Abstract: An entrapped gas measuring apparatus includes a reservoir housing with a reservoir which is adapted to receive a material sample and to expand according to an expansion of the material sample when a negative pressure is applied externally to the reservoir. A parameter indicating the change in volume of the reservoir during the expansion, such as the actual change of volume of the reservoir or a change in position of a moveable wall which at least in part defines the reservoir, is detected by a detector. A processor coupled to the detector is used to determine the amount of entrapped gas based upon the detected parameter. The amount of entrapped gas determined by the processor may be the percent volume of the entrapped gas in relation to the overall volume of the sample, or may be the actual volume of the entrapped gas in the sample.