Patents by Inventor John M. Algots
John M. Algots has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 9544983Abstract: An EUV light source target material handling system is disclosed which includes a target material dispenser and a target material repository in which solid target material in the target material repository is converted to target material in liquid form through the use of inductive heating.Type: GrantFiled: November 5, 2014Date of Patent: January 10, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Chirag Rajyaguru, John M. Algots, Tetsuya Ishikawa, Peter Baumgart
-
Publication number: 20160128170Abstract: An EUV light source target material handling system is disclosed which includes a target material dispenser and a target material repository in which solid target material in the target material repository is converted to target material in liquid form through the use of inductive heating.Type: ApplicationFiled: November 5, 2014Publication date: May 5, 2016Applicant: ASML Netherlands B.V.Inventors: Chirag RAJYAGURU, John M. Algots, Tetsuya Ishikawa, Peter Baumgart
-
Patent number: 7382815Abstract: An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond.Type: GrantFiled: August 9, 2004Date of Patent: June 3, 2008Assignee: Cymer, Inc.Inventors: Ronald L. Spangler, Jacob P. Lipcon, John A. Rule, Robert N. Jacques, Armen Kroyan, Ivan Lalovic, Igor V. Fomenkov, John M. Algots
-
Patent number: 7298770Abstract: An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond.Type: GrantFiled: August 5, 2004Date of Patent: November 20, 2007Assignee: Cymer, Inc.Inventors: Ronald L. Spangler, Jacob P. Lipcon, John A. Rule, Robert N. Jacques, Armen Kroyan, Ivan Lalovic, Igor V. Fomenkov, John M. Algots
-
Patent number: 7139301Abstract: An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond.Type: GrantFiled: November 3, 2003Date of Patent: November 21, 2006Assignee: CYMER, Inc.Inventors: Armen Kroyan, Ivan Lalovic, Igor V. Fomenkov, Palash P. Das, Richard L. Sandstrom, John M. Algots, Khurshid Ahmed
-
Patent number: 6882674Abstract: The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.Type: GrantFiled: December 21, 2001Date of Patent: April 19, 2005Assignee: Cymer, Inc.Inventors: Christian J. Wittak, William N. Partlo, Richard L. Sandstrom, Paul C. Melcher, David M. Johns, Robert B. Saethre, Richard M. Ness, Curtis L. Rettig, Robert A. Shannon, Richard C. Ujazdowski, Shahryar Rokni, Scott T. Smith, Stuart L. Anderson, John M. Algots, Ronald L. Spangler, Igor V. Fomenkov, Thomas D. Steiger, Jerome A. Emilo, Clay C. Titus, Alex P. Ivaschenko, Paolo Zambon, Gamaralalage G. Padmabandu, Mark S. Branham, Sunjay Phatak, Raymond F. Cybulski
-
Patent number: 6853653Abstract: An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond.Type: GrantFiled: December 21, 2001Date of Patent: February 8, 2005Assignee: Cymer, Inc.Inventors: Ronald L. Spangler, Jacob P. Lipcon, John A. Rule, Robert N. Jacques, Armen Kroyan, Ivan Lalovic, Igor V. Fomenkov, John M. Algots
-
Publication number: 20040146082Abstract: An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond.Type: ApplicationFiled: November 3, 2003Publication date: July 29, 2004Inventors: Armen Kroyan, Ivan Lalovic, Igor V. Fomenkov, Palash P. Das, Richard L. Sandstrom, John M. Algots, Khurshid Ahmed
-
Patent number: 6757316Abstract: The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.Type: GrantFiled: May 11, 2001Date of Patent: June 29, 2004Assignee: Cymer, Inc.Inventors: Peter C. Newman, Thomas P. Duffey, William N. Partlo, Richard L. Sandstrom, Paul C. Melcher, David M. Johns, Robert B. Saethre, Vladimir B. Fleurov, Richard M. Ness, Curtis L. Rettig, Robert A. Shannon, Richard C. Ujazdowski, Shahryar Rokni, Xiaojiang J. Pan, Vladimir Kulgeyko, Scott T. Smith, Stuart L. Anderson, John M. Algots, Ronald L. Spangler, Igor V. Fomenkov
-
Patent number: 6721340Abstract: A technique for bandwidth control of an electric discharge laser. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection means and a bandwidth control having a time response of less than about 1.0 millisecond. In a preferred embodiment wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second within a very narrow range of pivot angles to cause a dither in nominal wavelength values to produce a desired effective bandwidth of series of laser pulses.Type: GrantFiled: June 30, 2000Date of Patent: April 13, 2004Assignee: Cymer, Inc.Inventors: Igor V. Fomenkov, Armen Kroyan, Jesse D. Buck, Palash P. Das, Richard L. Sandstrom, Frederick G. Erie, John M. Algots, Gamaralalage G. Padmabandu
-
Patent number: 6671294Abstract: An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond.Type: GrantFiled: July 27, 2001Date of Patent: December 30, 2003Assignee: Cymer, Inc.Inventors: Armen Kroyan, Ivan Lalovic, Igor V. Fomenkov, Palash P. Das, Richard L. Sandstrom, John M. Algots, Khurshid Ahmed
-
Patent number: 6650666Abstract: An electric discharge laser with fast wavelength correction. Fast wavelength correction equipment includes at least one piezoelectric drive and a fast wavelength measurement system and fast feedback response times. In a preferred embodiment, equipment is provided to control wavelength on a slow time frame of several milliseconds, on a intermediate time from of about one to five milliseconds and on a very fast time frame of a few microseconds. Preferred techniques include a combination of a relatively slow stepper motor and a very fast piezoelectric driver for tuning the laser wavelength using a tuning mirror. A preferred control technique is described (utilizing a very fast wavelength monitor) to provide the slow and intermediate wavelength control with the combination of a stepper motor and a piezoelectric driver. Very fast wavelength control is provided with a piezoelectric load cell in combination with the piezoelectric driver.Type: GrantFiled: December 21, 2001Date of Patent: November 18, 2003Assignee: Cymer, Inc.Inventors: Ronald L. Spangler, Robert N. Jacques, John A. Rule, Frederick A. Palenschat, Igor V. Fomenkov, John M. Algots, Jacob P. Lipcon, Richard L. Sandstrom
-
Publication number: 20030118072Abstract: The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.Type: ApplicationFiled: December 21, 2001Publication date: June 26, 2003Inventors: Christian J. Wittak, William N. Partlo, Richard L. Sandstrom, Paul C. Melcher, David M. Johns, Robert B. Saethre, Richard M. Ness, Curtis L. Rettig, Robert A. Shannon, Richard C. Ujazdowski, Shahryar Rokni, Scott T. Smith, Stuart L. Anderson, John M. Algots, Ronald L. Spangler, Igor V. Fomenkov, Thomas D. Steiger, Jerome A. Emilo, Clay C. Titus, Alex P. Ivaschenko, Paolo Zambon, Gamaralalage G. Padmabandu, Mark S. Branham, Sunjay Phatak, Raymond F. Cybulski
-
Patent number: 6532247Abstract: An electric discharge laser with fast wavelength correction. Fast wavelength correction equipment includes at least one piezoelectric drive and a fast wavelength measurement system and fast feedback response times. In a preferred embodiment, equipment is provided to control wavelength on a slow time frame of several milliseconds, on a intermediate time from of about one to three millisecond and on a very fast time frame of a few microseconds. Techniques include a combination of a relatively slow stepper motor and a very fast piezoelectric driver for tuning the laser wavelength using a tuning mirror. A preferred control technique is described (utilizing a very fast wavelength monitor) to provide the slow and intermediate wavelength control and a piezoelectric load cell in combination with the piezoelectric driver to provide the very fast (few microseconds) wavelength control.Type: GrantFiled: February 27, 2001Date of Patent: March 11, 2003Assignee: Cymer, Inc.Inventors: Ronald L. Spangler, Robert N. Jacques, George J. Everage, Stuart L. Anderson, Frederick A. Palenschat, Igor V. Fomenkov, Richard L. Sandstrom, William N. Partlo, John M. Algots, Daniel J. W. Brown
-
Patent number: 6529531Abstract: Electric discharge laser with fast chirp correction. Fast wavelength chirp correction equipment includes at least one piezoelectric drive and a fast wavelength detection means and has a feedback response time of less than 1.0 millisecond. In a preferred embodiment a simple learning algorithm is described to allow advance tuning mirror adjustment in anticipation of the learned chirp pattern. Techniques include a combination of a relatively slow stepper motor and a very fast piezoelectric driver. In another preferred embodiment chirp correction is made on a pulse-to-pulse basis where the wavelength of one pulse is measured and the wavelength of the next pulse is corrected based on the measurement. This correction technique is able to function at repetition rates as rapid as 2000 Hz and greater.Type: GrantFiled: June 19, 2000Date of Patent: March 4, 2003Assignee: Cymer, Inc.Inventors: George J. Everage, Igor V. Fomenkov, Palash P. Das, Richard L. Sandstrom, Frederick G. Erie, John M. Algots
-
Patent number: 6496528Abstract: A grating based line narrowing device for line narrowing lasers producing high energy laser beams. Techniques are provided for minimizing adverse effects of heat produced by the laser beam inside the line narrowing device. A flexural grating mount is provided which virtually eliminates stress on the grating caused by differential thermal expansion between the grating and the LNP housing structure. In a preferred embodiment the grating which is comprised of a very thin lined aluminum surface on a thick ultra low expansion glass substrate is attached to an aluminum housing structure using a flexural grating mount. At least one flexure joint is provided in the grating mount which permits thermal expansion and contraction of the aluminum housing without producing undesirable mechanical stresses in the glass substrate of the grating. In some embodiments the mount comprises a metal plate and the flexure joint is a H-Flex joint which is machined into the metal plate.Type: GrantFiled: June 29, 2001Date of Patent: December 17, 2002Assignee: Cymer, Inc.Inventors: Clay C. Titus, William G. Hulburd, Raymond F. Cybulski, John M. Algots, Michael S. Lysik
-
Publication number: 20020167975Abstract: An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond.Type: ApplicationFiled: December 21, 2001Publication date: November 14, 2002Inventors: Ronald L. Spangler, Jacob P. Lipcon, John A. Rule, Robert N. Jacques, Armen Kroyan, Ivan Lalovic, Igor V. Fomenkov, John M. Algots
-
Publication number: 20020154669Abstract: An electric discharge laser with fast wavelength correction. Fast wavelength correction equipment includes at least one piezoelectric drive and a fast wavelength measurement system and fast feedback response times. In a preferred embodiment, equipment is provided to control wavelength on a slow time frame of several milliseconds, on a intermediate time from of about one to five milliseconds and on a very fast time frame of a few microseconds. Preferred techniques include a combination of a relatively slow stepper motor and a very fast piezoelectric driver for tuning the laser wavelength using a tuning mirror. A preferred control technique is described (utilizing a very fast wavelength monitor) to provide the slow and intermediate wavelength control with the combination of a stepper motor and a piezoelectric driver. Very fast wavelength control is provided with a piezoelectric load cell in combination with the piezoelectric driver.Type: ApplicationFiled: December 21, 2001Publication date: October 24, 2002Inventors: Ronald L. Spangler, Robert N. Jacques, John A. Rule, Frederick A. Palenschat, Igor V. Fomenkov, John M. Algots, Jacob P. Lipcon, Richard L. Sandstrom
-
Publication number: 20020048288Abstract: An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond.Type: ApplicationFiled: July 27, 2001Publication date: April 25, 2002Inventors: Armen Kroyan, Ivan Lalovic, Igor V. Fomenkov, Palash P. Das, Richard L. Sandstrom, John M. Algots, Khurshid Ahmed
-
Publication number: 20020034208Abstract: A grating based line narrowing device for line narrowing lasers producing high energy laser beams. Techniques are provided for minimizing adverse effects of heat produced by the laser beam inside the line narrowing device.Type: ApplicationFiled: June 29, 2001Publication date: March 21, 2002Inventors: Clay C. Titus, William G. Hulburd, Raymond F. Cybulski, John M. Algots, Michael S. Lysik