Abstract: Methods for the production of trisilane from the pyrolysis of disilane in a single reactor.

Abstract: Methods for the production of trisilane from the pyrolysis of disilane in a single reactor.

Abstract: An ammonia purification system includes a hydrocarbon removal station that removes hydrocarbons from gaseous ammonia via adsorption, a moisture removal station that removes water from gaseous ammonia via adsorption, and a distillation station including a distillation column connected with a condenser to facilitate removal of impurities from ammonia and condensation of gaseous ammonia to form a purified liquid ammonia product. The system further includes a storage tank to receive purified ammonia, a remote station connected with the storage tank, and a vaporizer connected with the storage tank. The vaporizer is configured to receive and vaporize liquid ammonia from the storage tank and deliver gaseous ammonia back to the storage tank so as to facilitate pumping of the ammonia to the remote station based upon a vapor pressure established within the storage tank.

Abstract: Herein is disclosed a method and an apparatus for preparing a highly purified gas from a crude liquid comprising the gas and one or more of a metal, particulates, water vapor, or a volatile impurity. The method comprises: (a) vaporizing the crude liquid, to yield (i) a first vapor stream comprising the gas and (ii) a first liquid stream comprising the gas; (b) removing water vapor, particulates, or both from the first vapor stream, to yield a second vapor stream comprising the gas; (c) condensing the second vapor stream, to yield a second liquid stream comprising the gas; and (d) sparging the second liquid stream with an inert gas, to yield (i) a third vapor stream comprising the gas and (ii) a third liquid stream comprising the highly purified gas. Also disclosed is a method for preparing an adsorbent to effectively remove water vapor from the gas, as well as an adsorbent so prepared.

Abstract: Herein is disclosed a method for preparing an adsorbent to effectively remove water vapor during purification of a corrosive gas, as well as an adsorbent so prepared.

Abstract: Herein is disclosed a method and an apparatus for preparing a highly purified gas from a crude liquid comprising the gas and one or more of a metal, particulates, water vapor, or a volatile impurity. The method comprises: (a) vaporizing the crude liquid, to yield (i) a first vapor stream comprising the gas and (ii) a first liquid stream comprising the gas; (b) removing water vapor, particulates, or both from the first vapor stream, to yield a second vapor stream comprising the gas; (c) condensing the second vapor stream, to yield a second liquid stream comprising the gas; and (d) sparging the second liquid stream with an inert gas, to yield (i) a third vapor stream comprising the gas and (ii) a third liquid stream comprising the highly purified gas. Also disclosed is a method for preparing an adsorbent to effectively remove water vapor from the gas, as well as an adsorbent so prepared.

Abstract: Provided are a system and method for nitrous oxide purification, wherein the nitrous oxide product is for use in semiconductor manufacturing. The system and process involve a first sub-system having a purification tank for holding a liquefied nitrous oxide, therein; a vaporizer in communication with the purification tank to receive, vaporize and convey a nitrous oxide vapor back to the purification tank; a distillation column disposed on a distal end of the purification tank to receive a nitrous oxide vapor; a condenser disposed on the distillation column, wherein light impurities are removed and wherein a nitrous oxide devoid of light impurities is conveyed and converted into vapor in the vaporizer. A second sub-system having a first dry bed vessel is disposed downstream of the vaporizer to receive the vapor and reacting the acid gas therein; a second dry bed vessel is disposed downstream of the first dry bed vessel for removing water and ammonia in the vapor.

Abstract: Provided are a system and method for nitrous oxide purification, wherein the nitrous oxide product for use in semiconductor manufacturing. The system and process involve a first sub-system having a purification tank for holding a liquefied nitrous oxide, therein; a vaporizer in communication with the purification tank to receive, vaporize and convey a nitrous oxide vapor back to the purification tank; a distillation column disposed on a distal end of the purification tank to receive a nitrous oxide vapor; a condenser disposed on the distillation column, wherein light impurities are removed and wherein a nitrous oxide devoid of light impurities is conveyed and converted into vapor in said vaporizer. A second sub-system having a first dry bed vessel is disposed downstream of the vaporizer to receive the vapor and reacting the acid gas therein; a second dry bed vessel downstream of the said first dry bed vessel for removing water and ammonia in the vapor.

Abstract: Provided are a system and method for nitrous oxide purification, wherein the nitrous oxide product for use in semiconductor manufacturing. The system and process involve a first sub-system having a purification tank for holding a liquefied nitrous oxide, therein; a vaporizer in communication with the purification tank to receive, vaporize and convey a nitrous oxide vapor back to the purification tank; a distillation column disposed on a distal end of the purification tank to receive a nitrous oxide vapor; a condenser disposed on the distillation column, wherein light impurities are removed and wherein a nitrous oxide devoid of light impurities is conveyed and converted into vapor in the vaporizer. A second sub-system having a first dry bed vessel is disposed downstream of the vaporizer to receive the vapor and reacting the acid gas therein; a second dry bed vessel downstream of the first dry bed vessel for removing water and ammonia in the vapor.

Abstract: Provided are a system and method for nitrous oxide purification, wherein the nitrous oxide product for use in semiconductor manufacturing. The system and process involve a first sub-system having a purification tank for holding a liquefied nitrous oxide, therein; a vaporizer in communication with the purification tank to receive, vaporize and convey a nitrous oxide vapor back to the purification tank; a distillation column disposed on a distal end of the purification tank to receive a nitrous oxide vapor; a condenser disposed on the distillation column, wherein light impurities are removed and wherein a nitrous oxide devoid of light impurities is conveyed and converted into vapor in said vaporizer. A second sub-system having a first dry bed vessel is disposed downstream of the vaporizer to receive the vapor and reacting the acid gas therein; a second dry bed vessel downstream of the said first dry bed vessel for removing water and ammonia in the vapor.

Abstract: Processes are disclosed for increasing the condensed phase production of BCl3 comprising less than about 10 ppm phosgene, less than 10 ppm chlorine, and less than 10 ppm HCl. In one embodiment the process comprises injecting an inert gas into a container having condensed BCl3 therein, the condensed BCl3 having therein a minor portion of phosgene impurity. A major portion of the phosgene in the condensed BCl3 is decomposed to carbon monoxide and chlorine by increasing temperature to produce a phosgene deficient stream. The temperature of the phosgene deficient stream is then decreased, and contacted with an adsorbent to remove the chlorine in the stream by adsorption to form a chlorine and phosgene free condensed stream. The chlorine and phosgene free stream is stripped using an inert gas to form a BCl3 product condensed stream, and an inert gas is used to pump the BCl3 product condensed stream to a product receiver.

Abstract: Processes are disclosed for increasing the condensed phase production of BCl3 comprising less than about 10 ppm phosgene, less than 10 ppm chlorine, and less than 10 ppm HCl. In one embodiment the process comprises injecting an inert gas into a container having condensed BCl3 therein, the condensed BCl3 having therein a minor portion of phosgene impurity. A major portion of the phosgene in the condensed BCl3 is decomposed to carbon monoxide and chlorine by increasing temperature to produce a phosgene deficient stream. The temperature of the phosgene deficient stream is then decreased, and contacted with an adsorbent to remove the chlorine in the stream by adsorption to form a chlorine and phosgene free condensed stream. The chlorine and phosgene free stream is stripped using an inert gas to form a BCl3 product condensed stream, and an inert gas is used to pump the BCl3 product condensed stream to a product receiver.

Abstract: Processes are disclosed for increasing the condensed phase production of BCl3 comprising less than about 10 ppm phosgene, less than 10 ppm chlorine, and less than 10 ppm HCl. In one embodiment the process comprises injecting an inert gas into a container having condensed BCl3 therein, the condensed BCl3 having therein a minor portion of phosgene impurity. A major portion of the phosgene in the condensed BCl3 is decomposed to carbon monoxide and chlorine by increasing temperature to produce a phosgene deficient stream. The temperature of the phosgene deficient stream is then decreased, and contacted with an adsorbent to remove the chlorine in the stream by adsorption to form a chlorine and phosgene free condensed stream. The chlorine and phosgene free stream is stripped using an inert gas to form a BCl3 product condensed stream, and an inert gas is used to pump the BCl3 product condensed stream to a product receiver.