Patents by Inventor John P. Stirniman
John P. Stirniman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8490032Abstract: Techniques and systems for converting a non-bandlimited pattern layout into a band-limited pattern image are described. During operation, the system receives the non-bandlimited pattern layout which comprises one or more polygons. The system further receives an anti-aliasing filter (AAF) kernel, wherein the AAF kernel is configured to convert a non-bandlimited pattern into a band-limited pattern. The system then constructs an AAF lookup table for the AAF kernel, wherein the AAF lookup table contains precomputed values for a set of convolution functions which are obtained by convolving a set of basis functions with the AAF kernel. Next, the system creates a sampled pattern layout by applying a grid map over the pattern layout. The system then obtains the band-limited pattern image by using the AAF lookup table to convolve the AAF kernel with each grid location in the sampled pattern layout.Type: GrantFiled: September 28, 2010Date of Patent: July 16, 2013Assignee: Synopsys, Inc.Inventors: Michael L. Rieger, Micheal Cranford, John P. Stirniman
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Publication number: 20110016438Abstract: Techniques and systems for converting a non-bandlimited pattern layout into a band-limited pattern image are described. During operation, the system receives the non-bandlimited pattern layout which comprises one or more polygons. The system further receives an anti-aliasing filter (AAF) kernel, wherein the AAF kernel is configured to convert a non-bandlimited pattern into a band-limited pattern. The system then constructs an AAF lookup table for the AAF kernel, wherein the AAF lookup table contains precomputed values for a set of convolution functions which are obtained by convolving a set of basis functions with the AAF kernel. Next, the system creates a sampled pattern layout by applying a grid map over the pattern layout. The system then obtains the band-limited pattern image by using the AAF lookup table to convolve the AAF kernel with each grid location in the sampled pattern layout.Type: ApplicationFiled: September 28, 2010Publication date: January 20, 2011Applicant: SYNOPSYS, INC.Inventors: Michael L. Rieger, Micheal Cranford, John P. Stirniman
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Patent number: 7831954Abstract: An embodiment of the present invention provides a system that computes the effect of perturbations to a pattern layout during an OPC process. During operation, the system receives a pattern layout and a set of lithography model kernels. The system then obtains a set of convolved patterns by convolving the pattern layout with each of the set of lithography model kernels. The system additionally receives a perturbation pattern to be added onto the pattern layout. Next, for a query location on the pattern layout, the system obtains a set of convolution values at the query location by using model flash lookup tables to convolve the perturbation pattern with the set of lithography model kernels. The system then updates the set of convolved patterns at the query location to account for the effect of the perturbation pattern by combining the set of convolution values with the set of convolved patterns.Type: GrantFiled: September 25, 2007Date of Patent: November 9, 2010Assignee: Synopsys, Inc.Inventors: Michael L. Rieger, Micheal Cranford, John P. Stirniman
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Patent number: 7617478Abstract: One embodiment of the present invention provides a system that converts a non-bandlimited pattern layout into a band-limited pattern image to facilitate simulating an optical lithography process. During operation, the system receives the non-bandlimited pattern layout which comprises one or more polygons. The system further receives an anti-aliasing filter (AAF) kernel, wherein the AAF kernel is configured to convert a non-bandlimited pattern into a band-limited pattern. The system then constructs an AAF lookup table for the AAF kernel, wherein the AAF lookup table contains precomputed values for a set of convolution functions which are obtained by convolving a set of basis functions with the AAF kernel. Next, the system creates a sampled pattern layout by applying a grid map over the pattern layout. The system then obtains the band-limited pattern image by using the AAF lookup table to convolve the AAF kernel with each grid location in the sampled pattern layout.Type: GrantFiled: September 25, 2007Date of Patent: November 10, 2009Assignee: Synopsys, Inc.Inventors: Michael L. Rieger, Micheal Cranford, John P. Stirniman
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Publication number: 20090083693Abstract: Another embodiment of the present invention provides a system that computes the effect of perturbations to an input pattern layout during an OPC (Optical Proximity Correction) process. During operation, the system receives a pattern layout. The system further receives a set of lithography model kernels. The system then obtains a set of convolved patterns by convolving the pattern layout with each of the set of lithography model kernels. Next, the system computes a model flash lookup table for each of the lithography model kernels, wherein the model flash lookup table contains precomputed values for a set of convolution functions obtained by convolving a set of basis functions with the lithography model kernel. The system additionally receives a perturbation pattern to be added onto the pattern layout.Type: ApplicationFiled: September 25, 2007Publication date: March 26, 2009Applicant: SYNOPSYS, INC.Inventors: Michael L. Rieger, Micheal Cranford, John P. Stirniman
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Publication number: 20090083692Abstract: One embodiment of the present invention provides a system that converts a non-bandlimited pattern layout into a band-limited pattern image to facilitate simulating an optical lithography process. During operation, the system receives the non-bandlimited pattern layout which comprises one or more polygons. The system further receives an anti-aliasing filter (AAF) kernel, wherein the AAF kernel is configured to convert a non-bandlimited pattern into a band-limited pattern. The system then constructs an AAF lookup table for the AAF kernel, wherein the AAF lookup table contains precomputed values for a set of convolution functions which are obtained by convolving a set of basis functions with the AAF kernel. Next, the system creates a sampled pattern layout by applying a grid map over the pattern layout. The system then obtains the band-limited pattern image by using the AAF lookup table to convolve the AAF kernel with each grid location in the sampled pattern layout.Type: ApplicationFiled: September 25, 2007Publication date: March 26, 2009Applicant: SYNOPSYS, INC.Inventors: Michael L. Rieger, Micheal Cranford, John P. Stirniman
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Patent number: 7458059Abstract: A memory is encoded with a model of sensitivity of a distorted layout generated by simulation of a wafer fabrication process, with respect to a change in an original layout that is input to the simulation. The sensitivity model comprises an expression of convolution of the original layout with spatial functions (“kernels”) that are identical to kernels of a process model used in the simulation. A difference between the distorted layout and the original layout is computed, and the difference is divided by a sensitivity value which is obtained directly by evaluating the kemel-based sensitivity model, and the result is used to identify a proximity correction (such as serif size or contour movement) to be made to the original layout. Use of a sensitivity model based on a process model's kernels eliminates a second application of the process model to evaluate sensitivity, thereby to reduce memory and computation requirements.Type: GrantFiled: October 31, 2005Date of Patent: November 25, 2008Assignee: SYNOPSYS, Inc.Inventors: John P. Stirniman, Micheal D. Cranford
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Patent number: 6289499Abstract: A system for computing a pattern function for a polygonal pattern having a finite number of predetermined face angles. One method includes the steps of decomposing the polygon into a set of flashes, computing the pattern function by summing together all flashes evaluated at a point (x,y), and the pattern function returning a 1 if point (x,y) is inside a polygon and otherwise will return a 0.Type: GrantFiled: January 7, 2000Date of Patent: September 11, 2001Assignee: Avant! CorporationInventors: Michael L. Rieger, John P. Stirniman
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Patent number: 6081658Abstract: A system for computing a pattern function for a polygonal pattern having a finite number of predetermined face angles. One method includes the steps of decomposing the polygon into a set of flashes, computing the pattern function by summing together all flashes evaluated at a point (x,y), and the pattern function returning a 1 if point (x,y) is inside a polygon and otherwise will return a 0.Type: GrantFiled: December 31, 1997Date of Patent: June 27, 2000Assignee: Avant! CorporationInventors: Michael L. Rieger, John P. Stirniman