Patents by Inventor John R. Wade

John R. Wade has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9456540
    Abstract: A power take off coupling for connecting an engine (20, 21) to a site accessory (16, 14, 17), comprises a resilient power transmission component (3) within the coupling; a latching device (8, 46, 9) to mechanically latch the accessory to the engine (20, 21), with a manually operable release handle (13) to effect unlatching. A power output shaft of the engine (20, 21) carries one half (5) of a dog clutch with the other half (7) carried by the accessory (16, 14, 17).
    Type: Grant
    Filed: January 24, 2012
    Date of Patent: October 4, 2016
    Assignee: Evolution Power Tools Limited
    Inventors: Samuel Ryan Rees, John R. Wade
  • Publication number: 20130305851
    Abstract: A power take off coupling for connecting an engine (20, 21) to a site accessory (16, 14, 17), comprises a resilient power transmission component (3) within the coupling; a latching device (8, 46, 9) to mechanically latch the accessory to the engine (20, 21), with a manually operable release handle (13) to effect unlatching. A power output shaft of the engine (20, 21) carries one half (5) of a dog clutch with the other half (7) carried by the accessory (16, 14, 17).
    Type: Application
    Filed: January 24, 2012
    Publication date: November 21, 2013
    Applicant: EVOLUTION POWER TOOLS LIMITED
    Inventors: Samuel Ryan Rees, John R. Wade
  • Patent number: 5928833
    Abstract: A radiation sensitive material comprises particles including a water-insoluble heat-softenable core surrounded by a shell which is soluble or swellable in aqueous medium. The material also includes a radiation sensitive component which, on exposure to radiation, causes the solubility characteristics of the material to change. The material may be positive- or negative-working and may be coated onto a substrate from aqueous media to form a radiation sensitive plate which, after image-wise exposure, can be developed in aqueous media and then heated to cause the particles to coalesce and form a durable printing image.
    Type: Grant
    Filed: November 1, 1996
    Date of Patent: July 27, 1999
    Assignee: DuPont (U.K.) Ltd.
    Inventors: Andrew E. Matthews, David E. Murray, Allen P. Gates, John R. Wade, Michael J. Pratt, William A. King
  • Patent number: 5609980
    Abstract: A radiation sensitive material comprises particles including a water-insoluble heat-softenable core surrounded by a shell which is soluble or swellable in aqueous medium. The material also includes a radiation sensitive component which, on exposure to radiation, causes the solubility characteristics of the material to change. The material may be positive- or negative-working and may be coated onto a substrate from aqueous media to form a radiation sensitive plate which, after image-wise exposure, can be developed in aqueous media and then heated to cause the particles to coalesce and form a durable printing image.
    Type: Grant
    Filed: May 14, 1992
    Date of Patent: March 11, 1997
    Assignee: DuPont (U.K.) Ltd.
    Inventors: Andrew E. Matthews, David E. Murray, Allen P. Gates, John R. Wade, Michael J. Pratt, William A. King
  • Patent number: 5550001
    Abstract: A radiation-sensitive plate comprises a substrate coated with a radiation-sensitive composition including a component having groups imparting solubility in aqueous solutions and a component having functional groups capable of reacting with a silane compound. The surface of the composition is modified by reaction with a silane compound. The plate gives rise to images of improved ink receptivity and can be developed in aqueous developer liquids after image-wise exposure.
    Type: Grant
    Filed: May 5, 1994
    Date of Patent: August 27, 1996
    Assignee: DuPont (U.K.) Limited
    Inventors: John R. Wade, Michael J. Pratt, Robert A. W. Johnstone, David I. Smith
  • Patent number: 5534623
    Abstract: Polyunsaturated diazonium compounds suitable for use in negative working radiation sensitive compositions are provided. They may be produced by reacting an aromatic diazonium compound of the formula(A.sup.- N.sub.2.sup.+).sub.p --Ar--(R).sub.q --(XH).sub.rwith a polyethylenically unsaturated monoisocyanate compound of the general formula ##STR1## where p and q are integers ranging from 1 to 5, r is an integer ranging from 1 to 10; Ar represents a substituted or unsubstituted divalent or polyvalent radical derived from an aromatic or heteroaromatic compound; X represents O, S or a secondary or tertiary amino group; R represents a single bond or a substituted or unsubstituted divalent or other polyvalent radical and may be the same or different when q is greater than 1; A.sup.- represents an anion; Z represents the residue of a polyisocyanate OCN--Z--(NCO).sub.
    Type: Grant
    Filed: May 30, 1995
    Date of Patent: July 9, 1996
    Assignee: Du Pont (UK) Limited
    Inventors: John R. Wade, Michael J. Pratt, Jianrong Ren
  • Patent number: 5519136
    Abstract: A radiation-sensitive compound has the general formula ##STR1## wherein A represents the ring members required to complete a 5- or 6-membered heterocyclic ring which may optionally be fused to an optionally substituted aromatic nucleus,B represents H, acryl, aroyl, heterocyclyl carbonyl or ##STR2## R represents an optionally substituted alkyl group, E and G, which may be the same or different, each represents H or CH.sub.p X.sub.3-p,J and K, which may be the same or different, each represents an aryl or heterocyclic group, which may optionally include a substitutent additional to E or G,X represents Cl or Br, andm, n and p, which may be the same or different, each represents an integer equal to 0, 1 or 2.The compound can be used to form radiation sensitive compositions for the production of radiation sensitive plates in lithographic printing plate manufacture.
    Type: Grant
    Filed: May 22, 1992
    Date of Patent: May 21, 1996
    Inventor: John R. Wade
  • Patent number: 5466789
    Abstract: Polyunsaturated diazonium compounds suitable for use in negative working radiation sensitive compositions are provided. They may be produced by reacting an aromatic diazonium compound of the formula(A.sup.- N.sub.2.sup.+)p--Ar--(R)q--(XH)rwith a polyethlenically unsaturated monoisocyanate compound of the general formula ##STR1## where p and q are integers ranging from 1 to 5, r is an integer ranging from 1 to 10; Ar represents a substituted or unsubstituted divaient or polyvalent radical derived from an aromatic or heteroaromatic compound; X represents O, S or a secondary or tertiary amino group; R represents a single bond or a substituted or unsubstituted divalent or other polyvalent radical and may be the same or different when q is greater than 1; A.sup.- represents an anion; Z represents the residue of a polyisocyanate OCN--Z--(NCO)n where n is 1 or 2; and Y is the residue of a monohydroxy compound of the formula YOH where Y contains at least two ethylenically unsaturated double bonds.
    Type: Grant
    Filed: January 21, 1993
    Date of Patent: November 14, 1995
    Assignee: Du Pont (UK) Limited
    Inventors: John R. Wade, Michael J. Pratt, Jianrong Ren
  • Patent number: 5286603
    Abstract: A radiation sensitive plate comprises a substrate coated with a photopolymerisable composition. The composition comprises a polymerisable compound containing ethylenic unsaturation, a perester photoinitiator and optionally an optical sensitiser. The substrate may be a sheet of grained and anodised aluminum and the plate is useful in the production of lithographic printing plates.
    Type: Grant
    Filed: June 3, 1992
    Date of Patent: February 15, 1994
    Assignee: Vickers PLC
    Inventors: John R. Wade, Rodney M. Potts, Michael J. Pratt
  • Patent number: 5278022
    Abstract: A polymeric compound is derived from a polyhydric material and has pendant sulphonate groups of the general formula ##STR1## where X is an aliphatic, aromatic, carbocylic or heterocyclic group; Y is hydrogen, halogen or an alkyl, aryl, alkoxy, aryloxy or aralkyl group, CO.sub. --Z.sup.+, CO.sub.2 R or SO.sub.3 -Z.sup.+ ; Z.sup.+ is a cationic counter ion and R is hydrogen, alkyl, alkylene, aryl or aralkyl group.
    Type: Grant
    Filed: March 18, 1992
    Date of Patent: January 11, 1994
    Assignee: E. I. Du Pont de Nemours and Company
    Inventors: John R. Wade, Robert A. W. Johnstone
  • Patent number: 5264329
    Abstract: A radiation sensitive composition comprises a radiation sensitive material and a dye which dye undergoes a colour change in the radiation-struck areas on image-wise exposure of the composition and a colour change when the exposed and developed composition is heated to a temperature of at least 180.degree. C.
    Type: Grant
    Filed: May 21, 1992
    Date of Patent: November 23, 1993
    Assignee: DuPont (U.K.) Limited
    Inventors: John R. Wade, Terrence Etherington, Christopher W. Folkard
  • Patent number: 5141841
    Abstract: A radiation-sensitive compound has the general formula ##STR1## wherein A represents the ring members required to complete a 5- or 6-membered heterocyclic ring which may optionally be fused to an optionally substituted aromatic nucleus,B represents H, acyl, aroyl, heterocyclyl carbonyl or ##STR2## R represents an optionally substituted alkyl group, E and G, which may be the same or different, each represents H or CH.sub.p X.sub.3-p,J and K, which may be the same or different, each represents an aryl or heterocyclic group, which may optionally include a substituent additional to E or G,X represents Cl or Br, and m,n and p, which may be the same or different, each represents an integer equal to 0, 1 or 2.The compound can be used to form radiation sensitive compositions for the production of radiation sensitive plates in lithographic printing plate manufacture.
    Type: Grant
    Filed: August 17, 1989
    Date of Patent: August 25, 1992
    Assignee: Vickers PLC
    Inventor: John R. Wade
  • Patent number: 5130227
    Abstract: A radiation sensitive plate comprises a substrate coated with a photopolymerizable composition. The composition comprises a polymerizable compound containing ethylenic unsaturation, a perester photoinitiator and optionally an optical sensitiser. The substrate may be a sheet of grained and anodized aluminum and the plate is useful in the production of lithographic printing plates.
    Type: Grant
    Filed: October 5, 1989
    Date of Patent: July 14, 1992
    Assignee: Vickers Plc
    Inventors: John R. Wade, Rodney M. Potts, Michael J. Pratt
  • Patent number: 5130228
    Abstract: A radiation sensitive composition comprises a radiation sensitive material and a dye which dye undergoes a color change in the radiation-struck areas on image-wise exposure of the composition and a color change when the exposed and developed composition is heated to a temperature of at least 180.degree. C.
    Type: Grant
    Filed: September 12, 1990
    Date of Patent: July 14, 1992
    Assignee: DuPont-Howson Limited
    Inventors: John R. Wade, Terrence Etherington, Christopher W. Folkard
  • Patent number: 5120799
    Abstract: A polymeric compound is derived from a polyhydric material and has pendant sulphonate groups of the general formula ##STR1## where X is an aliphatic, aromatic, carbocylic or heterocyclic group; Y is hydrogen, halogen or an alkyl, aryl, alkoxy, aryloxy or aralkyl group, CO.sub.2 --Z.sup.+, CO.sub.2 R or SO.sub.3 --Z.sup.+ ; Z.sup.+ is a cationic counter ion and R is hydrogen, alkyl, alkylene, aryl or aralkyl group.Wherein the polymeric acompound is produced by reacting a polymer having a plurality of pendant hydroxyl groups with a sulphonato substituted acid or with an ester forming derivative.
    Type: Grant
    Filed: August 30, 1989
    Date of Patent: June 9, 1992
    Assignee: E. I. Du Pont de Nemours and Company (Inc.)
    Inventors: John R. Wade, Robert A. W. Johnstone
  • Patent number: 4999271
    Abstract: A printing plate precursor comprises a substrate coated with a radiation sensitive composition comprising a photoinitiator and a photopolymerizable urethane acrylate or methacrylate. The urethane acrylate or methacrylate is produced by partial acrylation or methacrylation of a tetrafunctional polyol and the remaining hydroxy groups of the polyol are reacted with a di or polyisocyanate.
    Type: Grant
    Filed: January 17, 1989
    Date of Patent: March 12, 1991
    Assignee: Vickers PLC
    Inventors: Terence Etherington, Keith M. Fletcher, Rodney M. Potts, John R. Wade
  • Patent number: 4946960
    Abstract: Perester compounds suitable for causing the polymerisation of addition polymerisable compounds on exposure to radiation have the general formulae ##STR1##
    Type: Grant
    Filed: October 9, 1987
    Date of Patent: August 7, 1990
    Assignee: Vickers PLC
    Inventors: John R. Wade, Rodney M. Potts, Michael J. Pratt
  • Patent number: 4942111
    Abstract: A printing plate precursor comprises a substrate coated with a radiation sensitive composition overcoated with a barrier layer to prevent oxygen inhibiting photopolymerization of the composition. The barrier layer comprises a polymer and an amphoteric compound.
    Type: Grant
    Filed: February 22, 1990
    Date of Patent: July 17, 1990
    Assignee: Vickers PLC
    Inventors: John R. Wade, Jeremy R. Burch, Rodney M. Potts