Abstract: A control system for fine tuning or spreading a charged particle pencil beam includes a low-inductance, low-power compensation or fine-tuning magnet assembly. The feedback loop that includes the compensation magnet assembly has a faster response rate than the feedback loop that includes the scan nozzle. The compensation or fine-tuning magnet assembly is preferably disposed upstream of the scan nozzle magnet(s) with respect to the beam path to make rapid but minor adjustments to the beam position between iterations of the scan nozzle.

Abstract: A control system for fine tuning or spreading a charged particle pencil beam includes a low-inductance, low-power compensation or fine-tuning magnet assembly. The feedback loop that includes the compensation magnet assembly has a faster response rate than the feedback loop that includes the scan nozzle. The compensation or fine-tuning magnet assembly is preferably disposed upstream of the scan nozzle magnet(s) with respect to the beam path to make rapid but minor adjustments to the beam position between iterations of the scan nozzle.

Abstract: Delivering a beam of charged particles includes providing the beam along a first trajectory to a linear array of magnets and energizing two or more of the magnets in the linear array to deflect the beam to a second trajectory, in which the second trajectory is substantially orthogonal to the first trajectory. The beam can be deflected to any position along a straight linear path.

Abstract: An ion implanter employs two three gap rf accelerator stages to boost the implant energy after mass selection. The electrodes of the accelerator stages have slit-shaped apertures that accommodate high beam current, when the accelerator is in drift mode. By particular choice of the parameters of the accelerator, each stage of the accelerator produces accelerated ions having a relatively small energy spread, even though the acceptance range of the accelerator stage extends over a substantial phase angle of the applied rf voltage. The resulting accelerator is flexible, permitting a wide variation of output energies with good beam dynamics. Ion bunches from the first three gap stage are caused to have the correct flight time to reach the second stage for acceleration by adjusting the speed of the ions while maintaining the rf phase of the fields in the two stages locked to fixed values.