Patents by Inventor John M. Cleary
John M. Cleary has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11761086Abstract: Cobalt precursors are described, having application for vapor deposition of cobalt on substrates, such as in atomic layer deposition (ALD) and chemical vapor deposition (CVD) processes for forming interconnects, capping structures, and bulk cobalt conductors, in the manufacture of integrated circuitry and thin film products.Type: GrantFiled: February 19, 2015Date of Patent: September 19, 2023Assignee: ENTEGRIS, INC.Inventors: Thomas H. Baum, Scott L. Battle, John M. Cleary, David W. Peters, Philip S.H. Chen
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Patent number: 10895010Abstract: Apparatus and method for volatilizing a source reagent susceptible to particle generation or presence of particles in the corresponding source reagent vapor, in which such particle generation or presence is suppressed by structural or processing features of the vapor generation system. Such apparatus and method are applicable to liquid and solid source reagents, particularly solid source reagents such as metal halides, e.g., hafnium chloride. The source reagent in one specific implementation is constituted by a porous monolithic bulk form of the source reagent material. The apparatus and method of the invention are usefully employed to provide source reagent vapor for applications such as atomic layer deposition (ALD) and ion implantation.Type: GrantFiled: October 25, 2016Date of Patent: January 19, 2021Assignee: ENTEGRIS, INC.Inventors: John M. Cleary, Jose I. Arno, Bryan C. Hendrix, Donn Naito, Scott Battle, John N. Gregg, Michael J. Wodjenski, Chongying Xu
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Patent number: 10526697Abstract: A solid source material is described for forming a tungsten-containing film. The solid source material is tungsten hexacarbonyl, wherein content of molybdenum is less than 1000 ppm. Such solid source material may be formed by a process including provision of particulate tungsten hexacarbonyl raw material of particles of size less than 5 mm, wherein particles of size greater than 1.4 mm are less than 15% of the particles, and wherein content of molybdenum is less than 1000 ppm, and sintering the particulate tungsten hexacarbonyl raw material at temperature below 100° C. to produce the solid source material as a sintered solid.Type: GrantFiled: February 28, 2016Date of Patent: January 7, 2020Assignee: ENTEGRIS, INC.Inventors: Thomas H. Baum, Robert L. Wright, Jr., Scott L. Battle, John M. Cleary
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Patent number: 10392700Abstract: Vaporizers are described, suited for vaporizing a vaporizable solid source materials to form vapor for subsequent use, e.g., a deposition of metal from organometallic source material vapor on a substrate for manufacture of integrated circuitry, LEDs, photovoltaic panels, and the like. Methods are described of fabricating such vaporizers, including methods of reconfiguring up-flow vaporizers for down-flow operation to accommodate higher flow rate solid delivery of source material vapor in applications requiring same.Type: GrantFiled: March 28, 2015Date of Patent: August 27, 2019Assignee: ENTEGRIS, INC.Inventors: Thomas H. Baum, Robert L. Wright, Jr., Bryan C. Hendrix, Scott L. Battle, John M. Cleary
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Patent number: 10385452Abstract: Systems, reagent support trays, particle suppression devices, and methods are disclosed. In one aspect, a system includes a vaporizer vessel having one or more interior walls enclosing an interior volume and a plurality of reagent support trays configured to be vertically stackable within the interior volume. Each of the plurality of reagent support trays is configured to be vertically stackable within the interior volume to form a stack of reagent support trays. One or more of the plurality of reagent support trays is configured to redirect a flow of a gas passing between adjacent reagent support trays in the stack of reagent support trays to cause the flow of gas to interact with the source reagent material in a particular reagent support tray before passing into a next of the plurality of reagent support trays in the stack of reagent support trays.Type: GrantFiled: May 31, 2013Date of Patent: August 20, 2019Assignee: ENTEGRIS, INC.Inventors: Bryan C. Hendrix, John N. Gregg, Scott L. Battle, Donn K. Naito, Kyle Bartosh, John M. Cleary, Sebum Cheon, Jordan Hodges
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Publication number: 20190186003Abstract: The invention is directed to a vaporizer or ampoule assembly with an improved vaporizer vessel body and support tray assembly configuration located therein that together increase the vaporizable material utilization and uniformity.Type: ApplicationFiled: December 10, 2018Publication date: June 20, 2019Inventors: David James ELDRIDGE, John M. CLEARY, Jacob THOMAS, Scott L. BATTLE, Thomas CHATTERTON, John GREGG, Bryan C. HENDRIX, Thomas H. BAUM
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Publication number: 20180044787Abstract: A solid source material is described for forming a tungsten-containing film. The solid source material is tungsten hexacarbonyl, wherein content of molybdenum is less than 1000 ppm. Such solid source material may be formed by a process including provision of particulate tungsten hexacarbonyl raw material of particles of size less than 5 mm, wherein particles of size greater than 1.4 mm are less than 15% of the particles, and wherein content of molybdenum is less than 1000 ppm, and sintering the particulate tungsten hexacarbonyl raw material at temperature below 100° C. to produce the solid source material as a sintered solid.Type: ApplicationFiled: February 28, 2016Publication date: February 15, 2018Inventors: Thomas H. BAUM, Robert L. WRIGHT, Jr., Scott L. BATTLE, John M. CLEARY
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Publication number: 20170342557Abstract: Vaporizers are described, suited for vaporizing a vaporizable solid source materials to form vapor for subsequent use, e.g., a deposition of metal from organometallic source material vapor on a substrate for manufacture of integrated circuitry, LEDs, photovoltaic panels, and the like. Methods are described of fabricating such vaporizers, including methods of reconfiguring up-flow vaporizers for down-flow operation to accommodate higher flow rate solid delivery of source material vapor in applications requiring same.Type: ApplicationFiled: March 28, 2015Publication date: November 30, 2017Inventors: Thomas H. BAUM, Robert L. WRIGHT, Jr., Bryan C. HENDRIX, Scott L. BATTLE, John M. CLEARY
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Publication number: 20170037511Abstract: Apparatus and method for volatilizing a source reagent susceptible to particle generation or presence of particles in the corresponding source reagent vapor, in which such particle generation or presence is suppressed by structural or processing features of the vapor generation system. Such apparatus and method are applicable to liquid and solid source reagents, particularly solid source reagents such as metal halides, e.g., hafnium chloride. The source reagent in one specific implementation is constituted by a porous monolithic bulk form of the source reagent material. The apparatus and method of the invention are usefully employed to provide source reagent vapor for applications such as atomic layer deposition (ALD) and ion implantation.Type: ApplicationFiled: October 25, 2016Publication date: February 9, 2017Inventors: John M. Cleary, Jose I. Arno, Bryan C. Hendrix, Donn Naito, Scott Battle, John N. Gregg, Michael J. Wodjenski, Chongying Xu
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Publication number: 20160369402Abstract: Cobalt precursors are described, having application for vapor deposition of cobalt on substrates, such as in atomic layer deposition (ALD) and chemical vapor deposition (CVD) processes for forming interconnects, capping structures, and bulk cobalt conductors, in the manufacture of integrated circuitry and thin film products.Type: ApplicationFiled: February 19, 2015Publication date: December 22, 2016Inventors: Thomas H. Baum, Scott L. Battle, John M. Cleary, David W. Peters, Philip S.H. Chen
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Publication number: 20150191819Abstract: Systems, reagent support trays, particle suppression devices, and methods are disclosed. In one aspect, a system includes a vaporizer vessel having one or more interior walls enclosing an interior volume and a plurality of reagent support trays configured to be vertically stackable within the interior volume. Each of the plurality of reagent support trays is configured to be vertically stackable within the interior volume to form a stack of reagent support trays. One or more of the plurality of reagent support trays is configured to redirect a flow of a gas passing between adjacent reagent support trays in the stack of reagent support trays to cause the flow of gas to interact with the source reagent material in a particular reagent support tray before passing into a next of the plurality of reagent support trays in the stack of reagent support trays.Type: ApplicationFiled: May 31, 2013Publication date: July 9, 2015Inventors: Bryan C. Hendrix, John N. Gregg, Scott L. Battle, Donn K. Naito, Kyle Bartosh, John M. Cleary, Sebum Cheon, Jordan Hodges
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Publication number: 20140329025Abstract: Apparatus and method for volatilizing a source reagent susceptible to particle generation or presence of particles in the corresponding source reagent vapor, in which such particle generation or presence is suppressed by structural or processing features of the vapor generation system. Such apparatus and method are applicable to liquid and solid source reagents, particularly solid source reagents such as metal halides, e.g., hafnium chloride. The source reagent in one specific implementation is constituted by a porous monolithic bulk form of the source reagent material. The apparatus and method of the invention are usefully employed to provide source reagent vapor for applications such as atomic layer deposition (ALD) and ion implantation.Type: ApplicationFiled: July 19, 2014Publication date: November 6, 2014Inventors: John M. Cleary, Jose I. Arno, Bryan C. Hendrix, Donn Naito, Scott Battle, John N. Gregg, Michael J. Wodjenski, Chongying Xu
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Patent number: 8821640Abstract: Apparatus and method for volatilizing a source reagent susceptible to particle generation or presence of particles in the corresponding source reagent vapor, in which such particle generation or presence is suppressed by structural or processing features of the vapor generation system. Such apparatus and method are applicable to liquid and solid source reagents, particularly solid source reagents such as metal halides, e.g., hafnium chloride. The source reagent in one specific implementation is constituted by a porous monolithic bulk form of the source reagent material. The apparatus and method of the invention are usefully employed to provide source reagent vapor for applications such as atomic layer deposition (ALD) and ion implantation.Type: GrantFiled: August 31, 2007Date of Patent: September 2, 2014Assignee: Advanced Technology Materials, Inc.Inventors: John M. Cleary, Jose I. Arno, Bryan C. Hendrix, Donn Naito, Scott Battle, John N. Gregg, Michael J. Wodjenski, Chongying Xu
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Publication number: 20100255198Abstract: Apparatus and method for volatilizing a source reagent susceptible to particle generation or presence of particles in the corresponding source reagent vapor, in which such particle generation or presence is suppressed by structural or processing features of the vapor generation system. Such apparatus and method are applicable to liquid and solid source reagents, particularly solid source reagents such as metal halides, e.g., hafnium chloride. The source reagent in one specific implementation is constituted by a porous monolithic bulk form of the source reagent material. The apparatus and method of the invention are usefully employed to provide source reagent vapor for applications such as atomic layer deposition (ALD) and ion implantation.Type: ApplicationFiled: August 31, 2007Publication date: October 7, 2010Applicant: ADVANCED TECHNOLOGY MATERIALS, INC.Inventors: John M. Cleary, Jose I. Arno, Bryan C. Hendrix, Donn Naito, Scott Battle, John N. Gregg, Michael J. Wodjenski, Chongying Xu
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Patent number: 4204149Abstract: Electronic restoration of switching to an "off" condition at the end of a prescribed and controllable time interval, with an indication of termination being provided before the end of the interval. The electronic circuitry for controlling the switching can be substantially integrated to permit compact, small space installation in, for example, the housings of conventional mechanical switches.Type: GrantFiled: July 18, 1977Date of Patent: May 20, 1980Inventors: James J. Cleary, John M. Cleary
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Patent number: 4015139Abstract: Switches of the kind formed by a controller with an actuator which is automatically restored to its "off" position at the end of a prescribed time interval and provides an indication shortly before the end of the interval. The controller may be manually energized or motor driven.Type: GrantFiled: May 6, 1975Date of Patent: March 29, 1977Inventors: John M. Cleary, John P. Mohrhauser
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Patent number: RE30295Abstract: Switches of the kind formed by a controller with an actuator which is automatically restored to its "off" position at the end of a prescribed time interval and provides an indication shortly before the end of the interval. The controller may be manually energized or motor driven.Type: GrantFiled: February 27, 1978Date of Patent: June 3, 1980Inventors: John M. Cleary, John P. Mohrhuaser