Patents by Inventor Johannes J Baselmans

Johannes J Baselmans has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic method and apparatus
    Patent number: 6855486
    Abstract: A method of imaging a pattern in a microlithographic exposure apparatus includes performing two exposures, each with a different mask, the superposition of the images defined by the two masks produces the complete circuit pattern. A dipolar illumination mode is used for each exposure, the dipoles of the two exposures being mutually perpendicular. The dipolar illumination mode of the first exposure is used to image mask features parallel to a first direction, and the dipolar illumination mode of the second exposure is used to image mask features perpendicular to the first direction.
    Type: Grant
    Filed: September 28, 2000
    Date of Patent: February 15, 2005
    Assignee: ASML Netherlands B.V.
    Inventors: Jozef M Finders, Johannes J Baselmans, Donis G Flagello, Igor P Bouchoms
  • Lithography apparatus
    Publication number: 20010001247
    Abstract: An illumination system for a microlithographic exposure apparatus comprises an adjustable axicon, a variable zoom element, and a multipole illumination mode generating element. By controlling the optical components, the illumination mode can be varied continuously between conventional, annular, and multipole.
    Type: Application
    Filed: December 12, 2000
    Publication date: May 17, 2001
    Inventors: Jozef M. Finders, Johannes J. Baselmans, Donis G. Flagello, Igor P. Bouchoms