Abstract: An attachment for an engineering vehicle that has a first side having an outer surface, an inner surface, and a first plurality of surfaces extending between the outer surface and the inner surface defining a first plurality of holes having a hole diameter; a second side having an outer surface, an inner surface, and a second plurality of surfaces extending between the outer surface and the inner surface defining a second plurality of holes having the hole diameter; and a plurality of rods occupying at least some of the first plurality of holes and at least some of the second plurality of holes, each rod having a first end, a second end, a longitudinal axis intersecting the first end and the second end, a rod length between the first end and the second end along the longitudinal axis, and a rod diameter.

Abstract: An attachment for an engineering vehicle that has a first side having an outer surface, an inner surface, and a first plurality of surfaces extending between the outer surface and the inner surface defining a first plurality of holes having a hole diameter; a second side having an outer surface, an inner surface, and a second plurality of surfaces extending between the outer surface and the inner surface defining a second plurality of holes having the hole diameter; and a plurality of rods occupying at least some of the first plurality of holes and at least some of the second plurality of holes, each rod having a first end, a second end, a longitudinal axis intersecting the first end and the second end, a rod length between the first end and the second end along the longitudinal axis, and a rod diameter.

Abstract: A method and apparatus are described for reducing particle contamination in a plasma processing chamber. In one embodiment, a pasting disk is provided which includes a disk-shaped base of high-resistivity material that has an electrically conductive pasting material layer applied to a top surface of the base so that the pasting material layer partially covers the top surface of the base. The pasting disk is sputter etched to deposit conductive pasting material over a wide area on the interior surfaces of a plasma processing chamber while minimizing deposition on dielectric components that are used to optimize the sputter etch process during substrate processing.

Abstract: A method of gene editing or gene stacking within a FAD3 loci by cleaving, in a site directed manner, a location in a FAD3 gene in a cell, to generate a break in the FAD3 gene and then ligating into the break a nucleic acid molecule associated with one or more traits of interest is disclosed.

Abstract: Variable geometry process kits for use in semiconductor process chambers have been provided herein. In some embodiments, a process kit for use in a semiconductor process chamber includes: an annular body configured to rest about a periphery of a substrate support; a first ring positioned coaxially with the annular body and supported by the annular body; a second ring positioned coaxially with the first ring and supported by the first ring; and an annular shield comprising a horizontal leg positioned coaxially with the second ring such that a portion of the horizontal leg is aligned with and below portions of the first ring and second ring.

Abstract: A method of gene editing or gene stacking within a FAD2 loci by cleaving, in a site directed manner, a location in a FAD2 gene in a cell, to generate a break in the FAD2 gene and then ligating into the break a nucleic acid molecule associated with one or more traits of interest is disclosed.

Abstract: An Engineered Transgene Integration Platform (ETIP) is described that can be inserted randomly or at targeted locations in plant genomes to facilitate rapid selection and detection of a GOI that is perfectly targeted (both the 5? and 3? ends) at the ETIP genomic location. One element in the subject disclosure is the introduction of specific double stranded breaks within the ETIP. In some embodiments, an ETIP is described using zinc finger nuclease binding sites, but may utilize other targeting technologies such as meganucleases, CRISPRs, TALs, or leucine zippers. Also described are compositions of, and methods for producing, transgenic plants wherein the donor or payload DNA expresses one or more products of an exogenous nucleic acid sequence (e.g. protein or RNA) that has been stably-integrated into an ETIP in a plant cell. In embodiments, the ETIP facilitates testing of gene candidates and plant expression vectors from ideation through Development phases.

Abstract: There is provided a composition comprising microspheres which comprise a water-insoluble, water-swellable polymer and associated with the polymer, in releasable form, a chemotherapeutic agent, for use in the treatment of a pancreatic tumour or cyst, wherein the microspheres, when equilibrated in water at 37° C., comprise at least 40 wt % water based on weight of polymer plus water, wherein the polymer is anionically charged at pH7 and the chemotherapeutic agent is cationically charged and electrostatically associated with the polymer. Also provided are methods of treating pancreatic tumours or cysts using this composition.

Abstract: A composition comprising microspheres of a polymer matrix, having two different pharmaceutical actives having complementary, usually synergistic, activity in killing cells. The compositions have particular utility for treating tumours. Useful combinations are doxorubicin with rapamycin, irinotecan with ibuprofen, ibuprofen with doxorubicin and irinotecan with doxorubicin. The polymer matrix is preferably a crosslinked polyvinyl alcohol. The drugs may be included in the same microsphere, or microspheres each with an individual pharmaceutical agent may be mixed together. The microspheres are preferably used in chemoembolisation of tumours.

Abstract: A plasma cleaning method particularly useful for removing photoresist and oxide residue from a porous low-k dielectric with a high carbon content prior to sputter deposition. A remote plasma source produces a plasma primarily of hydrogen radicals. The hydrogen pressure may be kept relatively low, for example, at 30 milliTorr. Optionally, helium may be added to the processing gas with the hydrogen partial pressure held below 150 milliTorr. Superior results are obtained with 70% helium in 400 milliTorr of hydrogen and helium. Preferably, an ion filter, such as a magnetic filter, removes hydrogen and other ions from the output of the remote plasma source and a supply tube from the remote plasma source includes a removable dielectric liner in combination with dielectric showerhead and manifold liner.

Abstract: A pretensioning apparatus for seat belt webbing is located in the vicinity of a belt anchor end of a three-point vehicle safety restraint seat belt. The pretensioning apparatus has a fixed member in the form of a tubular member that may be anchored to a vehicle seat at the belt anchor side of the vehicle. A movable member in the form of a piston is connected to the webbing in the region of the belt anchor end. A means is provided for moving the movable member relative to the fixed member in a generally horizontal direction, to move the seat belt webbing in a pretensioning direction in response to a signal from a crash sensor. A webbing guide is fixed to the seat to provide an effective anchorage point spaced from the belt anchor end of the webbing under pretensioning conditions.

Abstract: An apparatus and a method of cleaning a dielectric film are provided in the present invention. In one embodiment, an apparatus of cleaning a dielectric film the apparatus includes a chamber body adapted to support a substrate therein, a remote plasma source adapted to provide a plurality of reactive radicals to the chamber body, a passage coupling the remote plasma source to the chamber body, and at least one magnet disposed adjacent the passage. In another embodiment, a method of cleaning a dielectric film that includes providing a substrate having an at least partially exposed dielectric layer disposed in a process chamber, generating a plurality of reactive radicals in a remote plasma source, flowing the reactive radicals from the remote plasma source into the process chamber through a passage having at least one magnet disposed adjacent the passage, and magnetically filtering the reactive radicals passing through the passage.

Abstract: A one-piece inner shield usable in a plasma sputter reactor and extending from the target to the pedestal with a smooth inner surface and supported by an annular flange in a middle portion of the shield. The shield may be used to support the RF coil used in exciting the plasma. An outer shield includes an outwardly extending flange on its end alignable with the inner shield flange, holes in correspondence to recesses in the inner shield for standoffs for the RF coil, and circumferentially arranged gas flow holes.

Abstract: A method and apparatus are described for reducing particle contamination in a plasma processing chamber. In one embodiment, a pasting disk is provided which includes a disk-shaped base of high-resistivity material that has an electrically conductive pasting material layer applied to a top surface of the base so that the pasting material layer partially covers the top surface of the base. The pasting disk is sputter etched to deposit conductive pasting material over a wide area on the interior surfaces of a plasma processing chamber while minimizing deposition on dielectric components that are used to optimize the sputter etch process during substrate processing.

Abstract: A pretensioning apparatus for seat belt webbing is located in the vicinity of a belt anchor end of a three-point vehicle safety restraint seat belt. The pretensioning apparatus has a fixed member in the form of a tubular member that may be anchored to a vehicle seat at the belt anchor side of the vehicle. A movable member in the form of a piston is connected to the webbing in the region of the belt anchor end. A means is provided for moving the movable member relative to the fixed member in a generally horizontal direction, to move the seat belt webbing in a pretensioning direction in response to a signal from a crash sensor. A webbing guide is fixed to the seat to provide an effective anchorage point spaced from the belt anchor end of the webbing under pretensioning conditions.

Abstract: A pretensioning apparatus for seat belt webbing is located in the vicinity of a belt anchor end of a three-point vehicle safety restraint seat belt. The pretensioning apparatus has a fixed member in the form of a tubular member that may be anchored to a vehicle seat at the belt anchor side of the vehicle. A movable member in the form of a piston is connected to the webbing in the region of the belt anchor end. A means is provided for moving the movable member relative to the fixed member in a generally horizontal direction, to move the seat belt webbing in a pretensioning direction in response to a signal from a crash sensor. A webbing guide is fixed to the seat to provide an effective anchorage point spaced from the belt anchor end of the webbing under pretensioning conditions.

Abstract: A pretensioning apparatus for seat belt webbing is located in the vicinity of a belt anchor end of a three-point vehicle safety restraint seat belt. The pretensioning apparatus has a fixed member in the form of a tubular member that may be anchored to a vehicle seat at the belt anchor side of the vehicle. A movable member in the form of a piston is connected to the webbing in the region of the belt anchor end. A means is provided for moving the movable member relative to the fixed member in a generally horizontal direction, to move the seat belt webbing in a pretensioning direction in response to a signal from a crash sensor. A webbing guide is fixed to the seat to provide an effective anchorage point spaced from the belt anchor end of the webbing under pretensioning conditions.

Abstract: A pretensioning apparatus for seat belt webbing is located in the vicinity of a belt anchor end of a three-point vehicle safety restraint seat belt. The pretensioning apparatus has a fixed member in the form of a tubular member that may be anchored to a vehicle seat at the belt anchor side of the vehicle. A movable member in the form of a piston is connected to the webbing in the region of the belt anchor end. A means is provided for moving the movable member relative to the fixed member in a generally horizontal direction, to move the seat belt webbing in a pretensioning direction in response to a signal from a crash sensor. A webbing guide is fixed to the seat to provide an effective anchorage point spaced from the belt anchor end of the webbing under pretensioning conditions.

Abstract: An integrated copper deposition process, particularly useful for forming a copper seed layer in a narrow via prior to electrochemical plating of copper, including at least one cycle of sputter deposition of copper followed by sputter etching of the deposited copper, preferably performed in a same sputter chamber. The deposition is performed under conditions promoting high copper ionization fractions and strong wafer biasing to draw the copper ions into the via. The etching may be done with argon ions, preferably inductively excited by an RF coil around the chamber, or by copper ions, which may be formed with high target power and intense magnetron or by use of the RF coil. Two or more cycles of deposition/etch may be performed. A final flash deposition may be performed with high copper ionization and low wafer biasing.

Abstract: A magnetron sputter reactor for sputtering deposition materials such as tantalum, tantalum nitride and copper, for example, and its method of use, in which self-ionized plasma (SIP) sputtering and inductively coupled plasma (ICP) sputtering are promoted, either together or alternately, in the same or different chambers. Also, bottom coverage may be thinned or eliminated by ICP resputtering in one chamber and SIP in another. SIP is promoted by a small magnetron having poles of unequal magnetic strength and a high power applied to the target during sputtering. ICP is provided by one or more RF coils which inductively couple RF energy into a plasma. The combined SIP-ICP layers can act as a liner or barrier or seed or nucleation layer for hole. In addition, an RF coil may be sputtered to provide protective material during ICP resputtering. In another chamber an array of auxiliary magnets positioned along sidewalls of a magnetron sputter reactor on a side towards the wafer from the target.