Abstract: An air filtration system includes a photocatalytic reactor and a first air filter upstream of the photocatalytic reactor. The photocatalytic reactor includes a photocatalyst composition and a lamp configured to irradiate the photocatalyst composition. The photocatalyst composition is configured to decompose one or more volatile organic compounds in the air. The first air filter configured to filter one or more deactivating compounds from the air. A method of filtering air in an air filtration system includes passing air through a photocatalytic reactor and passing the air through a first filter prior to the passing of the air through the photocatalytic reactor. The passing of the air through the photocatalytic reactor includes a photocatalyst composition decomposing one or more volatile organic compounds in the air.

Abstract: Filters for semiconductor tool and clean room applications to control airborne molecular contamination. The filter cartridge system includes a filter cartridge having a non-woven fiber and at least one adsorbent. In some embodiments, the filter cartridge is constructed of substantially combustible materials to support its end of service destruction.

Abstract: Filters for semiconductor tool and clean room applications to control airborne molecular contamination. The filter cartridge system includes a filter cartridge having a non-woven fiber and at least one adsorbent. In some embodiments, the filter cartridge is constructed of substantially combustible materials to support its end of service destruction.

Abstract: The invention provides a system and method comprising an apparatus for removing contaminants from a gas in a semiconductor processing device, which can include a filter unit having at least two parallel filter stages located therein. The filter stages are designed to remove a least a portion of the contaminants present in the gas flowing through them. The apparatus can also include a flow controller for distributing the gas flow among the filter stages. In one embodiment, the controller may consist of a diffuser plate. The invention also provides a sampling tube orifice for gas flow control in a system or method of the invention. In another embodiment, an apparatus for removing contaminants from a gas in a clean room comprises a filter unit having at least two parallel filter stages, which are used to remove a portion of the contaminants in the gas as it passes through the apparatus.

Abstract: The invention provides a system and method comprising an apparatus for removing contaminants from a gas in a semiconductor processing device, which can include a filter unit having at least two parallel filter stages located therein. The filter stages are designed to remove a least a portion of the contaminants present in the gas flowing through them. The apparatus can also include a flow controller for distributing the gas flow among the filter stages. In one embodiment, the controller may consist of a diffuser plate. The invention also provides a sampling tube orifice for gas flow control in a system or method of the invention. In another embodiment, an apparatus for removing contaminants from a gas in a clean room comprises a filter unit having at least two parallel filter stages, which are used to remove a portion of the contaminants in the gas as it passes through the apparatus.

Abstract: In preferred embodiments, the invention provides a gas filter for a reactive gas used in semiconductor processing tools and processes that are sensitive to molecular contamination. The reactive gas filter of the invention have improved pressure drop and can supply an output gas stream having concentrations of less than about 1 ppbv for both ammonia and sulfur dioxide for an input gas stream with ammonia and sulfur dioxide concentrations, respectively, of no greater than about 10 ppbv and 5 ppbv. In one aspect the invention provides a reactive gas filter with an improved pressure drop that can supply an output gas stream having concentrations of less than about 1 ppbv for both ammonia and sulfur dioxide for an input gas stream with ammonia and sulfur dioxide concentrations, respectively, of no greater than about 10 ppbv and 5 ppbv, using a filter media volume of no greater than about 0.5 liters.

Abstract: In preferred embodiments, the invention provides a gas filter for a reactive gas used in semiconductor processing tools and processes that are sensitive to molecular contamination. The reactive gas filters of the invention have improved pressure drop and can supply an output gas stream having concentrations of less than about 1 ppbv for both ammonia and sulfur dioxide for an input gas stream with ammonia and sulfur dioxide concentrations, respectively, of no greater than about 10 ppbv and 5 ppbv. In one aspect the invention provides a reactive gas filter with an improved pressure drop that can supply an output gas stream having concentrations of less than about 1 ppbv for both ammonia and sulfur dioxide for an input gas stream with ammonia and sulfur dioxide concentrations, respectively, of no greater than about 10 ppbv and 5 ppbv, using a filter media volume of no greater than about 0.5 litters.