Patents by Inventor Johannes Catharinus Hubertus Mulkens

Johannes Catharinus Hubertus Mulkens has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • LITHOGRAPHIC APPARATUS
    Publication number: 20150234294
    Abstract: An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.
    Type: Application
    Filed: May 5, 2015
    Publication date: August 20, 2015
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Clemens Johannes Gerardus VAN DEN DUNGEN, Nicolaas Franciscus KOPPELAARS, Martinus Hendrikus Antonius LEENDERS, Paulus Martinus Maria LIEBREGTS, Johannes Catharinus Hubertus MULKENS, Erik Henricus Egidius Catharina EUMMELEN, Marcel BECKERS, Richard MOERMAN, Cédric Désiré GROUWSTRA, Danny Maria Hubertus PHILIPS, Remko Jan Peter VERHEES, Pieter MULDER, Evert VAN VLIET
  • Lithographic apparatus having a liquid detection system
    Patent number: 9104117
    Abstract: In immersion lithography after exposure of a substrate is complete, a detector is used to detect any residual liquid remaining on the substrate and/or substrate table.
    Type: Grant
    Filed: November 26, 2012
    Date of Patent: August 11, 2015
    Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens
  • Lithographic apparatus and device manufacturing method
    Patent number: 9097987
    Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
    Type: Grant
    Filed: April 19, 2013
    Date of Patent: August 4, 2015
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Christiaan Alexander Hoogendam, Antonius Theodorus Anna Maria Derksen, Sjoerd Nicolaas Lambertus Donders, Joeri Lof, Erik Roelof Loopstra, Johannes Catharinus Hubertus Mulkens, Hans Jansen, Jacobus Johannus Leonardus Hendricus Verspay, Alexander Straaijer, Bob Streefkerk
  • Lithographic apparatus and method involving a fluid inlet and a fluid outlet
    Patent number: 9091940
    Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.
    Type: Grant
    Filed: December 20, 2012
    Date of Patent: July 28, 2015
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Antonius Theodorus Anna Maria Derksen, Christiaan Alexander Hoogendam, Aleksey Yurievich Kolesnychenko, Joeri Lof, Erik Roelof Loopstra, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Alexander Straaijer, Bob Streefkerk, Joannes Theodoor De Smit, Helmar Van Santen
  • Lithographic apparatus and device manufacturing method involving removal of liquid entering a gap
    Patent number: 9081299
    Abstract: An exposure apparatus including a liquid supply system configured to provide a liquid to a space between the projection system and an object, and a movable table having a recess, the recess including therein the object or a surface to hold and support the object, wherein a gap opening into which the liquid can enter is defined between a peripheral wall of the recess and the object, and the recess further including a fluid opening, below the gap opening, to remove the liquid entering the gap opening.
    Type: Grant
    Filed: August 1, 2011
    Date of Patent: July 14, 2015
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Joeri Lof, Erik Theodorus Maria Bijlaart, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Arie Jeffrey Maria Den Boef, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Marcus Adrianus Van De Kerkhof, Aleksey Yurievich Kolesnychenko, Mark Kroon, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Joost Jeroen Ottens, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20150168850
    Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
    Type: Application
    Filed: February 17, 2015
    Publication date: June 18, 2015
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bob STREEFKERK, Johannes Jacobus Matheus Baselmans, Henrikus Herman Marie Cox, Antonius Theodorus Anna Maria Derksen, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Joeri Lof, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Johannes Catharinus Hubertus Mulkens, Gerardus Petrus Mattijs Van Nunen, Klaus Simon, Bernardus Antonius Slaghekke, Alexander Straaijer, Jan-Gerard Cornelis Van Der Toorn, Martijn Houkes
  • Lithographic apparatus and device manufacturing method
    Patent number: 9057967
    Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system configured to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface configured to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.
    Type: Grant
    Filed: July 30, 2009
    Date of Patent: June 16, 2015
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Joeri Lof, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Helmar Van Santen
  • LITHOGRAPHIC PROJECTION APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20150160567
    Abstract: A lithographic projection apparatus is disclosed where at least part of a space between a projection system of the apparatus and a substrate is filled with a liquid by a liquid supply system. The projection system is separated into two separate physical parts. With substantially no direct connection between the two parts of the projection system, vibrations induced in a first of the two parts by coupling of forces through the liquid filling the space when the substrate moves relative to the liquid supply system affects substantially only the first part of the projection system and not the other second part.
    Type: Application
    Filed: February 17, 2015
    Publication date: June 11, 2015
    Applicant: ASML NETHERLANDS B.V.
    Inventor: Johannes Catharinus Hubertus MULKENS
  • Lithographic apparatus
    Patent number: 9036127
    Abstract: An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.
    Type: Grant
    Filed: April 14, 2009
    Date of Patent: May 19, 2015
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Clemens Johannes Gerardus Van den Dungen, Nicolaas Franciscus Koppelaars, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Johannes Catharinus Hubertus Mulkens, Erik Henricus Egidius Catharina Eummelen, Marcel Beckers, Richard Moerman, Cédric Désiré Grouwstra, Danny Maria Hubertus Philips, Remko Jan Peter Verhees, Pieter Mulder, Evert Van Vliet
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20150116675
    Abstract: A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.
    Type: Application
    Filed: December 29, 2014
    Publication date: April 30, 2015
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Hans JANSEN, Johannes Jacobus Matheus BASELMANS, Sjoerd Nicolaas Lambertus DONDERS, Christiaan Alexander HOOGENDAM, Jeroen Johannes Sophia Maria MERTENS, Johannes Catharinus Hubertus MULKENS, Marco Koert STAVENGA, Bob STREEFKERK, Jan Cornelis VAN DER HOEVEN, Cedric Desire GROUWSTRA
  • Immersion lithographic apparatus and device manufacturing method with a projection system having a part movable relative to another part
    Patent number: 8964163
    Abstract: A lithographic projection apparatus is disclosed where at least part of a space between a projection system of the apparatus and a substrate is filled with a liquid by a liquid supply system. The projection system is separated into two separate physical parts. With substantially no direct connection between the two parts of the projection system, vibrations induced in a first of the two parts by coupling of forces through the liquid filling the space when the substrate moves relative to the liquid supply system affects substantially only the first part of the projection system and not the other second part.
    Type: Grant
    Filed: July 9, 2012
    Date of Patent: February 24, 2015
    Assignee: ASML Netherlands B.V.
    Inventor: Johannes Catharinus Hubertus Mulkens
  • Lithographic apparatus and device manufacturing method
    Patent number: 8964164
    Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
    Type: Grant
    Filed: July 21, 2011
    Date of Patent: February 24, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Henrikus Herman Marie Cox, Antonius Theodorus Anna Maria Derksen, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Joeri Lof, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Johannes Catharinus Hubertus Mulkens, Gerardus Petrus Matthijs Van Nunen, Klaus Simon, Bernardus Antonius Slaghekke, Alexander Straaijer, Jan-Gerard Cornelis Van Der Toorn, Martijn Houkes
  • Lithographic apparatus, device manufacturing method, and substrate exchanging method
    Patent number: 8947636
    Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; at least three substrate tables that are each constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the substrate tables are moveable in a common moving area extending substantially in a plane perpendicular to the patterned radiation beam, the moving area comprising at least three working locations of which at least one working location is arranged for exposure of the substrate to the patterned radiation beam and at least one working location is arranged for non-exposure purposes.
    Type: Grant
    Filed: March 17, 2011
    Date of Patent: February 3, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Theodorus Petrus Maria Cadee, Jan Jaap Kuit, Johannes Catharinus Hubertus Mulkens, Koen Jacobus Johannes Maria Zaal
  • Lithographic apparatus and device manufacturing method
    Patent number: 8941811
    Abstract: A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.
    Type: Grant
    Filed: September 23, 2011
    Date of Patent: January 27, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Hans Jansen, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Marco Koert Stavenga, Bob Streefkerk, Jan Cornelis Van Der Hoeven, Cedric Desire Grouwstra
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20140375972
    Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
    Type: Application
    Filed: September 9, 2014
    Publication date: December 25, 2014
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Christiaan Alexander HOOGENDAM, Bob Streefkerk, Johannes Catharinus Hubertus Mulkens, Erik Theodorus Maria Bijlaart, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Bernardus Antonius Slaghekke, Patricius Aloysius Jacobus Tinnemans, Helmar Van Santen
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20140347642
    Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate, Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.
    Type: Application
    Filed: August 11, 2014
    Publication date: November 27, 2014
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Erik Roelof LOOPSTRA, Johannes Jacobus Matheus Baselmans, Marcel Mathijs Theodore Marie Dierichs, Johannes Christiaan Maria Jasper, Matthew Lipson, Hendricus Johannes Maria Meijer, Uwe Mickan, Johannes Catharinus Hubertus Mulkens, Tammo Uitterdijk
  • Lithographic apparatus and device manufacturing method
    Patent number: 8860923
    Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
    Type: Grant
    Filed: September 22, 2011
    Date of Patent: October 14, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Christiaan Alexander Hoogendam, Bob Streefkerk, Johannes Catharinus Hubertus Mulkens, Erik Theodorus Maria Bijlaart, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Bernardus Antonius Slaghekke, Patricius Aloysius Jacobus Tinnemans, Helmar Van Santen
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20140293248
    Abstract: In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
    Type: Application
    Filed: April 24, 2014
    Publication date: October 2, 2014
    Applicants: ASML NETHERLANDS B.V., CARL ZEISS SMT AG
    Inventors: Bob STREEFKERK, Johannes Jacobus Matheus BASELMANS, Adrianus Franciscus Petrus ENGELEN, Jozef Maria FINDERS, Paul GRÄUPNER, Johannes Catharinus Hubertus MULKENS, Jan Bernard Plechelmus VAN SCHOOT
  • Lithographic apparatus and device manufacturing method
    Patent number: 8848162
    Abstract: A system to recycle immersion fluid in an immersion fluid lithographic apparatus is described. A recycling path comprising a plurality of parallel paths, each of which has its own parallel liquid treatment unit optimized to treat fluid which is directed through it, is disclosed.
    Type: Grant
    Filed: October 8, 2010
    Date of Patent: September 30, 2014
    Assignee: ASML Netherlands B.V.
    Inventor: Johannes Catharinus Hubertus Mulkens
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20140253890
    Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
    Type: Application
    Filed: May 8, 2014
    Publication date: September 11, 2014
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Aleksey Yurievich KOLESNYCHENKO, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen