Patents by Inventor John D. Kuptsis

John D. Kuptsis has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Class of E-beam resists based on conducting organic charge transfer salts
    Patent number: 4338392
    Abstract: Novel E-beam resists and process for their use are described. These resists are conducting organic charge transfer salts. Films of these materials can be deposited by solvent casting or by sublimation. The deposited film can be made to produce a positive or negative resist image depending on the E-beam energy and exposure time. Exposure of this material to an E-beam produces patterns having differential electrical, optical and solvation properties.
    Type: Grant
    Filed: July 28, 1981
    Date of Patent: July 6, 1982
    Assignee: International Business Machines Corporation
    Inventors: Edward M. Engler, John D. Kuptsis, Robert G. Schad, Yaffa Tomkiewicz
  • Class of E-beam resists based on conducting organic charge transfer salts
    Patent number: 4312936
    Abstract: Novel E-beam resists and process for their use are described. These resists are conducting organic charge transfer salts. Films of these materials can be deposited by solvent casting or by sublimation. The deposited film can be made to produce a positive or negative resist image depending on the E-beam energy and exposure time. Exposure of this material to an E-beam produces patterns having differential electrical, optical and solvation properties.
    Type: Grant
    Filed: December 8, 1980
    Date of Patent: January 26, 1982
    Assignee: International Business Machines Corporation
    Inventors: Edward M. Engler, John D. Kuptsis, Robert G. Schad, Yaffa Tomkiewicz
  • Class of E-beam resists based on conducting organic charge transfer salts
    Patent number: 4312935
    Abstract: Novel E-beam resists and process for their use are described. These resists are conducting organic charge transfer salts. Films of these materials can be deposited by solvent casting or by sublimation. The deposited film can be made to produce a positive or negative resist image depending on the E-beam energy and exposure time. Exposure of this material to an E-beam produces patterns having differential electrical, optical and solvation properties.
    Type: Grant
    Filed: December 8, 1980
    Date of Patent: January 26, 1982
    Assignee: International Business Machines Corporation
    Inventors: Edward M. Engler, John D. Kuptsis, Robert G. Schad, Yaffa Tomkiewicz