Patents by Inventor Johannes Jacobus Lambertus Mulders

Johannes Jacobus Lambertus Mulders has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190172696
    Abstract: A method of performing Secondary Ion Mass Spectrometry, comprising: Providing a specimen on a specimen holder; Using an ion beam to irradiate a region of a surface of said specimen, thereby producing ablated specimen material; Collecting ionized constituents of said ablated material in a mass analyzer, and sorting them according to species, further comprising: Providing a catalytic gas proximal said region of the specimen surface during said irradiation, said gas comprising a component selected from the group comprising perfluoroalkanes and their isomers.
    Type: Application
    Filed: October 29, 2018
    Publication date: June 6, 2019
    Inventor: Johannes Jacobus Lambertus Mulders
  • Patent number: 9617641
    Abstract: The invention provides a method for providing an Au-containing layer onto a surface of a work piece, which method comprises: providing 510 a deposition fluid comprising Au(CO)Cl; depositing 520 the fluid on at least part of the surface of the work piece; and directing 530 a charged particle beam toward the surface of the work piece onto which at least part of the fluid is deposited to decompose Au(CO)Cl thereby forming the Au-containing layer on the surface of the work piece. By using Au(CO)Cl as a precursor for charged particle induced deposition, a gold Au layer may be deposited with a very high purity compared to methods known in the art.
    Type: Grant
    Filed: June 11, 2010
    Date of Patent: April 11, 2017
    Assignee: FEI Company
    Inventor: Johannes Jacobus Lambertus Mulders
  • Publication number: 20160244871
    Abstract: A Gas Injection System (GIS) applies at least two fluids in the vacuum chamber of a particle-optical apparatus, the gas injection system having two or more channels. Each channel is connected to an associated reservoir holding a fluid at a first side and having an associated exit opening at the other side, the exit sides individually exiting to the outside of the GIS via a nozzle with a nozzle opening. At least two exit openings separated by less than the diameter of the channels near the exit openings, preferably concentric to each other.
    Type: Application
    Filed: February 24, 2016
    Publication date: August 25, 2016
    Applicant: FEI Company
    Inventors: Johannes Jacobus Lambertus Mulders, Petrus Hubertus Franciscus Trompenaars, Pleun Dona
  • Patent number: 9406482
    Abstract: A charged-particle microscope with Raman spectroscopy capability and a method for examining a sample using a combined charged-particle microscope and Raman spectroscope. The method includes imaging a region of a sample by irradiating the sample with a beam of charged particles from the microscope; identifying a feature of interest in the region using the microscope; radiatively stimulating and spectroscopically analyzing a portion of the region comprising the feature of interest using a light spot of a width D from the spectroscope, wherein the feature of interest has at least one lateral dimension smaller than width D and, prior to using the light spot of the width D from the spectroscope, an in situ surface modification technique is used to cause positive discrimination of an expected Raman signal from the feature of interest relative to an expected Raman signal from the part of the portion other than the feature of interest.
    Type: Grant
    Filed: July 8, 2014
    Date of Patent: August 2, 2016
    Assignee: FEI COMPANY
    Inventors: Johannes Jacobus Lambertus Mulders, Laurens Kuipers
  • Patent number: 9206504
    Abstract: Samples to be imaged in a Transmission Electron Microscope must be thinned to form a lamella with a thickness of, for example, 20 nm. This is commonly done by sputtering with ions in a charged particle apparatus equipped with a Scanning Electron Microscope (SEM) column, a Focused Ion Beam (FIB) column, and one or more Gas Injection Systems (GISses). A problem that occurs is that a large part of the lamella becomes amorphous due to bombardment by ions, and that ions get implanted in the sample. The invention provides a solution by applying a voltage difference between the capillary of the GIS and the sample, and directing a beam of ions or electrons to the jet of gas. The beam ionizes gas that is accelerated to the sample, where (when using a low voltage between sample and GIS) low energy milling occurs, and thus little sample thickness becomes amorphous.
    Type: Grant
    Filed: April 2, 2014
    Date of Patent: December 8, 2015
    Assignee: FEI Company
    Inventors: Johannes Jacobus Lambertus Mulders, Remco Theodorus Johannes Petrus Geurts, Petrus Hubertus Franciscus Trompenaars, Eric Gerardus Theodoor Bosch
  • Publication number: 20150009489
    Abstract: A charged-particle microscope with Raman spectroscopy capability and a method for examining a sample using a combined charged-particle microscope and Raman spectroscope. The method includes imaging a region of a sample by irradiating the sample with a beam of charged particles from the microscope; identifying a feature of interest in the region using the microscope; radiatively stimulating and spectroscopically analyzing a portion of the region comprising the feature of interest using a light spot of a width D from the spectroscope, wherein the feature of interest has at least one lateral dimension smaller than width D and, prior to using the light spot of the width D from the spectroscope, an in situ surface modification technique is used to cause positive discrimination of an expected Raman signal from the feature of interest relative to an expected Raman signal from the part of the portion other than the feature of interest.
    Type: Application
    Filed: July 8, 2014
    Publication date: January 8, 2015
    Inventors: Johannes Jacobus Lambertus Mulders, Laurens Kuipers
  • Patent number: 8884248
    Abstract: The invention relates to a method of forming a vitrified sample on a sample holder for inspection in an electron microscope. It is known to spray a solution on a grid and then immerse the grid in a cryogenic liquid, such as ethane or liquid nitrogen. The invention proposes to spray small droplets of the liquid on a cryogenic surface, such as a grid or a sample holder in vacuum. The liquid forms vitrified sample material when hitting the surface due to the low temperature of the grid or sample holder. A lamella may be excavated from the thus formed sample material, to be studied in a TEM, or the vitrified sample material may be directly observed in a SEM. In an embodiment the material may be sprayed on a cryogenic liquid, to be scooped from the liquid and placed on a grid.
    Type: Grant
    Filed: February 13, 2013
    Date of Patent: November 11, 2014
    Assignee: FEI Company
    Inventors: Johannes Jacobus Lambertus Mulders, Rudolf Johannes Peter Gerardus Schampers, Petrus Hubertus Franciscus Trompenaars
  • Publication number: 20140302252
    Abstract: Samples to be imaged in a Transmission Electron Microscope must be thinned to form a lamella with a thickness of, for example, 20 nm. This is commonly done by sputtering with ions in a charged particle apparatus equipped with a Scanning Electron Microscope (SEM) column, a Focused Ion Beam (FIB) column, and one or more Gas Injection Systems (GISses). A problem that occurs is that a large part of the lamella becomes amorphous due to bombardment by ions, and that ions get implanted in the sample. The invention provides a solution by applying a voltage difference between the capillary of the GIS and the sample, and directing a beam of ions or electrons to the jet of gas. The beam ionizes gas that is accelerated to the sample, where (when using a low voltage between sample and GIS) low energy milling occurs, and thus little sample thickness becomes amorphous.
    Type: Application
    Filed: April 2, 2014
    Publication date: October 9, 2014
    Applicant: FEI Company
    Inventors: Johannes Jacobus Lambertus Mulders, Remco Theodorus Johannes Petrus Geurts, Petrus Hubertus Franciscus Trompenaars, Eric Gerardus Theodoor Bosch
  • Patent number: 8796646
    Abstract: A method of depositing material onto a substrate at cryogenic temperatures using beam-induced deposition. A precursor gas is chosen from a group of compounds having a melting point that is lower than the cryogenic temperature of the substrate. Preferably the precursor gas is chosen from a group of compounds having a sticking coefficient that is between 0.5 and 0.8 at the desired cryogenic temperature. This will result in the precursor gas reaching equilibrium between precursor molecules adsorbed onto the substrate surface and precursor gas molecules desorbing from the substrate surface at the desired cryogenic temperature. Suitable precursor gases can comprise alkanes, alkenes, or alkynes. At a cryogenic temperature of between ?50° C. and ?85° C., hexane can be used as a precursor gas to deposit material; at a cryogenic temperature of between ?50° C. and ?180° C., propane can be used as a precursor gas.
    Type: Grant
    Filed: June 29, 2011
    Date of Patent: August 5, 2014
    Assignee: Fei Company
    Inventors: Johannes Jacobus Lambertus Mulders, Petrus Hubertus Franciscus Trompenaars
  • Patent number: 8598542
    Abstract: Electron-beam-induced chemical reactions with precursor gases are controlled by adsorbate depletion control. Adsorbate depletion can be controlled by controlling the beam current, preferably by rapidly blanking the beam, and by cooling the substrate. The beam preferably has a low energy to reduce the interaction volume. By controlling the depletion and the interaction volume, a user has the ability to produce precise shapes.
    Type: Grant
    Filed: March 8, 2010
    Date of Patent: December 3, 2013
    Assignee: FEI Company
    Inventors: Milos Toth, Richard J. Young, Alexander Henstra, Alan Frank de Jong, Johannes Jacobus Lambertus Mulders
  • Patent number: 8597565
    Abstract: A method for forming microscopic 3D structures. In the method according to the invention a substrate (105) is placed in a Scanning Electron Microscope (SEM). The SEM is equipped with a Gas Injection System (GIS) (110) for directing a jet of precursor fluid to the substrate. The substrate is cooled below the freezing point of the precursor gas so that a frozen layer of the precursor gas can be applied to the substrate. By now repeatedly applying a frozen layer of the precursor to the substrate and irradiate the frozen layer with an electron beam (102), a stack of frozen layers (130) is built, each layer showing an irradiated part (131) in which the precursor is converted to another material. After applying the last layer the temperature is raised so that the unprocessed precursor (132) can evaporate. As a result 3D structures with overhanging features can be built.
    Type: Grant
    Filed: March 31, 2010
    Date of Patent: December 3, 2013
    Assignee: FEI Company
    Inventors: Jacob Simon Faber, Johannes Jacobus Lambertus Mulders, Alan Frank de Jong, Carmen Francisca Maria van Vilsteren
  • Patent number: 8431896
    Abstract: The invention relates to a method for obtaining images from slices of a specimen, the method comprising: repeatedly obtaining an image of the surface layer of the specimen (1) and removing the surface layer of the specimen, thereby bringing the next slice to the surface; characterized in that after at least one of the removals of a surface layer the specimen is exposed to a staining agent. This method is especially suited for use in a particle-optical instrument equipped with both a scanning electron microscope column (20) and a focused ion beam column (10). The specimen can e.g. be stained in situ by admitting a gas, such as OsO4 (osmiumtetroxide), to the specimen. This method also makes it possible to perform differential staining by first making an image of the specimen exposed to a first staining agent, and subsequently making an image of the specimen when it is additionally stained by a second staining agent.
    Type: Grant
    Filed: May 31, 2011
    Date of Patent: April 30, 2013
    Assignee: FEI Company
    Inventors: Johannes Jacobus Lambertus Mulders, Laurent Roussel, Wilhelmus Michael Busing
  • Patent number: 8268532
    Abstract: The invention relates to a method for forming microscopic structures. By scanning a focused particle beam over a substrate in the presence of a precursor fluid, a patterned seed layer is formed. By now growing this layer with Atomic Layer Deposition or Chemical Vapor Deposition, a high quality layer can be grown. An advantage of this method is that forming the seed layer takes relatively little time, as only a very thin layer needs to be deposited.
    Type: Grant
    Filed: December 18, 2009
    Date of Patent: September 18, 2012
    Assignee: FEI Company
    Inventors: Alan Frank De Jong, Johannes Jacobus Lambertus Mulders, Wilhelmus Mathijs Marie Kessels, Adriaan Jacobus Martinus Mackus
  • Patent number: 8168948
    Abstract: The invention relates to a method for producing high-quality samples for e.g. TEM inspection. When thinning samples with e.g. a Focused Ion Beam apparatus (FIB), the sample often oxidizes when taken from the FIB due to the exposure to air. This results in low-quality samples, that may be unfit for further analysis. By forming a passivation layer, preferably a hydrogen passivation layer, on the sample in situ, that is: before taking the sample from the FIB, high quality TEM samples can be produced.
    Type: Grant
    Filed: August 7, 2009
    Date of Patent: May 1, 2012
    Assignee: FEI Company
    Inventors: Aurélien Philippe Jean Maclou Botman, Bert Henning Freitag, Johannes Jacobus Lambertus Mulders
  • Publication number: 20120003394
    Abstract: A method of depositing material onto a substrate at cryogenic temperatures using beam-induced deposition. A precursor gas is chosen from a group of compounds having a melting point that is lower than the cryogenic temperature of the substrate. Preferably the precursor gas is chosen from a group of compounds having a sticking coefficient that is between 0.5 and 0.8 at the desired cryogenic temperature. This will result in the precursor gas reaching equilibrium between precursor molecules adsorbed onto the substrate surface and precursor gas molecules desorbing from the substrate surface at the desired cryogenic temperature. Suitable precursor gases can comprise alkanes, alkenes, or alkynes. At a cryogenic temperature of between ?50° C. and ?85° C., hexane can be used as a precursor gas to deposit material; at a cryogenic temperature of between ?50° C. and ?180° C., propane can be used as a precursor gas.
    Type: Application
    Filed: June 29, 2011
    Publication date: January 5, 2012
    Applicant: FEI Company
    Inventors: Johannes Jacobus Lambertus Mulders, Petrus Hubertus Franciscus Trompenaars
  • Publication number: 20110226819
    Abstract: The invention relates to a method for obtaining images from slices of a specimen, the method comprising: repeatedly obtaining an image of the surface layer of the specimen (1) and removing the surface layer of the specimen, thereby bringing the next slice to the surface; characterized in that after at least one of the removals of a surface layer the specimen is exposed to a staining agent. This method is especially suited for use in a particle-optical instrument equipped with both a scanning electron microscope column (20) and a focused ion beam column (10). The specimen can e.g. be stained in situ by admitting a gas, such as OsO4 (osmiumtetroxide), to the specimen. This method also makes it possible to perform differential staining by first making an image of the specimen exposed to a first staining agent, and subsequently making an image of the specimen when it is additionally stained by a second staining agent.
    Type: Application
    Filed: May 31, 2011
    Publication date: September 22, 2011
    Applicant: FEI COMPANY
    Inventors: Johannes Jacobus Lambertus Mulders, Laurent Roussel, Wilhelmus Michael Busing
  • Patent number: 7977631
    Abstract: The invention relates to a method for obtaining images from slices of a specimen, the method comprising: repeatedly obtaining an image of the surface layer of the specimen (1) and removing the surface layer of the specimen, thereby bringing the next slice to the surface; characterized in that after at least one of the removals of a surface layer the specimen is exposed to a staining agent. This method is especially suited for use in a particle-optical instrument equipped with both a scanning electron microscope column (20) and a focused ion beam column (10). The specimen can e.g. be stained in situ by admitting a gas, such as OsO4 (osmiumtetroxide), to the specimen. This method also makes it possible to perform differential staining by first making an image of the specimen exposed to a first staining agent, and subsequently making an image of the specimen when it is additionally stained by a second staining agent.
    Type: Grant
    Filed: August 14, 2007
    Date of Patent: July 12, 2011
    Assignee: FEI Company
    Inventors: Johannes Jacobus Lambertus Mulders, Laurent Roussel, Wilhelmus Michael Busing
  • Publication number: 20100316811
    Abstract: The invention provides a method for providing an Au-containing layer onto a surface of a work piece, which method comprises: providing 510 a deposition fluid comprising Au(CO)Cl; depositing 520 the fluid on at least part of the surface of the work piece; and directing 530 a charged particle beam toward the surface of the work piece onto which at least part of the fluid is deposited to decompose Au(CO)Cl thereby forming the Au-containing layer on the surface of the work piece. By using Au(CO)Cl as a precursor for charged particle induced deposition, a gold Au layer may be deposited with a very high purity compared to methods known in the art.
    Type: Application
    Filed: June 11, 2010
    Publication date: December 16, 2010
    Applicant: FEI COMPANY
    Inventor: Johannes Jacobus Lambertus Mulders
  • Publication number: 20100255213
    Abstract: A method for forming microscopic 3D structures. In the method according to the invention a substrate (105) is placed in a Scanning Electron Microscope (SEM). The SEM is equipped with a Gas Injection System (GIS) (110) for directing a jet of precursor fluid to the substrate. The substrate is cooled below the freezing point of the precursor gas so that a frozen layer of the precursor gas can be applied to the substrate. By now repeatedly applying a frozen layer of the precursor to the substrate and irradiate the frozen layer with an electron beam (102), a stack of frozen layers (130) is built, each layer showing an irradiated part (131) in which the precursor is converted to another material. After applying the last layer the temperature is raised so that the unprocessed precursor (132) can evaporate. As a result 3D structures with overhanging features can be built.
    Type: Application
    Filed: March 31, 2010
    Publication date: October 7, 2010
    Applicant: FEI COMPANY
    Inventors: Jacob Simon Faber, Johannes Jacobus Lambertus Mulders, Alan Frank de Jong, Carmen Francisca Maria van Vilsteren
  • Publication number: 20100224592
    Abstract: Electron-beam-induced chemical reactions with precursor gases are controlled by adsorbate depletion control. Adsorbate depletion can be controlled by controlling the beam current, preferably by rapidly blanking the beam, and by cooling the substrate. The beam preferably has a low energy to reduce the interaction volume. By controlling the depletion and the interaction volume, a user has the ability to produce precise shapes.
    Type: Application
    Filed: March 8, 2010
    Publication date: September 9, 2010
    Applicant: FEI COMPANY
    Inventors: MILOS TOTH, Richard J. Young, Alexander Henstra, Alan Frank de Jong, Johannes Jacobus Lambertus Mulders