Patents by Inventor John A. Kreuz

John A. Kreuz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240076689
    Abstract: This invention generally relates to the field of somatic gene therapy. The invention provides a nucleic acid construct comprising a transgene encoding a therapeutic protein, a tetracycline-responsive aptazyme sequence, and inverted terminal repeats (ITRs). The nucleic acid construct can be transferred to a subject in need thereof in the form of a viral vector, in particular an adeno-associated virus (AAV) vector. The Tet-responsive aptazyme sequence allows for a tightly controlled expression of the transgene in the subject, thereby avoiding toxic side effects. The nucleic acid construct and the viral vectors comprising same are particularly useful in the treatment of proliferative diseases like cancer.
    Type: Application
    Filed: May 17, 2021
    Publication date: March 7, 2024
    Inventors: John Park, Philipp MÜLLER, Sebastian KREUZ, Benjamin STROBEL, Matthias DÜCHS, Matthias KLUGMANN, Stefan MICHELFELDER, Dragica BLAZEVIC, Romona KRATZER
  • Patent number: 6444783
    Abstract: Segmented, melt-processible, semicrystalline copolyimides are disclosed herein. These polymers are comprised of an amorphous or semicrystalline A segment (soft segment) and a semicrystalline B segment (hard segment), wherein the level of semicrystallinity in the A segment is less than that in the B segment. These copolyimides are semicrystalline and exhibit melting points in the range from about 330-395° C. In preferred embodiments, these copolyimides are end-capped and are crystallizable from their melts (i.e., they exhibit recoverable semicrystallinity). These copolyimides either inherently have suitably low melt visocosities to be melt-processible or can be made to have suitably low melt viscosities to be melt-processible by addition of certain additives. Tailoring of the melting points and glass transition temperatures of these copolyimides can be effected by changing their molecular architecture.
    Type: Grant
    Filed: December 21, 2000
    Date of Patent: September 3, 2002
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: John R. Dodd, John A. Kreuz, Brian C. Auman
  • Patent number: 5411765
    Abstract: A process of making flexible multilayer polyimide metal-clad laminates, and their preparation, having at least one layer of aromatic polyimide bonded to at least one layer of a metallic substrate using a heat-sealable copolyimide adhesive containing repeating imide units derived from 4,4'-oxydiphthalic dianhydride and an aromatic ether diamine. The laminates are used in flexible printed circuits and tape automated bonding applications. Additionally, the metallic substrate may be directly coated with the copolyimide adhesive and used as a single-clad laminate for flexible printed circuits.
    Type: Grant
    Filed: December 14, 1993
    Date of Patent: May 2, 1995
    Assignee: E. I. Du Pont de Nemours and Company
    Inventors: Kuppusamy Kanakarajan, John A. Kreuz
  • Patent number: 5298331
    Abstract: Flexible multilayer polyimide metal-clad laminates, and their preparation, having at least one layer of aromatic polyimide bonded to at least one layer of a metallic substrate using a heat-sealable copolyimide adhesive containing repeating imide units derived from 4,4'-oxydiphthalic dianhydride and an aromatic ether diamine. The laminates are used in flexible printed circuits and tape automated bonding applications. Additionally, the metallic substrate may be directly coated with the copolyimide adhesive and used as a single-clad laminate for flexible printed circuits.
    Type: Grant
    Filed: May 5, 1992
    Date of Patent: March 29, 1994
    Assignee: E. I. Du Pont de Nemours and Company
    Inventors: Kuppusamy Kanakarajan, John A. Kreuz
  • Patent number: 5219977
    Abstract: Tetrapolyimide films derived from oxydiphthalic dianhydride, pyromellitic acid dianhydride, p-phenylene diamine and 4,4'-diaminodiphenyl ether, and their preparation are described. The tetrapolymer films have low water absorption, low coefficients of thermal and hygroscopic expansion, high modulus and are caustic etchable and can be used in flexible printed circuit and tape automated bonding applications.
    Type: Grant
    Filed: July 30, 1992
    Date of Patent: June 15, 1993
    Assignee: E. I. Du Pont de Nemours and Company
    Inventor: John A. Kreuz
  • Patent number: 5196500
    Abstract: Tetrapolyimide films derived from 3,3',4,4'-benzophenone tetracarboxylic dianhydride, pyromellitic acid dianhydride, p-phenylene diamine and 4,4'-diaminodiphenyl ether, and their preparation, are described. The tetrapolymer films have low water absorption, low coefficients of thermal and hygroscopic expansion, high modulus and are caustic etachable and can be used in flexible printed circuit and tape automated bonding applications.
    Type: Grant
    Filed: December 17, 1990
    Date of Patent: March 23, 1993
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: John A. Kreuz, Richard F. Sutton, Jr., Stuart N. Milligan
  • Patent number: 5175240
    Abstract: Aromatic homopolyimide and copolyimide films derived from an aromatic dianhydride and a chlorinated aromatic diamine such as 2-chloro-p-phenylene diamine and 2,2'-dichloro-4,4'-diaminodiphenyl ether are described. The films have low water absorption, high elastic modulus and elongation and can be heat-processed without embrittlement.
    Type: Grant
    Filed: December 17, 1990
    Date of Patent: December 29, 1992
    Assignee: E.I. Du Pont de Nemours and Company
    Inventors: John A. Kreuz, Stuart N. Milligan
  • Patent number: 5166308
    Abstract: Disclosed is an aromatic copolyimide film prepared by chemical conversion of a copolyamide acid solution obtained by copolymerization of an aromatic tetracarboxylic acid component comprising from 30 to 50 mole % of biphenyltetracarboxylic acid dianhydride, 50 to 70 mole % of pyromellitic acid dianhydride, 60 to 80 mole % of p-phenylenediamine and 20 to 40 mole % of 4,4'-diaminodiphenyl ether. The aromatic copolyimide film has a low coefficient of thermal expansion, low water absorption, a low coefficient of hygroscopic expansion, high mechanical strength and is readily etchable making it suitable for use an advanced electronic substrate.
    Type: Grant
    Filed: April 30, 1990
    Date of Patent: November 24, 1992
    Assignee: E. I. Du Pont de Nemours and Company
    Inventors: John A. Kreuz, Richard F. Sutton, Jr.
  • Patent number: 4426253
    Abstract: An aqueous solution of ethyl or propyl alcohol containing a basic compound such as KOH is shown to etch the surface of polyimide material up to 400 times faster than conventional aqueous KOH etching solutions.
    Type: Grant
    Filed: December 3, 1981
    Date of Patent: January 17, 1984
    Assignee: E. I. Du Pont de Nemours & Co.
    Inventors: John A. Kreuz, Christopher M. Hawkins