Patents by Inventor Johannes Gerardus Gijsbertsen

Johannes Gerardus Gijsbertsen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Patent number: 7379153
    Abstract: A lithographic projection apparatus includes an alignment sensor having an electron beam source constructed and arranged to provide an electron beam for impinging on an alignment marker on a substrate, and a back-scattered electron detector constructed and arranged to detect electrons back-scattered from the alignment marker. The alignment sensor is independent of the projection system and beam of radiation, and is an off-axis alignment sensor.
    Type: Grant
    Filed: February 3, 2003
    Date of Patent: May 27, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Gerardus Gijsbertsen, Pieter Willem Horman De Jager, Michiel David Nijkerk
  • Lithographic apparatus and device manufacturing method
    Publication number: 20040013954
    Abstract: A lithographic projection apparatus includes an alignment sensor having an electron beam source constructed and arranged to provide an electron beam for impinging on an alignment marker on a substrate, and a back-scattered electron detector constructed and arranged to detect electrons back-scattered from the alignment marker. The alignment sensor is independent of the projection system and projection radiation, and is an off-axis alignment sensor.
    Type: Application
    Filed: February 3, 2003
    Publication date: January 22, 2004
    Inventors: Johannes Gerardus Gijsbertsen, Pieter Willem Horman De Jager, Michiel David Nijkerk