Patents by Inventor Johannes Moll
Johannes Moll has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20230136691Abstract: Various aspects of systems and methods are provided herein wherein a method, is provided including the steps of: depositing a hot, flexible ribbon material along a plurality of sequentially conveyed molds; rolling a pinch roller over the surface of the ribbon, such that at least one pinch region is actuated in the ribbon as the ribbon is pinched between a pinch edge of the pinch roller and the surface of the mold; and rolling a pin roller over the surface of the ribbon, cooling the ribbon to thereby separate the ribbon along the pinch region into discrete parts.Type: ApplicationFiled: March 30, 2021Publication date: May 4, 2023Inventors: William Edward Lock, Johannes Moll, Cheng-Gang Zhuang
-
Patent number: 11608291Abstract: The described embodiments relate generally to a micro-perforated panel systems and methods for noise abatement and method of making a micro-perforated panel system. In particular, embodiments relate to glass micro-perforated panel systems and methods for their construction.Type: GrantFiled: October 31, 2017Date of Patent: March 21, 2023Assignee: CORNING INCORPORATEDInventors: Andres Covarrubias Jaramillo, Daniel Wayne Levesque, Jr., Johannes Moll, Michael S Pambianchi, Prashanth Abraham Vanniamparambil
-
Publication number: 20220057561Abstract: Apparatus can comprise a light source and a light guide plate. The light guide plate can comprise a plurality of features within an interior of the light guide plate. A feature of the plurality of features can comprise a first refractive index that is different from a refractive index of the light guide plate. A spacing between a pair of adjacent features of the plurality of features can be from about 20 micrometers to about 200 micrometers. The apparatus can be used to direct light out of the light guide plate with a peak radiance oriented from 0° to 30° from a direction normal to the first major surface of the light guide plate. Methods of making the apparatus can comprise emitting a burst of pulses from a laser. Methods can comprise focusing the burst of pulses into a line focus within the light guide plate.Type: ApplicationFiled: January 7, 2020Publication date: February 24, 2022Inventors: Patrick Scott Leslie, Shenping Li, Leonard Thomas Masters, Johannes Moll, Craig John Mancusi Ungaro
-
Patent number: 11001523Abstract: Strengthened glass articles having laser etched features, electronic devices, and methods of fabricating etched features in strengthened glass articles are disclosed. In one embodiment, a strengthened glass article includes a first strengthened surface layer and a second strengthened surface layer under a compressive stress and extending from a first surface and a second surface, respectively, of the strengthened glass article to a depth of layer, and a central region between the first strengthened surface layer and the second strengthened surface layer that is under tensile stress. The strengthened glass article further includes at least one etched feature formed by laser ablation within the first surface or the second surface having a depth that is less than the depth of layer and a surface roughness that is greater than a surface roughness of the first surface or second surface outside of the at least one etched feature.Type: GrantFiled: February 27, 2018Date of Patent: May 11, 2021Assignee: CORNING INCORPORATEDInventors: Johannes Moll, James Joseph Price, Alranzo Boh Ruffin, Sergio Tsuda, Robert Stephen Wagner, James Joseph Watkins
-
Publication number: 20200262742Abstract: The described embodiments relate generally to a micro-perforated panel systems and methods for noise abatement and method of making a micro-perforated panel system. In particular, embodiments relate to glass micro-perforated panel systems and methods for their construction.Type: ApplicationFiled: October 31, 2017Publication date: August 20, 2020Inventors: Andres Covarrubias Jaramillo, Daniel Wayne Levesque, Jr., Johannes Moll, Michael S Pambianchi, Prashanth Abraham Vanniamparambil
-
Patent number: 10732126Abstract: A method of inspecting defects on a transparent substrate may include: selecting a gradient of an illumination optical system so that light incident on the transparent substrate has a first angle; selecting a gradient of a detection optical system so that an optical axis of the detection optical system located over the transparent substrate has a second angle, which is equal to or less than the first angle; adjusting a position of at least one of the illumination optical system, the transparent substrate, and the detection optical system so that a field-of-view of the detection optical system covers a first region where the light meets a first surface of the transparent substrate and does not cover a second region where light meets a second surface of the transparent substrate, the second surface being opposite to the first surface; illuminating the transparent substrate; and detecting light scattered from the transparent substrate.Type: GrantFiled: October 31, 2017Date of Patent: August 4, 2020Assignee: Corning IncorporatedInventors: Chong Pyung An, Uta-Barbara Goers, En Hong, Sung-chan Hwang, Ji Hwa Jung, Tae-ho Keem, Philip Robert LeBlanc, Hyeong-cheol Lee, Michal Mlejnek, Johannes Moll, Rajeshkannan Palanisamy, Sung-jong Pyo, Amanda Kathryn Thomas, Correy Robert Ustanik
-
Publication number: 20190277774Abstract: A method of inspecting defects on a transparent substrate may include: selecting a gradient of an illumination optical system so that light incident on the transparent substrate has a first angle; selecting a gradient of a detection optical system so that an optical axis of the detection optical system located over the transparent substrate has a second angle, which is equal to or less than the first angle; adjusting a position of at least one of the illumination optical system, the transparent substrate, and the detection optical system so that a field-of-view of the detection optical system covers a first region where the light meets a first surface of the transparent substrate and does not cover a second region where light meets a second surface of the transparent substrate, the second surface being opposite to the first surface; illuminating the transparent substrate; and detecting light scattered from the transparent substrate.Type: ApplicationFiled: October 31, 2017Publication date: September 12, 2019Inventors: Chong Pyung An, Uta-Barbara Goers, En Hong, Sung-chan Hwang, Ji Hwa Jung, Tae-ho Keem, Philip Robert LeBlanc, Hyeong-cheol Lee, Michal Mlejnek, Johannes Moll, Rajeshkannan Palanisamy, Sung-jong Pyo, Amanda Kathryn Thomas, Correy Robert Ustanik
-
Publication number: 20180186693Abstract: Strengthened glass articles having laser etched features, electronic devices, and methods of fabricating etched features in strengthened glass articles are disclosed. In one embodiment, a strengthened glass article includes a first strengthened surface layer and a second strengthened surface layer under a compressive stress and extending from a first surface and a second surface, respectively, of the strengthened glass article to a depth of layer, and a central region between the first strengthened surface layer and the second strengthened surface layer that is under tensile stress. The strengthened glass article further includes at least one etched feature formed by laser ablation within the first surface or the second surface having a depth that is less than the depth of layer and a surface roughness that is greater than a surface roughness of the first surface or second surface outside of the at least one etched feature.Type: ApplicationFiled: February 27, 2018Publication date: July 5, 2018Inventors: Johannes Moll, James Joseph Price, Alranzo Boh Ruffin, Sergio Tsuda, Robert Stephen Wagner, James Joseph Watkins
-
Patent number: 9938186Abstract: Strengthened glass articles having laser etched features, electronic devices, and methods of fabricating etched features in strengthened glass articles are disclosed. In one embodiment, a strengthened glass article includes a first strengthened surface layer and a second strengthened surface layer under a compressive stress and extending from a first surface and a second surface, respectively, of the strengthened glass article to a depth of layer, and a central region between the first strengthened surface layer and the second strengthened surface layer that is under tensile stress. The strengthened glass article further includes at least one etched feature formed by laser ablation within the first surface or the second surface having a depth that is less than the depth of layer and a surface roughness that is greater than a surface roughness of the first surface or second surface outside of the at least one etched feature.Type: GrantFiled: March 13, 2013Date of Patent: April 10, 2018Assignee: CORNING INCORPORATEDInventors: Johannes Moll, James Joseph Price, Alranzo Boh Ruffin, Sergio Tsuda, Robert Stephen Wagner, James Joseph Watkins
-
Publication number: 20130273324Abstract: Strengthened glass articles having laser etched features, electronic devices, and methods of fabricating etched features in strengthened glass articles are disclosed. In one embodiment, a strengthened glass article includes a first strengthened surface layer and a second strengthened surface layer under a compressive stress and extending from a first surface and a second surface, respectively, of the strengthened glass article to a depth of layer, and a central region between the first strengthened surface layer and the second strengthened surface layer that is under tensile stress. The strengthened glass article further includes at least one etched feature formed by laser ablation within the first surface or the second surface having a depth that is less than the depth of layer and a surface roughness that is greater than a surface roughness of the first surface or second surface outside of the at least one etched feature.Type: ApplicationFiled: March 13, 2013Publication date: October 17, 2013Applicant: CORNING INCORPORATEDInventors: Johannes Moll, James Joseph Price, Alranzo Boh Ruffin, Sergio Tsuda, Robert Stephen Wagner, James Joseph Watkins
-
Patent number: 8334986Abstract: Methods and apparatus for measuring thickness of a thin film include: obtaining a high-speed thickness measurement of a thin film using a laser projection system and detector array, obtaining thickness measurements of the thin film at one or more locations using a single-point measurement apparatus and determining the accuracy of the high-speed measurement values by comparing them to one or more of the absolute thickness values of the film as measured by the single-point measurement apparatus.Type: GrantFiled: February 25, 2010Date of Patent: December 18, 2012Assignee: Corning IncorporatedInventor: Johannes Moll
-
Patent number: 8115932Abstract: Methods and apparatus for measuring ion implant dose in a material provide for: measuring a reflection spectrum through an implantation surface of the material, the implantation surface having been subjected to an ion implantation process to create a material layer from the implantation surface to a depth within the material and a layer of weakness below the material layer; storing magnitudes of the reflection spectrum as a function of respective wavelengths of incident light on the implantation surface; and computing an ion implant dose used during the ion implantation process based on comparisons of at least two magnitudes of the reflection spectrum at least two corresponding wavelengths of the incident light.Type: GrantFiled: May 28, 2009Date of Patent: February 14, 2012Assignee: Corning IncorporatedInventor: Johannes Moll
-
Publication number: 20110205540Abstract: Methods and apparatus for measuring thickness of a thin film include: obtaining a high-speed thickness measurement of a thin film using a laser projection system and detector array, obtaining thickness measurements of the thin film at one or more locations using a single-point measurement apparatus and determining the accuracy of the high-speed measurement values by comparing them to one or more of the absolute thickness values of the film as measured by the single-point measurement apparatus.Type: ApplicationFiled: February 25, 2010Publication date: August 25, 2011Inventor: Johannes Moll
-
Publication number: 20110016975Abstract: Methods and apparatus for measuring, in-situ, at least one characteristic of a bonding process between a material sheet and a substrate, include: producing acoustic signals in response to acoustic energy within at least one of the material sheet and the substrate proximate to a bonding interface between the material sheet and the substrate; and deriving the at least one characteristic of the bonding process from the acoustic signals.Type: ApplicationFiled: July 24, 2009Publication date: January 27, 2011Inventors: Gregory Scott Glaesemann, Jessica Danielle Maurer, Johannes Moll, Jayantha Senawiratne
-
Publication number: 20100302547Abstract: Methods and apparatus for measuring ion implant dose in a material provide for: measuring a reflection spectrum through an implantation surface of the material, the implantation surface having been subjected to an ion implantation process to create a material layer from the implantation surface to a depth within the material and a layer of weakness below the material layer; storing magnitudes of the reflection spectrum as a function of respective wavelengths of incident light on the implantation surface; and computing an ion implant dose used during the ion implantation process based on comparisons of at least two magnitudes of the reflection spectrum at least two corresponding wavelengths of the incident light.Type: ApplicationFiled: May 28, 2009Publication date: December 2, 2010Inventor: Johannes Moll
-
Patent number: 7265070Abstract: Disclosed is a synthetic silica glass optical material having high resistance to optical damage by ultraviolet radiation in the ultraviolet wavelength range, particularly in the wavelength region of less than about 250 nm and particularly, exhibiting a low laser induced density change. The synthetic silica glass optical material of the present invention contains at least about 0.1 ppm of aluminum and H2 concentration levels greater than about 0.5×1017 molecules/cm2. Additionally, the synthetic silica optical material of the present invention exhibits an H2 to Al ratio of greater than about 1.2, as measured in ×1017/cm3 molecules H2 per ppm Al.Type: GrantFiled: November 24, 2004Date of Patent: September 4, 2007Assignee: Corning IncorporatedInventors: Heather D Boek, Christine E Heckle, Johannes Moll, Charlene M Smith
-
Publication number: 20060037362Abstract: Lithographic methods are disclosed. In one such method, a pulsed ultraviolet radiation source for producing ultraviolet lithography radiation having a wavelength shorter than about 300 nm at a fluence of less than 10 mJ/cm2/pulse and a high purity fused silica lithography glass having a concentration of molecular hydrogen of between about 0.02×1018 molecules/cm3 and about 0.18×1018 molecules/cm3 are provided. A lithography pattern is formed with the ultraviolet lithography radiation; the lithography pattern is reduced to produce a reduced lithography pattern; and the reduced lithography pattern is projected onto a ultraviolet radiation sensitive lithography medium to form a printed lithography pattern. At least one of the forming, reducing, and projecting steps includes transmitting the ultraviolet lithography radiation through the high purity fused silica lithography glass. Lithography systems and high purity fused silica lithography glass are also described.Type: ApplicationFiled: August 5, 2005Publication date: February 23, 2006Inventors: Nicholas Borrelli, Charlene Smith, Johannes Moll
-
Patent number: 6982232Abstract: Lithographic methods are disclosed. In one such method, a pulsed ultraviolet radiation source for producing ultraviolet lithography radiation having a wavelength shorter than about 300 nm at a fluence of less than 10 mJ/cm2/pulse and a high purity fused silica lithography glass having a concentration of molecular hydrogen of between about 0.02×1018 molecules/cm3 and about 0.18×1018 molecules/cm3 are provided. A lithography pattern is formed with the ultraviolet lithography radiation; the lithography pattern is reduced to produce a reduced lithography pattern; and the reduced lithography pattern is projected onto a ultraviolet radiation sensitive lithography medium to form a printed lithography pattern. At least one of the forming, reducing, and projecting steps includes transmitting the ultraviolet lithography radiation through the high purity fused silica lithography glass. Lithography systems and high purity fused silica lithography glass are also described.Type: GrantFiled: May 11, 2004Date of Patent: January 3, 2006Assignee: Corning IncorporatedInventors: Nicholas F. Borrelli, Charlene M. Smith, Johannes Moll
-
Patent number: 6915665Abstract: The invention provides an ultraviolet lithography method/system. The lithography method and system include providing a below 200 nm radiation source, providing a photolytically improved transmitting fused silica glass lithography optical element, transmitting below 200 nm photons through said photolytically improved transmitting fused silica glass lithography optical element to form a lithography pattern which is reduced and projected onto a radiation sensitive lithography printing medium to form a printed lithography pattern. Providing the photolytically improved transmitting fused silica glass lithography optical element includes providing a photolytically improved transmitting fused silica glass lithography optical element preform body and forming the photolytically improved transmitting fused silica glass lithography optical element preform into said lithography optical element.Type: GrantFiled: April 30, 2004Date of Patent: July 12, 2005Assignee: Corning IncorporatedInventors: Nicholas F. Borrelli, Paul S. Danielson, Michael R. Heslin, Stephan L. Logunov, Johannes Moll, Paul M. Schermerhorn, Charlene M. Smith
-
Publication number: 20050112380Abstract: Disclosed is a synthetic silica glass optical material having high resistance to optical damage by ultraviolet radiation in the ultraviolet wavelength range, particularly in the wavelength region of less than about 250 nm and particularly, exhibiting a low laser induced density change. The synthetic silica glass optical material of the present invention contains at least about 0.1 ppm of aluminum and H2 concentration levels greater than about 0.5×1017 molecules/cm2. Additionally, the synthetic silica optical material of the present invention exhibits an H2 to Al ratio of greater than about 1.2, as measured in ×1017/cm3 molecules H2 per ppm Al.Type: ApplicationFiled: November 24, 2004Publication date: May 26, 2005Inventors: Heather Boek, Christine Heckle, Johannes Moll, Charlene Smith