramin BADIE
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Patent number: 9298107Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.Type: GrantFiled: July 14, 2011Date of Patent: March 29, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Thibault Simon Mathieu Laurent, Gerardus Adrianus Antonius Maria Kusters, Bastiaan Andreas Wilhelmus Hubertus Knarren, Raymond Wilhelmus Louis Lafarre, Koen Steffens, Takeshi Kaneko, Robbert Jan Voogd, Gregory Martin Mason Corcoran, Ruud Hendrikus Martinus Johannes Bloks, Johan Gertrudis Cornelis Kunnen, Ramin Badie
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Publication number: 20150183542Abstract: A film dispenser for dispensing stretch wrap or other flexible materials. The film dispenser is comprised of a separate inner and outer mold. The inner mold is comprised of slots and extensions, and a collar which fits into the outer mold, and inner ridges of said inner mold fit into a groove on an extended core. The outer mold is comprised of ribs which fit into the slots of the inner mold.Type: ApplicationFiled: December 27, 2013Publication date: July 2, 2015Inventor: Johannes Blok
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Publication number: 20150166843Abstract: Tapes which allow variable information to be filled in by the user, wherein the tape can be torn by hand by the user.Type: ApplicationFiled: December 16, 2013Publication date: June 18, 2015Inventor: Johannes Blok
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Publication number: 20150168854Abstract: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.Type: ApplicationFiled: June 5, 2013Publication date: June 18, 2015Applicants: ASML Netherlands B.V., ASML Holding N.V.Inventors: Jan Steven Christiaan Westerlaken, Ruud Hendrikus Martinus Johannes Bloks, Peter A. Delmastro, Thibault Simon Mathieu Laurent, Martinus Hendrikus Antonius Leenders, Mark Josef Schuster, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Justin Matthew Verdirame, Samir A. Nayfeh
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Publication number: 20150131064Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.Type: ApplicationFiled: May 7, 2013Publication date: May 14, 2015Applicant: ASML Netherlands B.V.Inventors: Thibault Simon Mathieu Laurent, Johannes Henricus Wilhelmus Jacobs, Wilhelmus Franciscus Johannes Simons, Martijn Houben, Raymond Wilhelmus Louis Lafarre, Koen Steffens, Han Henricus Aldegonda Lempens, Rogier Hendrikus Magdalena Cortie, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Siegfried Alexander Tromp, Theodorus Wilhelmus Polet, Jim Vincent Overkamp, Van Vuong Vy
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Patent number: 8616490Abstract: A film dispenser for dispensing stretch wrap or other flexible materials. The film dispenser is comprised of a separate inner and outer mold. The inner mold is comprised of slots and extensions, and a collar which fits into the outer mold, and inner ridges of said inner mold fit into a groove on an extended core. The outer mold is comprised of ribs which fit into the slots of the inner mold.Type: GrantFiled: January 18, 2011Date of Patent: December 31, 2013Assignee: Broadway Kleer-Guard Corp.Inventor: Johannes Blok