Patents by Inventor Johannes Hermans
Johannes Hermans has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240160110Abstract: A method for improved sequencing of light delivery in a lithographic process includes determining a sequence of intensities of light to be delivered that includes an interval within the sequence of intensities where substantially no light is delivered to the substrate and delivering light to a substrate by a light source utilizing a digital mirror device (DMD) according to the sequence of intensities.Type: ApplicationFiled: January 23, 2024Publication date: May 16, 2024Applicant: ASML Netherlands B.V.Inventors: Jasper WINTERS, Erwin John VAN ZWET, Marcus Johannes VAN DER LANS, Pieter Willem Herman DE JAGER, Geerten Frans Ijsbrand KRAMER
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Publication number: 20240140028Abstract: A method for producing objects by additive manufacturing including the steps of providing an apparatus for producing objects by additive manufacturing, assigning a production job to the apparatus, acquiring, during use of the apparatus to produce one of the objects, information pertaining to an operating condition of the apparatus determinative of an output performance of the apparatus, and controlling, based on the acquired information, at least one of current production of the object and allocation for future production of a further object. In embodiments, the acquired information pertains to at least one of a calibration status of the apparatus, a time to service of the apparatus, a time remaining to complete the current production of the object, and a quality measure.Type: ApplicationFiled: January 12, 2024Publication date: May 2, 2024Inventors: Johannes Franciscus Willebrordus PEETERS, Mark Herman Else VAES
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Patent number: 11942340Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved load lock unit is disclosed. An improved load lock system may comprise a plurality of supporting structures configured to support a wafer and a conditioning plate including a heat transfer element configured to adjust a temperature of the wafer. The load lock system may further comprise a gas vent configured to provide a gas between the conditioning plate and the wafer and a controller configured to assist with the control of the heat transfer element.Type: GrantFiled: July 6, 2022Date of Patent: March 26, 2024Assignee: ASML Netherlands B.V.Inventors: Jeroen Gerard Gosen, Te-Yu Chen, Dennis Herman Caspar Van Banning, Edwin Cornelis Kadijk, Martijn Petrus Christianus Van Heumen, Erheng Wang, Johannes Andreas Henricus Maria Jacobs
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Publication number: 20220227962Abstract: Disclosed is the use of glycol ether aryl ester plasticizers as viscosity reducing agents in plastisols comprising di(2-ethylhexyl) terephthalate, 1,2-cyclohexane dicarboxylic acid diisononyl ester, or diisononyl phthalate as the primary plasticizer. The glycol ether aryl ester plasticizers improve viscosity and viscosity stability while maintaining or improving plastisol properties such as Shore A Hardness and fusion time.Type: ApplicationFiled: June 12, 2020Publication date: July 21, 2022Applicant: Eastman Chemical CompanyInventors: Pinguan Zheng, Curtis Louis Schilling, III, Cornelius Johannes Hermans, Joseph Alexander DeLoach, Damon Ray Billodeaux
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Patent number: 11123025Abstract: An apparatus for medical imaging of a patient, including an object of interest, is provided. The apparatus comprises a patient support unit, a processor, and a display. The patient support unit is configured to receive a patient. The processor is configured to receive scout images of the patient acquired in respective positions of the apparatus. Each respective position is represented by a position parameter. The processor is further configured to select at least one iso-centering image from the scout images by geometrical calculation using the position parameter of each scout image and a position parameter representing a present position of the apparatus. The processor is further configured to adapt the appearance of the at least one iso-centering image according to the present position of the apparatus. The display is configured to present the at least one adapted iso-centering image.Type: GrantFiled: January 29, 2018Date of Patent: September 21, 2021Assignee: KONINKLIJKE PHILIPS N.V.Inventors: Daniel Simon Anna Ruijters, Fred Simon Berend Van Nijnatten, Javier Olivan Bescos, Ronaldus Petrus Johannes Hermans, Adrie Baselmans, Ina Klein Teeselink, Jeroen Gerard Scheepens, Walter Everard Carels, Thijs Grunhagen
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Publication number: 20210210194Abstract: An apparatus displays (20) first data on at least one display unit. A user interaction portion of a user input area of at least one input unit is determined (30); and on the at least one display unit a portion of the first data is displayed (40) simultaneously with second image data. The second image data is representative of the user interaction portion of the user input area of the at least one input unit.Type: ApplicationFiled: March 19, 2021Publication date: July 8, 2021Inventors: Ronaldus Petrus Johannes HERMANS, Adrie BASELMANS, Ivo Don STUYFZAND
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Patent number: 10957441Abstract: An apparatus displays (20) first data on at least one display unit. A user interaction portion of a user input area of at least one input unit is determined (30); and on the at least one display unit a portion of the first data is displayed (40) simultaneously with second image data. The second image data is representative of the user interaction portion of the user input area of the at least one input unit.Type: GrantFiled: September 30, 2016Date of Patent: March 23, 2021Assignee: KONINKLIJKE PHILIPS N.V.Inventors: Ronaldus Petrus Johannes Hermans, Adrie Baselmans, Ivo Don Stuyfzand
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Patent number: 10906684Abstract: Disclosed is a system for, or method of, packaging a product within a packaging bag, wherein the packaging bag includes an inner liner and an outer liner. The method including the steps of marking the inner liner with a first marking unit, filling the bag with the product, and subsequently marking the outer liner with a second marking unit. The markings may be machine readable and/or randomly generated and stored in a database. The system may further include a machine reader, which is capable of accessing the database, and which is capable of reading the markings on the inner liner and/or the outer liner, to thus determine if an outer liner subsequently removed from an inner liner is/was the same outer liner associated with the same inner liner, at the time when the bag was filled and/or packaged.Type: GrantFiled: March 18, 2016Date of Patent: February 2, 2021Assignee: TECHNOPAK LIMITEDInventors: Henricus Jacobus Johannes Hermans, Shane Robert Reckin
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Patent number: 10705439Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.Type: GrantFiled: February 26, 2018Date of Patent: July 7, 2020Assignees: ASML Netherlands B.V., ASML Holding N.V.Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Joost Jeroen Ottens, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Marco Polizzi, Edwin Augustinus Matheus Van Gompel, Johannes Petrus Maria Smeulers, Stefan Philip Christiaan Belfroid, Herman Vogel
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Patent number: 10705432Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.Type: GrantFiled: March 15, 2019Date of Patent: July 7, 2020Assignee: ASML Netherlands B.V.Inventors: Aleksey Yurievich Kolesnychenko, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen
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Publication number: 20200093447Abstract: The present invention relates to iso-centering an object of interest prior to computer tomography (CT) scanning for examination of a patient in a C-arm CT examination apparatus. In order to provide facilitated positioning and to overcome or at least minimize these drawbacks, a C-arm CT examination apparatus (10) for CT scanning for examination of a patient is provided. The apparatus comprises a patient support unit, an acquisition unit, a data processing and control unit, and a display unit. The patient support unit is configured to bed a patient, free of motion, on the patient support. The acquisition unit is configured to acquire scout images of the patient including the object of interest in a respective position of the apparatus having position parameters.Type: ApplicationFiled: January 29, 2018Publication date: March 26, 2020Inventors: DANIEL SIMON ANNA RUIJTERS, FRED SIMON BEREND VAN NIJNATTEN, JAVIER OLIVAN BESCOS, RONALDUS PETRUS JOHANNES HERMANS, ADRIE BASELMANS, INA KLEIN TEESELINK, JEROEN GERARD SCHEEPENS, WALTER EVERARD CARELS, THIJS GRUNHAGEN
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Patent number: 10599054Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.Type: GrantFiled: June 12, 2019Date of Patent: March 24, 2020Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Stefan Philip Christiaan Belfroid, Johannes Petrus Maria Smeulers, Herman Vogel
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Publication number: 20190294058Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.Type: ApplicationFiled: June 12, 2019Publication date: September 26, 2019Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Stefan Philip Christiaan Belfroid, Johannes Petrus Maria Smeulers, Herman Vogel
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Publication number: 20190212662Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.Type: ApplicationFiled: March 15, 2019Publication date: July 11, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Aleksey Yurievich KOLESNYCHENKO, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen
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Patent number: 10331047Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.Type: GrantFiled: August 28, 2017Date of Patent: June 25, 2019Assignee: ASML NETHERLANDS B.V.Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Stefan Philip Christiaan Belfroid, Johannes Petrus Maria Smeulers, Herman Vogel
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Patent number: 10248033Abstract: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.Type: GrantFiled: September 1, 2017Date of Patent: April 2, 2019Assignee: ASML Netherlands B.V.Inventors: Jeroen Johannes Sophia Maria Mertens, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Antonius Johannus Van Der Net, Franciscus Johannes Herman Maria Teunissen, Patricius Aloysius Jacobus Tinnemans, Martinus Cornelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Edwin Augustinus Matheus Van Gompel
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Patent number: 10234768Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.Type: GrantFiled: May 3, 2018Date of Patent: March 19, 2019Assignee: ASML NETHERLANDS B.V.Inventors: Aleksey Yurievich Kolesnychenko, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen
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Publication number: 20190009942Abstract: Disclosed is a system for, or method of, packaging a product within a packaging bag, wherein the packaging bag includes an inner liner and an outer liner. The method including the steps of marking the inner liner with a first marking unit, filling the bag with the product, and subsequently marking the outer liner with a second marking unit. The markings may be machine readable and/or randomly generated and stored in a database. The system may further include a machine reader, which is capable of accessing the database, and which is capable of reading the markings on the inner liner and/or the outer liner, to thus determine if an outer liner subsequently removed from an inner liner is/was the same outer liner associated with the same inner liner, at the time when the bag was filled and/or packaged.Type: ApplicationFiled: March 18, 2016Publication date: January 10, 2019Applicant: TECHNOPAK LIMITEDInventors: Henricus Jacobus Johannes HERMANS, Shane Robert RECKIN
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Publication number: 20180275836Abstract: The present invention relates to an apparatus for displaying data. It is described to display (20) first data on at least one display unit. A user interaction portion of a user input area of at least one input unit is determined (30); and on the at least one display unit a portion of the first data is displayed (40) simultaneously with second image data, wherein the second image data is representative of the user interaction portion of the user input area of the at least one input unit.Type: ApplicationFiled: September 30, 2016Publication date: September 27, 2018Inventors: Ronaldus Petrus Johannes HERMANS, Adrie BASELMANS, Ivo Don STUYFZAND
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Publication number: 20180246418Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.Type: ApplicationFiled: May 3, 2018Publication date: August 30, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Aleksey Yurievich Kolesnychenko, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen