Patents by Inventor John P. Paczkowski

John P. Paczkowski has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Ohmic contact and method for making same
    Patent number: 4794444
    Abstract: An Ohmic contact to a semiconductor body includes a thin semiconductor layer disposed between the body and a conductive layer. The thin layer is not alloyed to the conductive layer and not lattice matched to the body. The layer can have a thickness of less than about 100 nm and a lattice mismatch of at least 0.5 percent. Since the thin layer is not alloyed, a Schottky contact can be formed at the same time as the ohmic contact.
    Type: Grant
    Filed: April 10, 1986
    Date of Patent: December 27, 1988
    Assignee: General Electric Company
    Inventors: Shing-Gong Liu, John P. Paczkowski
  • Vapor phase deposition apparatus
    Patent number: 4316430
    Abstract: A vapor phase deposition apparatus includes a coaxially mounted reactor tube, jacketed assembly tube, bearing/plug assembly, and rod/substrate holder. Gas inlets are provided in the reactor tube, and assembly tube and a vent is provided on the jacketed portion of the assembly tube, such that a double counterflow gas pattern can be established in the apparatus. The apparatus permits controllable deposition cycle and it can be readily disassembled for periodic maintenance.
    Type: Grant
    Filed: September 30, 1980
    Date of Patent: February 23, 1982
    Assignee: RCA Corporation
    Inventors: Stuart T. Jolly, John P. Paczkowski