Abstract: A data compaction technique permits electron beam lithography systems to operate more efficiently in the fabrication of complex computer chips. One or more building block patterns are selected for the design to be encoded. Each shape in the set of building block patterns is given a sequence number for use in a data word for the design. The set of shape descriptors for each block is stored in a reference memory. The data word referencing a block includes a number of bytes which specify the stored block pattern data and control bits corresponding to sequence numbers of the pattern shapes in a maximum shape configuration. Each shape is assigned a bit according to its sequence number.

Abstract: A system and an algorithmic method are provided for scanning an electron beam in a predetermined pattern over a surface, which is partitioned into a matrix of sub-fields. The system includes an electron beam, and it determines the boundary portions of that pattern in a selected sub-field of the matrix which extends into the next sequential adjacent sub-fields in the same row and column as the selected sub-field. The coordinates of the pattern boundary portion in the selected and the adjacent sub-fields are stored in a memory. The electron beam scans over the surface for fully exposing the surface with all portions of the predetermined pattern within the selected sub-field, except for the boundary portions. Then the boundary portions in the currently selected sub-field are spliced, i.e. partially exposed, as are the boundary portions of the adjacent sub-fields which extend into the currently selected sub-field.