Patents by Inventor John David CONNELLY

John David CONNELLY has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic cluster, lithographic apparatus, and device manufacturing method
    Patent number: 10895813
    Abstract: A lithographic cluster includes a track unit and a lithographic apparatus. The lithographic apparatus includes an alignment sensor and at least one controller. The track unit is configured to process a first lot and a second lot. The lithographic apparatus is operatively coupled to the track unit. The alignment sensor is configured to measure an alignment of at least one alignment mark type of a calibration wafer. At least one controller is configured to determine a correction set for calibrating the lithographic apparatus based on the measured alignment of the at least one alignment mark type and apply first and second weight corrections to the correction set for processing the first and second lots, respectively, such that overlay drifts or jumps during processing the first and second lots are mitigated.
    Type: Grant
    Filed: October 26, 2018
    Date of Patent: January 19, 2021
    Assignee: ASML Holding N.V.
    Inventors: Irit Tzemah, Eric Brian Catey, John David Connelly
  • Lithographic Cluster, Lithographic Apparatus, and Device Manufacturing Method
    Publication number: 20200326640
    Abstract: A lithographic cluster includes a track unit and a lithographic apparatus. The lithographic apparatus includes an alignment sensor and at least one controller. The track unit is configured to process a first lot and a second lot. The lithographic apparatus is operatively coupled to the track unit. The alignment sensor is configured to measure an alignment of at least one alignment mark type of a calibration wafer. At least one controller is configured to determine a correction set for calibrating the lithographic apparatus based on the measured alignment of the at least one alignment mark type and apply first and second weight corrections to the correction set for processing the first and second lots, respectively, such that overlay drifts or jumps during processing the first and second lots are mitigated.
    Type: Application
    Filed: October 26, 2018
    Publication date: October 15, 2020
    Applicant: ASML Holding N.V.
    Inventors: Irit TZEMAH, Eric Brian CATEY, John David CONNELLY