Patents by Inventor John J. Sloan

John J. Sloan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Complete plant growth medium
    Patent number: 8034147
    Abstract: A naturally occurring zeolite is coated with a special nanophase Fe oxide, thereby forming a nanophase Fe oxide coated zeolite. The composition thus formed can be used for a variety of horticultural and floricultural end applications. When the nanophase Fe oxide coated zeolite is dosed with plant nutrients and is then mixed with a suitable potting compound, the result is a Complete Plant Growth Medium (CPGM). Blending 5% to 25% CPGM by weight with sand, peat, compost, vegetable and flower beds, and native and manufactured soils, provides a number of beneficial properties. Also, CPGM alone can be used for growing indoor plants to avoid plant pests and compost odor.
    Type: Grant
    Filed: November 20, 2007
    Date of Patent: October 11, 2011
    Assignee: ChK Group, Inc.
    Inventors: Rajan K. Vempati, Ramesh S. Hegde, John J. Sloan
  • COMPLETE PLANT GROWTH MEDIUM
    Publication number: 20080116141
    Abstract: A naturally occurring zeolite is coated with a special nanophase Fe oxide, thereby forming a nanophase Fe oxide coated zeolite. The composition thus formed can be used for a variety of horticultural and floricultural end applications. When the nanophase Fe oxide coated zeolite is dosed with plant nutrients and is then mixed with a suitable potting compound, the result is a Complete Plant Growth Medium (CPGM). Blending 5% to 25% CPGM by weight with sand, peat, compost, vegetable and flower beds, and native and manufactured soils, provides a number of beneficial properties. Also, CPGM alone can be used for growing indoor plants to avoid plant pests and compost odor.
    Type: Application
    Filed: November 20, 2007
    Publication date: May 22, 2008
    Inventors: Rajan K. Vempati, Ramesh S. Hegde, John J. Sloan