Patents by Inventor Johannes Hermans

Johannes Hermans has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240160110
    Abstract: A method for improved sequencing of light delivery in a lithographic process includes determining a sequence of intensities of light to be delivered that includes an interval within the sequence of intensities where substantially no light is delivered to the substrate and delivering light to a substrate by a light source utilizing a digital mirror device (DMD) according to the sequence of intensities.
    Type: Application
    Filed: January 23, 2024
    Publication date: May 16, 2024
    Applicant: ASML Netherlands B.V.
    Inventors: Jasper WINTERS, Erwin John VAN ZWET, Marcus Johannes VAN DER LANS, Pieter Willem Herman DE JAGER, Geerten Frans Ijsbrand KRAMER
  • Publication number: 20240140028
    Abstract: A method for producing objects by additive manufacturing including the steps of providing an apparatus for producing objects by additive manufacturing, assigning a production job to the apparatus, acquiring, during use of the apparatus to produce one of the objects, information pertaining to an operating condition of the apparatus determinative of an output performance of the apparatus, and controlling, based on the acquired information, at least one of current production of the object and allocation for future production of a further object. In embodiments, the acquired information pertains to at least one of a calibration status of the apparatus, a time to service of the apparatus, a time remaining to complete the current production of the object, and a quality measure.
    Type: Application
    Filed: January 12, 2024
    Publication date: May 2, 2024
    Inventors: Johannes Franciscus Willebrordus PEETERS, Mark Herman Else VAES
  • Patent number: 11942340
    Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved load lock unit is disclosed. An improved load lock system may comprise a plurality of supporting structures configured to support a wafer and a conditioning plate including a heat transfer element configured to adjust a temperature of the wafer. The load lock system may further comprise a gas vent configured to provide a gas between the conditioning plate and the wafer and a controller configured to assist with the control of the heat transfer element.
    Type: Grant
    Filed: July 6, 2022
    Date of Patent: March 26, 2024
    Assignee: ASML Netherlands B.V.
    Inventors: Jeroen Gerard Gosen, Te-Yu Chen, Dennis Herman Caspar Van Banning, Edwin Cornelis Kadijk, Martijn Petrus Christianus Van Heumen, Erheng Wang, Johannes Andreas Henricus Maria Jacobs
  • Publication number: 20220227962
    Abstract: Disclosed is the use of glycol ether aryl ester plasticizers as viscosity reducing agents in plastisols comprising di(2-ethylhexyl) terephthalate, 1,2-cyclohexane dicarboxylic acid diisononyl ester, or diisononyl phthalate as the primary plasticizer. The glycol ether aryl ester plasticizers improve viscosity and viscosity stability while maintaining or improving plastisol properties such as Shore A Hardness and fusion time.
    Type: Application
    Filed: June 12, 2020
    Publication date: July 21, 2022
    Applicant: Eastman Chemical Company
    Inventors: Pinguan Zheng, Curtis Louis Schilling, III, Cornelius Johannes Hermans, Joseph Alexander DeLoach, Damon Ray Billodeaux
  • Patent number: 11123025
    Abstract: An apparatus for medical imaging of a patient, including an object of interest, is provided. The apparatus comprises a patient support unit, a processor, and a display. The patient support unit is configured to receive a patient. The processor is configured to receive scout images of the patient acquired in respective positions of the apparatus. Each respective position is represented by a position parameter. The processor is further configured to select at least one iso-centering image from the scout images by geometrical calculation using the position parameter of each scout image and a position parameter representing a present position of the apparatus. The processor is further configured to adapt the appearance of the at least one iso-centering image according to the present position of the apparatus. The display is configured to present the at least one adapted iso-centering image.
    Type: Grant
    Filed: January 29, 2018
    Date of Patent: September 21, 2021
    Assignee: KONINKLIJKE PHILIPS N.V.
    Inventors: Daniel Simon Anna Ruijters, Fred Simon Berend Van Nijnatten, Javier Olivan Bescos, Ronaldus Petrus Johannes Hermans, Adrie Baselmans, Ina Klein Teeselink, Jeroen Gerard Scheepens, Walter Everard Carels, Thijs Grunhagen
  • Publication number: 20210210194
    Abstract: An apparatus displays (20) first data on at least one display unit. A user interaction portion of a user input area of at least one input unit is determined (30); and on the at least one display unit a portion of the first data is displayed (40) simultaneously with second image data. The second image data is representative of the user interaction portion of the user input area of the at least one input unit.
    Type: Application
    Filed: March 19, 2021
    Publication date: July 8, 2021
    Inventors: Ronaldus Petrus Johannes HERMANS, Adrie BASELMANS, Ivo Don STUYFZAND
  • Patent number: 10957441
    Abstract: An apparatus displays (20) first data on at least one display unit. A user interaction portion of a user input area of at least one input unit is determined (30); and on the at least one display unit a portion of the first data is displayed (40) simultaneously with second image data. The second image data is representative of the user interaction portion of the user input area of the at least one input unit.
    Type: Grant
    Filed: September 30, 2016
    Date of Patent: March 23, 2021
    Assignee: KONINKLIJKE PHILIPS N.V.
    Inventors: Ronaldus Petrus Johannes Hermans, Adrie Baselmans, Ivo Don Stuyfzand
  • Patent number: 10906684
    Abstract: Disclosed is a system for, or method of, packaging a product within a packaging bag, wherein the packaging bag includes an inner liner and an outer liner. The method including the steps of marking the inner liner with a first marking unit, filling the bag with the product, and subsequently marking the outer liner with a second marking unit. The markings may be machine readable and/or randomly generated and stored in a database. The system may further include a machine reader, which is capable of accessing the database, and which is capable of reading the markings on the inner liner and/or the outer liner, to thus determine if an outer liner subsequently removed from an inner liner is/was the same outer liner associated with the same inner liner, at the time when the bag was filled and/or packaged.
    Type: Grant
    Filed: March 18, 2016
    Date of Patent: February 2, 2021
    Assignee: TECHNOPAK LIMITED
    Inventors: Henricus Jacobus Johannes Hermans, Shane Robert Reckin
  • Patent number: 10705439
    Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
    Type: Grant
    Filed: February 26, 2018
    Date of Patent: July 7, 2020
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Joost Jeroen Ottens, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Marco Polizzi, Edwin Augustinus Matheus Van Gompel, Johannes Petrus Maria Smeulers, Stefan Philip Christiaan Belfroid, Herman Vogel
  • Patent number: 10705432
    Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
    Type: Grant
    Filed: March 15, 2019
    Date of Patent: July 7, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Aleksey Yurievich Kolesnychenko, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen
  • Publication number: 20200093447
    Abstract: The present invention relates to iso-centering an object of interest prior to computer tomography (CT) scanning for examination of a patient in a C-arm CT examination apparatus. In order to provide facilitated positioning and to overcome or at least minimize these drawbacks, a C-arm CT examination apparatus (10) for CT scanning for examination of a patient is provided. The apparatus comprises a patient support unit, an acquisition unit, a data processing and control unit, and a display unit. The patient support unit is configured to bed a patient, free of motion, on the patient support. The acquisition unit is configured to acquire scout images of the patient including the object of interest in a respective position of the apparatus having position parameters.
    Type: Application
    Filed: January 29, 2018
    Publication date: March 26, 2020
    Inventors: DANIEL SIMON ANNA RUIJTERS, FRED SIMON BEREND VAN NIJNATTEN, JAVIER OLIVAN BESCOS, RONALDUS PETRUS JOHANNES HERMANS, ADRIE BASELMANS, INA KLEIN TEESELINK, JEROEN GERARD SCHEEPENS, WALTER EVERARD CARELS, THIJS GRUNHAGEN
  • Patent number: 10599054
    Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
    Type: Grant
    Filed: June 12, 2019
    Date of Patent: March 24, 2020
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Stefan Philip Christiaan Belfroid, Johannes Petrus Maria Smeulers, Herman Vogel
  • Publication number: 20190294058
    Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
    Type: Application
    Filed: June 12, 2019
    Publication date: September 26, 2019
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Stefan Philip Christiaan Belfroid, Johannes Petrus Maria Smeulers, Herman Vogel
  • Publication number: 20190212662
    Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
    Type: Application
    Filed: March 15, 2019
    Publication date: July 11, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Aleksey Yurievich KOLESNYCHENKO, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen
  • Patent number: 10331047
    Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
    Type: Grant
    Filed: August 28, 2017
    Date of Patent: June 25, 2019
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Stefan Philip Christiaan Belfroid, Johannes Petrus Maria Smeulers, Herman Vogel
  • Patent number: 10248033
    Abstract: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.
    Type: Grant
    Filed: September 1, 2017
    Date of Patent: April 2, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Jeroen Johannes Sophia Maria Mertens, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Antonius Johannus Van Der Net, Franciscus Johannes Herman Maria Teunissen, Patricius Aloysius Jacobus Tinnemans, Martinus Cornelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Edwin Augustinus Matheus Van Gompel
  • Patent number: 10234768
    Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
    Type: Grant
    Filed: May 3, 2018
    Date of Patent: March 19, 2019
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Aleksey Yurievich Kolesnychenko, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen
  • Publication number: 20190009942
    Abstract: Disclosed is a system for, or method of, packaging a product within a packaging bag, wherein the packaging bag includes an inner liner and an outer liner. The method including the steps of marking the inner liner with a first marking unit, filling the bag with the product, and subsequently marking the outer liner with a second marking unit. The markings may be machine readable and/or randomly generated and stored in a database. The system may further include a machine reader, which is capable of accessing the database, and which is capable of reading the markings on the inner liner and/or the outer liner, to thus determine if an outer liner subsequently removed from an inner liner is/was the same outer liner associated with the same inner liner, at the time when the bag was filled and/or packaged.
    Type: Application
    Filed: March 18, 2016
    Publication date: January 10, 2019
    Applicant: TECHNOPAK LIMITED
    Inventors: Henricus Jacobus Johannes HERMANS, Shane Robert RECKIN
  • Publication number: 20180275836
    Abstract: The present invention relates to an apparatus for displaying data. It is described to display (20) first data on at least one display unit. A user interaction portion of a user input area of at least one input unit is determined (30); and on the at least one display unit a portion of the first data is displayed (40) simultaneously with second image data, wherein the second image data is representative of the user interaction portion of the user input area of the at least one input unit.
    Type: Application
    Filed: September 30, 2016
    Publication date: September 27, 2018
    Inventors: Ronaldus Petrus Johannes HERMANS, Adrie BASELMANS, Ivo Don STUYFZAND
  • Publication number: 20180246418
    Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
    Type: Application
    Filed: May 3, 2018
    Publication date: August 30, 2018
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Aleksey Yurievich Kolesnychenko, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen