Patents by Inventor John Ekerdt

John Ekerdt has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200087783
    Abstract: A method for creating metal patterns. A metal oxide film/metal film is deposited on a substrate in a reactor. After the metal oxide film/metal film has been deposited, the desired metal regions/metal oxide regions are formed on the metal oxide film/metal film using a reduction/oxidation reaction. A reducing/oxidizing gas is fed into the reactor. Furthermore, a heat source, such as a thermal probe or a high intensity laser beam, is pulsed to heat and form metal regions/metal oxide regions on the metal oxide film/metal film within the metal's reduction/oxidation window. In this manner, benefits over prior patterning techniques are achieved, including greater control and uniformity, reduced cost, less waste and potential for sub-5 nm features.
    Type: Application
    Filed: December 6, 2017
    Publication date: March 19, 2020
    Inventors: Roger BONNECAZE, Meghali CHOPRA, Sonali CHOPRA, Jeremy BINAGIA, John EKERDT, Bryce EDMONDSON
  • Publication number: 20100173033
    Abstract: An imprint lithography template may be used to form an imprinted layer in a light curable liquid disposed on a substrate. During use, the template may be disposed within a template holder. The template holder may include a body with an opening configured to receive the template, a support plate, and an actuator system coupled to the body. The actuator system may be configured to alter a physical dimension of the template during use.
    Type: Application
    Filed: March 2, 2010
    Publication date: July 8, 2010
    Applicant: BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM
    Inventors: Todd Bailey, Byung J. Choi, Matthew Colburn, S. V. Sreenivasan, C. Grant Willson, John Ekerdt
  • Publication number: 20080199816
    Abstract: Disclosed herein is an automatic fluid dispensing method and system for dispensing fluid on the surface of a plate-like material, or substrate, including a semiconductor wafer for imprint lithography processes. The dispensing method uses fluid dispenser and a substrate stage that may generate relative lateral motions between a fluid dispenser tip a substrate. Also described herein are methods and devices for creating a planar surface on a substrate using a substantially unpatterned planar template.
    Type: Application
    Filed: July 9, 2007
    Publication date: August 21, 2008
    Applicant: THE UNIVERSITY OF TEXAS BOARD OF REGENTS
    Inventors: Byung J. Choi, S. V. Sreenivasan, C. Grant Willson, Matthew Colburn, Todd Bailey, John Ekerdt
  • Publication number: 20080095878
    Abstract: The present invention includes a template comprising a plurality of protrusions and a plurality of recessions with a distance between a zenith of any of the plurality of protrusions and a nadir of any one of the plurality of recessions being less than 250 nm.
    Type: Application
    Filed: June 11, 2007
    Publication date: April 24, 2008
    Applicant: BOARD OF REGENTS, UNIVERSITY OF TEXAS SYSTEM
    Inventors: Todd Bailey, Byung Choi, Matthew Colburn, S.V. Sreenivasan, C. Willson, John Ekerdt
  • Publication number: 20060145398
    Abstract: The present invention pertains to disposing a diamond-like composition on a template, wherein the diamond-like composition acts as a release layer. The diamond-like composition is substantially transparent to actinic radiation, e.g., ultraviolet (UV) light, and will also have a desired surface energy, wherein the desired surface energy minimizes adhesion between the template and an underlying material disposed on a substrate. The diamond-like composition is characterized with a low surface energy that exhibits desirable release characteristics.
    Type: Application
    Filed: December 30, 2004
    Publication date: July 6, 2006
    Inventors: Todd Bailey, Nicholas Stacey, Edward Engbrecht, John Ekerdt
  • Patent number: 7060324
    Abstract: The present invention includes a method of moving a liquid between a substrate extending in a first plane and a template extending in a second plane. More specifically, the method may include forming an oblique angle between the first plane and the second plane, reducing a distance between the substrate and the template such that the template is in contact with a portion of the liquid at a desired location, and creating a dispersion of the liquid away from the desired location.
    Type: Grant
    Filed: January 13, 2004
    Date of Patent: June 13, 2006
    Assignee: Board of Regents, The University of Texas System
    Inventors: Todd Bailey, Byung J. Choi, Matthew Colburn, Sidlgata V. Sreenivasan, C. Grant Willson, John Ekerdt
  • Patent number: 6954275
    Abstract: Described are high precision gap and orientation measurement methods between a template and a substrate used in imprint lithography processes. Gap and orientation measurement methods presented here include uses of broad-band light based measuring techniques.
    Type: Grant
    Filed: August 1, 2001
    Date of Patent: October 11, 2005
    Assignee: Boards of Regents, The University of Texas System
    Inventors: Byung J. Choi, Matthew Colburn, S. V. Sreenivasan, C. Grant Willson, Todd Bailey, John Ekerdt
  • Publication number: 20050064344
    Abstract: One embodiment of the present invention is an imprint template for imprint lithography that comprises alignment marks embedded in bulk material of the imprint template.
    Type: Application
    Filed: September 18, 2003
    Publication date: March 24, 2005
    Applicant: University of Texas System Board of Regents
    Inventors: Todd Bailey, Stephen Johnson, Matthew Colburn, Byung-Jin Choi, Britain Smith, John Ekerdt, Carlton Willson, Sidlgata Sreenivasan
  • Publication number: 20040170771
    Abstract: The present invention includes a method of moving a liquid between a substrate extending in a first plane and a template extending in a second plane. More specifically, the method may include forming an oblique angle between the first plane and the second plane, reducing a distance between the substrate and the template such that the template is in contact with a portion of the liquid at a desired location, and creating a dispersion of the liquid away from the desired location.
    Type: Application
    Filed: January 13, 2004
    Publication date: September 2, 2004
    Applicant: Board of Regents, The University of Texas System
    Inventors: Todd Bailey, Byung J. Choi, Matthew Colburn, S. V. Sreenivasan, C. Grant Willson, John Ekerdt
  • Publication number: 20040168586
    Abstract: The present invention includes a template comprising a plurality of protrusions and a plurality of recessions with a distance between a zenith of any of the plurality of protrusions and a nadir of any one of the plurality of recessions being less than 250 nm.
    Type: Application
    Filed: January 13, 2004
    Publication date: September 2, 2004
    Applicant: Board of Regents, The University of Texas System
    Inventors: Todd Bailey, Byung J. Choi, Matthew Colburn, S.V. Sreenivasan, C. Grant Willson, John Ekerdt
  • Publication number: 20040141163
    Abstract: Described are imprint lithography templates, methods of forming and using the templates, and a template holder device. An imprint lithography template may include a body with a plurality of recesses on a surface of the body. The body may be of a material that is substantially transparent to activating light. At least a portion of the plurality of recesses may define features having a feature size less than about 250 nm. A template may be formed by obtaining a material that is substantially transparent to activating light and forming a plurality or recesses on a surface of the template. In some embodiments, a template may further include at least one alignment mark. In some embodiments, a template may further include a gap sensing area. An imprint lithography template may be used to form an imprinted layer in a light curable liquid disposed on a substrate. During use, the template may be disposed within a template holder.
    Type: Application
    Filed: December 29, 2003
    Publication date: July 22, 2004
    Applicant: The University of Texas System, Board of Regents, UT System
    Inventors: Todd Bailey, Byung J. Choi, Matthew E. Colburn, S. V. Sreenivasan, C. Grant Willson, John Ekerdt
  • Patent number: 6696220
    Abstract: Described are imprint lithography templates, methods of forming and using the templates, and a template holder device. An imprint lithography template may include a body with a plurality of recesses on a surface of the body. The body may be of a material that is substantially transparent to activating light. At least a portion of the plurality of recesses may define features having a feature size less than about 250 nm. A template may be formed by obtaining a material that is substantially transparent to activating light and forming a plurality or recesses on a surface of the template. In some embodiments, a template may further include at least one alignment mark. In some embodiments, a template may further include a gap sensing area. An imprint lithography template may be used to form an imprinted layer in a light curable liquid disposed on a substrate. During use, the template may be disposed within a template holder.
    Type: Grant
    Filed: October 12, 2001
    Date of Patent: February 24, 2004
    Assignee: Board of Regents, The University of Texas System
    Inventors: Todd Bailey, Byung J. Choi, Matthew Colburn, S. V. Sreenivasan, C. Grant Willson, John Ekerdt
  • Publication number: 20020115002
    Abstract: Described are imprint lithography templates, methods of forming and using the templates, and a template holder device. An imprint lithography template may include a body with a plurality of recesses on a surface of the body. The body may be of a material that is substantially transparent to activating light. At least a portion of the plurality of recesses may define features having a feature size less than about 250 nm. A template may be formed by obtaining a material that is substantially transparent to activating light and forming a plurality or recesses on a surface of the template. In some embodiments, a template may further include at least one alignment mark. In some embodiments, a template may further include a gap sensing area. An imprint lithography template may be used to form an imprinted layer in a light curable liquid disposed on a substrate. During use, the template may be disposed within a template holder.
    Type: Application
    Filed: October 12, 2001
    Publication date: August 22, 2002
    Inventors: Todd Bailey, Byung J. Choi, Matthew Colburn, S.V. Sreenivasan, C. Grant Willson, John Ekerdt
  • Publication number: 20020093122
    Abstract: Described are high precision gap and orientation measurement methods between a template and a substrate used in imprint lithography processes. Gap and orientation measurement methods presented here include uses of broad-band light based measuring techniques.
    Type: Application
    Filed: August 1, 2001
    Publication date: July 18, 2002
    Inventors: Byung J. Choi, Matthew Colburn, S. V. Sreenivasan, C. Grant Willson, Todd Bailey, John Ekerdt
  • Publication number: 20020094496
    Abstract: Disclosed herein is an automatic fluid dispensing method and system for dispensing fluid on the surface of a plate-like material, or substrate, including a semiconductor wafer for imprint lithography processes. The dispensing method uses fluid dispenser and a substrate stage that may generate relative lateral motions between a fluid dispenser tip a substrate. Also described herein are methods and devices for creating a planar surface on a substrate using a substantially unpatterned planar template.
    Type: Application
    Filed: February 12, 2002
    Publication date: July 18, 2002
    Inventors: Byung J. Choi, S. V. Sreenivasan, C. Grant Willson, Matthew Colburn, Todd Bailey, John Ekerdt