Patents by Inventor Johannes Kaschke

Johannes Kaschke has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods and fabrication tools for fabricating optical devices
    Patent number: 9052597
    Abstract: An embodiment of the present invention relates to a method of fabricating an optical device, the method comprising the steps of: depositing a photoresist layer on a carrier, said photoresist layer containing at least one optical component, determining the position of the at least one optical component inside the photoresist layer before exposing the photoresist layer to a first radiation, said first radiation being capable of transforming the photoresist layer from an unmodified state to a modified state, elaborating a device pattern based on the position of the at least one optical component, and fabricating the elaborated device pattern by locally exposing the photoresist layer to the first radiation and locally transforming the photoresist layer from the unmodified state to the modified state.
    Type: Grant
    Filed: April 4, 2013
    Date of Patent: June 9, 2015
    Assignees: HUMBOLDT-UNIVERSITÄT ZU BERLIN, KARLSRUHER INSTITUTE FÜR TECHNOLOGIE
    Inventors: Andreas Schell, Joachim Fischer, Johannes Kaschke, Oliver Benson, Martin Wegener
  • METHODS AND FABRICATION TOOLS FOR FABRICATING OPTICAL DEVICES
    Publication number: 20140302442
    Abstract: An embodiment of the present invention relates to a method of fabricating an optical device, the method comprising the steps of: depositing a photoresist layer on a carrier, said photoresist layer containing at least one optical component, determining the position of the at least one optical component inside the photoresist layer before exposing the photoresist layer to a first radiation, said first radiation being capable of transforming the photoresist layer from an unmodified state to a modified state, elaborating a device pattern based on the position of the at least one optical component, and fabricating the elaborated device pattern by locally exposing the photoresist layer to the first radiation and locally transforming the photoresist layer from the unmodified state to the modified state.
    Type: Application
    Filed: April 4, 2013
    Publication date: October 9, 2014
    Inventors: Andreas SCHELL, Joachim Fischer, Johannes Kaschke, Oliver Benson, Martin Wegener