Patents by Inventor John Dean Albaugh

John Dean Albaugh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8377634
    Abstract: This invention relates to acrylic functional resin compositions. More particularly, this invention relates to Poly [organ-co-(meth)acryloxyorgano]silsequioxane resins that are curable upon exposure to ultraviolet radiation with photo initiator or upon heating with or without a free radical generator. The resin compositions have high storage stability at room temperature and produces films that are useful as planarization layer, interlayer dielectric, passivation layer, gas permeable layer, negative photoresist, antireflective coating, conformal coating and IC packaging.
    Type: Grant
    Filed: June 3, 2005
    Date of Patent: February 19, 2013
    Assignee: Dow Corning Corporation
    Inventors: John Dean Albaugh, Gregory Scott Becker, Sina Maghsoodi, Eric Scott Moyer, Sheng Wang, Craig Rollin Yeakle
  • Publication number: 20090130463
    Abstract: Coated substrates comprising an inorganic barrier coating and an interfacial coating, wherein the interfacial coating comprises a cured product of a silicone resin having silicon-bonded radiation-sensitive groups; and methods of preparing the coated substrates.
    Type: Application
    Filed: September 18, 2006
    Publication date: May 21, 2009
    Inventors: John Dean Albaugh, Masaaki Amako, Robert Charles Camilletti, Dong Choi, William Weidner, Ludmil Zambov
  • Publication number: 20090004606
    Abstract: This invention relates to acrylic functional resin compositions. More particularly, this invention relates to Poly [organ-co-(meth)acryloxyorgano]silsequioxane resins that are curable upon exposure to ultraviolet radiation with photo initiator or upon heating with or without a free radical generator. The resin compositions have high storage stability at room temperature and produces films that are useful as planarization layer, interlayer dielectric, passivation layer, gas permeable layer, negative photoresist, antireflective coating, conformal coating and IC packaging.
    Type: Application
    Filed: June 3, 2005
    Publication date: January 1, 2009
    Applicant: DOW CORNING CORPORATION
    Inventors: John Dean Albaugh, Gregory Scott Becker, Sina Magshoodi, Eric Scott Moyer, Sheng Wang, Craig Rollin Yeakle
  • Patent number: 6596404
    Abstract: This invention pertains to a siloxane resin composition comprising R1SiO3/2 siloxane units, R2SiO3/2 siloxane units and (R3O)bSiO(4-b)/2 siloxane units wherein R1 is an alkyl group having 1 to 5 carbons, hydrogen, or mixtures thereof; R2 is a monovalent organic group having 6 to 30 carbons; R3 is a branched alkyl group having 3 to 30 carbons, b is from 1 to 3; and the siloxane resin contains from 2.5 to 85 mole percent R1SiO3/2 units, 2.5 to 50 mole percent R2SiO3/2 units and 5 to 95 mole percent (R3O)bSiO(4-b)/2 units. The siloxane resin is useful to make insoluble porous resin and insoluble porous coatings. Heating a substrate coated with the siloxane resin at a sufficient temperature effects removal of the R2 and R3O groups to form an insoluble insoluble porous coating having a porosity of 1 to 60 volume percent and a dielectric constant in the range of 1.5 to 3.0.
    Type: Grant
    Filed: April 15, 2002
    Date of Patent: July 22, 2003
    Assignee: Dow Corning Corporation
    Inventors: John Dean Albaugh, Ronald Paul Boisvert, Duane Raymond Bujalski, Pierre Maurice Chevalier, Russell Keith King, Duan Li Ou, Kai Su, Katsuya Eguchi