Patents by Inventor John R. Wade
John R. Wade has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9456540Abstract: A power take off coupling for connecting an engine (20, 21) to a site accessory (16, 14, 17), comprises a resilient power transmission component (3) within the coupling; a latching device (8, 46, 9) to mechanically latch the accessory to the engine (20, 21), with a manually operable release handle (13) to effect unlatching. A power output shaft of the engine (20, 21) carries one half (5) of a dog clutch with the other half (7) carried by the accessory (16, 14, 17).Type: GrantFiled: January 24, 2012Date of Patent: October 4, 2016Assignee: Evolution Power Tools LimitedInventors: Samuel Ryan Rees, John R. Wade
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Publication number: 20130305851Abstract: A power take off coupling for connecting an engine (20, 21) to a site accessory (16, 14, 17), comprises a resilient power transmission component (3) within the coupling; a latching device (8, 46, 9) to mechanically latch the accessory to the engine (20, 21), with a manually operable release handle (13) to effect unlatching. A power output shaft of the engine (20, 21) carries one half (5) of a dog clutch with the other half (7) carried by the accessory (16, 14, 17).Type: ApplicationFiled: January 24, 2012Publication date: November 21, 2013Applicant: EVOLUTION POWER TOOLS LIMITEDInventors: Samuel Ryan Rees, John R. Wade
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Patent number: 5928833Abstract: A radiation sensitive material comprises particles including a water-insoluble heat-softenable core surrounded by a shell which is soluble or swellable in aqueous medium. The material also includes a radiation sensitive component which, on exposure to radiation, causes the solubility characteristics of the material to change. The material may be positive- or negative-working and may be coated onto a substrate from aqueous media to form a radiation sensitive plate which, after image-wise exposure, can be developed in aqueous media and then heated to cause the particles to coalesce and form a durable printing image.Type: GrantFiled: November 1, 1996Date of Patent: July 27, 1999Assignee: DuPont (U.K.) Ltd.Inventors: Andrew E. Matthews, David E. Murray, Allen P. Gates, John R. Wade, Michael J. Pratt, William A. King
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Patent number: 5609980Abstract: A radiation sensitive material comprises particles including a water-insoluble heat-softenable core surrounded by a shell which is soluble or swellable in aqueous medium. The material also includes a radiation sensitive component which, on exposure to radiation, causes the solubility characteristics of the material to change. The material may be positive- or negative-working and may be coated onto a substrate from aqueous media to form a radiation sensitive plate which, after image-wise exposure, can be developed in aqueous media and then heated to cause the particles to coalesce and form a durable printing image.Type: GrantFiled: May 14, 1992Date of Patent: March 11, 1997Assignee: DuPont (U.K.) Ltd.Inventors: Andrew E. Matthews, David E. Murray, Allen P. Gates, John R. Wade, Michael J. Pratt, William A. King
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Lithographic printing plates containing functional groups capable of reacting with a silane compound
Patent number: 5550001Abstract: A radiation-sensitive plate comprises a substrate coated with a radiation-sensitive composition including a component having groups imparting solubility in aqueous solutions and a component having functional groups capable of reacting with a silane compound. The surface of the composition is modified by reaction with a silane compound. The plate gives rise to images of improved ink receptivity and can be developed in aqueous developer liquids after image-wise exposure.Type: GrantFiled: May 5, 1994Date of Patent: August 27, 1996Assignee: DuPont (U.K.) LimitedInventors: John R. Wade, Michael J. Pratt, Robert A. W. Johnstone, David I. Smith -
Patent number: 5534623Abstract: Polyunsaturated diazonium compounds suitable for use in negative working radiation sensitive compositions are provided. They may be produced by reacting an aromatic diazonium compound of the formula(A.sup.- N.sub.2.sup.+).sub.p --Ar--(R).sub.q --(XH).sub.rwith a polyethylenically unsaturated monoisocyanate compound of the general formula ##STR1## where p and q are integers ranging from 1 to 5, r is an integer ranging from 1 to 10; Ar represents a substituted or unsubstituted divalent or polyvalent radical derived from an aromatic or heteroaromatic compound; X represents O, S or a secondary or tertiary amino group; R represents a single bond or a substituted or unsubstituted divalent or other polyvalent radical and may be the same or different when q is greater than 1; A.sup.- represents an anion; Z represents the residue of a polyisocyanate OCN--Z--(NCO).sub.Type: GrantFiled: May 30, 1995Date of Patent: July 9, 1996Assignee: Du Pont (UK) LimitedInventors: John R. Wade, Michael J. Pratt, Jianrong Ren
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Patent number: 5519136Abstract: A radiation-sensitive compound has the general formula ##STR1## wherein A represents the ring members required to complete a 5- or 6-membered heterocyclic ring which may optionally be fused to an optionally substituted aromatic nucleus,B represents H, acryl, aroyl, heterocyclyl carbonyl or ##STR2## R represents an optionally substituted alkyl group, E and G, which may be the same or different, each represents H or CH.sub.p X.sub.3-p,J and K, which may be the same or different, each represents an aryl or heterocyclic group, which may optionally include a substitutent additional to E or G,X represents Cl or Br, andm, n and p, which may be the same or different, each represents an integer equal to 0, 1 or 2.The compound can be used to form radiation sensitive compositions for the production of radiation sensitive plates in lithographic printing plate manufacture.Type: GrantFiled: May 22, 1992Date of Patent: May 21, 1996Inventor: John R. Wade
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Patent number: 5466789Abstract: Polyunsaturated diazonium compounds suitable for use in negative working radiation sensitive compositions are provided. They may be produced by reacting an aromatic diazonium compound of the formula(A.sup.- N.sub.2.sup.+)p--Ar--(R)q--(XH)rwith a polyethlenically unsaturated monoisocyanate compound of the general formula ##STR1## where p and q are integers ranging from 1 to 5, r is an integer ranging from 1 to 10; Ar represents a substituted or unsubstituted divaient or polyvalent radical derived from an aromatic or heteroaromatic compound; X represents O, S or a secondary or tertiary amino group; R represents a single bond or a substituted or unsubstituted divalent or other polyvalent radical and may be the same or different when q is greater than 1; A.sup.- represents an anion; Z represents the residue of a polyisocyanate OCN--Z--(NCO)n where n is 1 or 2; and Y is the residue of a monohydroxy compound of the formula YOH where Y contains at least two ethylenically unsaturated double bonds.Type: GrantFiled: January 21, 1993Date of Patent: November 14, 1995Assignee: Du Pont (UK) LimitedInventors: John R. Wade, Michael J. Pratt, Jianrong Ren
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Patent number: 5286603Abstract: A radiation sensitive plate comprises a substrate coated with a photopolymerisable composition. The composition comprises a polymerisable compound containing ethylenic unsaturation, a perester photoinitiator and optionally an optical sensitiser. The substrate may be a sheet of grained and anodised aluminum and the plate is useful in the production of lithographic printing plates.Type: GrantFiled: June 3, 1992Date of Patent: February 15, 1994Assignee: Vickers PLCInventors: John R. Wade, Rodney M. Potts, Michael J. Pratt
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Patent number: 5278022Abstract: A polymeric compound is derived from a polyhydric material and has pendant sulphonate groups of the general formula ##STR1## where X is an aliphatic, aromatic, carbocylic or heterocyclic group; Y is hydrogen, halogen or an alkyl, aryl, alkoxy, aryloxy or aralkyl group, CO.sub. --Z.sup.+, CO.sub.2 R or SO.sub.3 -Z.sup.+ ; Z.sup.+ is a cationic counter ion and R is hydrogen, alkyl, alkylene, aryl or aralkyl group.Type: GrantFiled: March 18, 1992Date of Patent: January 11, 1994Assignee: E. I. Du Pont de Nemours and CompanyInventors: John R. Wade, Robert A. W. Johnstone
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Patent number: 5264329Abstract: A radiation sensitive composition comprises a radiation sensitive material and a dye which dye undergoes a colour change in the radiation-struck areas on image-wise exposure of the composition and a colour change when the exposed and developed composition is heated to a temperature of at least 180.degree. C.Type: GrantFiled: May 21, 1992Date of Patent: November 23, 1993Assignee: DuPont (U.K.) LimitedInventors: John R. Wade, Terrence Etherington, Christopher W. Folkard
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Patent number: 5141841Abstract: A radiation-sensitive compound has the general formula ##STR1## wherein A represents the ring members required to complete a 5- or 6-membered heterocyclic ring which may optionally be fused to an optionally substituted aromatic nucleus,B represents H, acyl, aroyl, heterocyclyl carbonyl or ##STR2## R represents an optionally substituted alkyl group, E and G, which may be the same or different, each represents H or CH.sub.p X.sub.3-p,J and K, which may be the same or different, each represents an aryl or heterocyclic group, which may optionally include a substituent additional to E or G,X represents Cl or Br, and m,n and p, which may be the same or different, each represents an integer equal to 0, 1 or 2.The compound can be used to form radiation sensitive compositions for the production of radiation sensitive plates in lithographic printing plate manufacture.Type: GrantFiled: August 17, 1989Date of Patent: August 25, 1992Assignee: Vickers PLCInventor: John R. Wade
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Patent number: 5130227Abstract: A radiation sensitive plate comprises a substrate coated with a photopolymerizable composition. The composition comprises a polymerizable compound containing ethylenic unsaturation, a perester photoinitiator and optionally an optical sensitiser. The substrate may be a sheet of grained and anodized aluminum and the plate is useful in the production of lithographic printing plates.Type: GrantFiled: October 5, 1989Date of Patent: July 14, 1992Assignee: Vickers PlcInventors: John R. Wade, Rodney M. Potts, Michael J. Pratt
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Patent number: 5130228Abstract: A radiation sensitive composition comprises a radiation sensitive material and a dye which dye undergoes a color change in the radiation-struck areas on image-wise exposure of the composition and a color change when the exposed and developed composition is heated to a temperature of at least 180.degree. C.Type: GrantFiled: September 12, 1990Date of Patent: July 14, 1992Assignee: DuPont-Howson LimitedInventors: John R. Wade, Terrence Etherington, Christopher W. Folkard
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Polymeric compounds having pendant sulphonato groups and method of producing the polymeric compounds
Patent number: 5120799Abstract: A polymeric compound is derived from a polyhydric material and has pendant sulphonate groups of the general formula ##STR1## where X is an aliphatic, aromatic, carbocylic or heterocyclic group; Y is hydrogen, halogen or an alkyl, aryl, alkoxy, aryloxy or aralkyl group, CO.sub.2 --Z.sup.+, CO.sub.2 R or SO.sub.3 --Z.sup.+ ; Z.sup.+ is a cationic counter ion and R is hydrogen, alkyl, alkylene, aryl or aralkyl group.Wherein the polymeric acompound is produced by reacting a polymer having a plurality of pendant hydroxyl groups with a sulphonato substituted acid or with an ester forming derivative.Type: GrantFiled: August 30, 1989Date of Patent: June 9, 1992Assignee: E. I. Du Pont de Nemours and Company (Inc.)Inventors: John R. Wade, Robert A. W. Johnstone -
Patent number: 4999271Abstract: A printing plate precursor comprises a substrate coated with a radiation sensitive composition comprising a photoinitiator and a photopolymerizable urethane acrylate or methacrylate. The urethane acrylate or methacrylate is produced by partial acrylation or methacrylation of a tetrafunctional polyol and the remaining hydroxy groups of the polyol are reacted with a di or polyisocyanate.Type: GrantFiled: January 17, 1989Date of Patent: March 12, 1991Assignee: Vickers PLCInventors: Terence Etherington, Keith M. Fletcher, Rodney M. Potts, John R. Wade
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Patent number: 4946960Abstract: Perester compounds suitable for causing the polymerisation of addition polymerisable compounds on exposure to radiation have the general formulae ##STR1##Type: GrantFiled: October 9, 1987Date of Patent: August 7, 1990Assignee: Vickers PLCInventors: John R. Wade, Rodney M. Potts, Michael J. Pratt
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Patent number: 4942111Abstract: A printing plate precursor comprises a substrate coated with a radiation sensitive composition overcoated with a barrier layer to prevent oxygen inhibiting photopolymerization of the composition. The barrier layer comprises a polymer and an amphoteric compound.Type: GrantFiled: February 22, 1990Date of Patent: July 17, 1990Assignee: Vickers PLCInventors: John R. Wade, Jeremy R. Burch, Rodney M. Potts