Abstract: Inlet device and connecting devices for a minimally invasive miniaturized percutaneous mechanical circulatory support system. The inlet device includes an inlet portion and a transfer portion with a support structure. The inlet device can be used for transmitting a body fluid of a patient, for example blood, to an impeller of a pump of the circulatory support system. The connecting device can include a receiving element and an insertion element. The receiving element of the connecting device can include a receiving structure that the insertion element of the connecting device can be pushed into. The insertion element can include at least one slide-on ramp, the slide-on ramp being connectable to the receiving structure in a form-fitting, non-positive, force-locking, and/or self-locking manner. The inlet device can include a receiving element or an insertion element of the connecting device.

Abstract: A lithographic apparatus is disclosed that has a plurality of control circuits, each control circuit arranged to be connected to an associated radiation source of a plurality of radiation sources configured to generate pulses of radiation for projection onto a substrate and each control circuit arranged to control the energy of radiation pulses generated by that associated radiation source.

Abstract: A lithographic apparatus is disclosed that has a plurality of control circuits, each control circuit arranged to be connected to an associated radiation source of a plurality of radiation sources configured to generate pulses of radiation for projection onto a substrate and each control circuit arranged to control the energy of radiation pulses generated by that associated radiation source.

Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam. The illumination system includes a pulsed source of radiation and a controller to control an output of the pulsed source of radiation. The controller includes a dose sensor to measure a dose of a pulse of the source of radiation. The dose sensor includes a dose sensor output to provide a dose signal representative of the measured dose. An integrator unit is connected to the dose sensor output. The integrator unit integrates the dose signal at least twice, an output of the integrator unit provides an integrator output signal including the at least twice integrated dose signal. The output of the integrator unit drives a driving input of the source of radiation with the integrator output signal.

Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam. The illumination system includes a pulsed source of radiation and a controller to control an output of the pulsed source of radiation. The controller includes a dose sensor to measure a dose of a pulse of the source of radiation. The dose sensor includes a dose sensor output to provide a dose signal representative of the measured dose. An integrator unit is connected to the dose sensor output. The integrator unit integrates the dose signal at least twice, an output of the integrator unit provides an integrator output signal including the at least twice integrated dose signal. The output of the integrator unit drives a driving input of the source of radiation with the integrator output signal.

Abstract: A controller for a pulsed radiation source is a closed-loop controller of minimum order, preferably first, to effect dead beat control. Performance indicators for a pulsed radiation source in a lithographic apparatus are based on moving averages (MA) and moving standard deviations (MSD) of the error between target and actual pulse energies. The normalized indicators are given by: MA E , n ? ( x k ) = 1 ? i = k - ( N slit - e - 1 ) k ? ? Ep ref ? ( i ) · ? i = k - ( N slit - e - 1 ) k ? ? Ep err ? ( i ) ? ? ( k = N slit - e ? ? … ? ? N scan ) , wherein Epref(i) and Eperr(i) indicate reference energy per pulse and energy error per pulse for point i and MSD E , n ? ( x k ) = 1 N slit - e - 1 ? ? i = k - ( N slit - e - 1 ) k ? [ Ep err ? ( i ) Ep ref ? ( i ) - MA E , n ? ( x k ) ] 2 ? ? ( k = N slit - e ? ? … ? ? N scan ) .

Abstract: A lithographic apparatus capable of reducing sensitivity to fluctuating scanning speed and improve lithographic scanning processing time, is presented herein. In one embodiment, the apparatus comprises a modulator that modulates a patterned lithographic beam based on the scanning speed as the beam and substrate move relative to each other. The modulator is configured to modulate an attribute of a patterned lithographic beam, such as, the intensity or size of the beam.

Abstract: A lithographic apparatus capable of reducing sensitivity to fluctuating scanning speed and improve lithographic scanning processing time, is presented herein. In one embodiment, the apparatus comprises a modulator that modulates a patterned lithographic beam based on the scanning speed as the beam and substrate move relative to each other. The modulator is configured to modulate an attribute of a patterned lithographic beam, such as, the intensity or size of the beam.

Abstract: A controller for a pulsed radiation source is a closed-loop controller of minimum order, preferably first, to effect dead beat control. Performance indicators for a pulsed radiation source in a lithographic apparatus are based on moving averages (MA) and moving standard deviations (MSD) of the error between target and actual pulse energies.