Patents by Inventor John William Brown
John William Brown has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11925262Abstract: Runner assembly 10 for carrying a receptacle 12 towards and away from a structure 14. The runner assembly 10 includes: at least one pair of first bearings 16, each first bearing 16 being mountable to the structure 14 so that the first bearings 16 of the, or each, pair are spaced apart; an elongate runner 18 defining a longitudinal length and having an opposed pair of first tracks 22 spaced from each other, each first track 22 configured to cooperate with the first bearings 16 to allow the runner 18 to be carried by the first bearings 16; at least one second bearing 24 mounted to the runner 18; and an elongate track member 26 mountable to the receptacle 12, the track member 26 having a second track 28 defining at least one pair of opposed bearing surfaces 30, 31 spaced from each other and configured to cooperate with the at least one second bearing 24 to allow the track member 26 to be carried by the at least one second bearing 24.Type: GrantFiled: February 19, 2021Date of Patent: March 12, 2024Assignee: ARB CORPORATION LIMITEDInventors: Paul William Cooper, John Desmond Clark, Andrew Harry Brown
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Publication number: 20230139746Abstract: An optical source for a photolithography tool includes a source configured to emit a first beam of light and a second beam of light, the first beam of light having a first wavelength, and the second beam of light having a second wavelength, the first and second wavelengths being different; an amplifier configured to amplify the first beam of light and the second beam of light to produce, respectively, a first amplified light beam and a second amplified light beam; and an optical isolator between the source and the amplifier, the optical isolator including: a plurality of dichroic optical elements, and an optical modulator between two of the dichroic optical elements.Type: ApplicationFiled: December 6, 2022Publication date: May 4, 2023Inventors: Yezheng Tao, Daniel John William Brown, Alexander Anthony Schafgans, Palash Parijat Das
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Patent number: 11553582Abstract: An optical source for a photolithography tool includes a source configured to emit a first beam of light and a second beam of light, the first beam of light having a first wavelength, and the second beam of light having a second wavelength, the first and second wavelengths being different; an amplifier configured to amplify the first beam of light and the second beam of light to produce, respectively, a first amplified light beam and a second amplified light beam; and an optical isolator between the source and the amplifier, the optical isolator including: a plurality of dichroic optical elements, and an optical modulator between two of the dichroic optical elements.Type: GrantFiled: April 6, 2020Date of Patent: January 10, 2023Assignee: ASML Netherlands, B.V.Inventors: Yezheng Tao, Daniel John William Brown, Alexander Anthony Schafgans, Palash Parijat Das
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Publication number: 20220260756Abstract: Provided is an optical element for a lithographic apparatus. The optical element includes a capping layer that includes oxygen vacancies therein. The oxygen vacancies prevent attack of the capping layer by preventing hydrogen and other species from penetrating the capping layer and underlying layers. The capping layer provides a low hydrogen recombination rate enabling hydrogen to clean the surface of the optical element. The capping layer may include an alloyed metal, a mixed metal oxide or a doped metal oxide and it may be a ruthenium capping layer that includes one or more dopants therein.Type: ApplicationFiled: June 26, 2020Publication date: August 18, 2022Inventors: Yue Ma, Marcus Adrianus Van De Kerkhof, Qiushi Zhu, Klaus Martin Hummler, Peter Matthew Mayer, Kay Hoffmann, Andrew David LaForge, Igor Vladimirovich Fomenkov, Daniel John William Brown
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Publication number: 20200305263Abstract: An optical source for a photolithography tool includes a source configured to emit a first beam of light and a second beam of light, the first beam of light having a first wavelength, and the second beam of light having a second wavelength, the first and second wavelengths being different; an amplifier configured to amplify the first beam of light and the second beam of light to produce, respectively, a first amplified light beam and a second amplified light beam; and an optical isolator between the source and the amplifier, the optical isolator including: a plurality of dichroic optical elements, and an optical modulator between two of the dichroic optical elements.Type: ApplicationFiled: April 6, 2020Publication date: September 24, 2020Inventors: Yezheng Tao, Daniel John William Brown, Alexander Anthony Schafgans, Palash Parijat Das
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Patent number: 10667377Abstract: A target material is provided at a target location, the target material including a material that emits extreme ultraviolet light when converted to plasma, and the target material extending in a first extent along a first direction and in a second extent along a second direction; an amplified light beam is directed along a direction of propagation toward the target location; and the amplified light beam is focused in a focal plane, where the target location is outside of the focal plane and an interaction between the amplified light beam and the target material converts at least part of the target material to plasma that emits EUV light.Type: GrantFiled: December 28, 2015Date of Patent: May 26, 2020Assignee: ASML Netherlands B.V.Inventors: Robert Jay Rafac, Richard L. Sandstrom, Daniel John William Brown, Kai-Chung Hou
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Patent number: 10663866Abstract: An optical source for an extreme ultraviolet (EUV) photolithography tool includes a light-generation system including a light-generation module; an optical amplifier including a gain medium associated with a gain band, the gain medium configured to amplify light having a wavelength in the gain band; and a wavelength-based optical filter system on a beam path between the light-generation module and the optical amplifier, the wavelength-based optical filter system including at least one optical element configured to allow light having a wavelength in a first set of wavelengths to propagate on the beam path and to remove light having a wavelength in a second set of wavelengths from the beam path, the first set of wavelengths and the second set of wavelengths including different wavelengths in the gain band of the optical amplifier.Type: GrantFiled: September 20, 2016Date of Patent: May 26, 2020Assignee: ASML Netherlands B.V.Inventors: Alexander Anthony Schafgans, Igor Vladimirovich Fomenkov, Yezheng Tao, Rostislav Rokitski, Robert Jay Rafac, Daniel John William Brown, Cory Alan Stinson
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Patent number: 10645789Abstract: An optical source for a photolithography tool includes a source configured to emit a first beam of light and a second beam of light, the first beam of light having a first wavelength, and the second beam of light having a second wavelength, the first and second wavelengths being different; an amplifier configured to amplify the first beam of light and the second beam of light to produce, respectively, a first amplified light beam and a second amplified light beam; and an optical isolator between the source and the amplifier, the optical isolator including: a plurality of dichroic optical elements, and an optical modulator between two of the dichroic optical elements.Type: GrantFiled: October 23, 2017Date of Patent: May 5, 2020Assignee: ASML Netherlands B.V.Inventors: Yezheng Tao, Daniel John William Brown, Alexander Anthony Schafgans, Palash Parijat Das
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Publication number: 20180081280Abstract: An optical source for an extreme ultraviolet (EUV) photolithography tool includes a light-generation system including a light-generation module; an optical amplifier including a gain medium associated with a gain band, the gain medium configured to amplify light having a wavelength in the gain band; and a wavelength-based optical filter system on a beam path between the light-generation module and the optical amplifier, the wavelength-based optical filter system including at least one optical element configured to allow light having a wavelength in a first set of wavelengths to propagate on the beam path and to remove light having a wavelength in a second set of wavelengths from the beam path, the first set of wavelengths and the second set of wavelengths including different wavelengths in the gain band of the optical amplifier.Type: ApplicationFiled: September 20, 2016Publication date: March 22, 2018Inventors: Alexander Anthony Schafgans, Igor Vladimirovich Fomenkov, Yezheng Tao, Rostislav Rokitski, Robert Jay Rafac, Daniel John William Brown, Cory Alan Stinson
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Publication number: 20180063935Abstract: An optical source for a photolithography tool includes a source configured to emit a first beam of light and a second beam of light, the first beam of light having a first wavelength, and the second beam of light having a second wavelength, the first and second wavelengths being different; an amplifier configured to amplify the first beam of light and the second beam of light to produce, respectively, a first amplified light beam and a second amplified light beam; and an optical isolator between the source and the amplifier, the optical isolator including: a plurality of dichroic optical elements, and an optical modulator between two of the dichroic optical elements.Type: ApplicationFiled: October 23, 2017Publication date: March 1, 2018Inventors: Yezheng Tao, Daniel John William Brown, Alexander Anthony Schafgans, Palash Parijat Das
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Patent number: 9832855Abstract: An optical source for a photolithography tool includes a source configured to emit a first beam of light and a second beam of light, the first beam of light having a first wavelength, and the second beam of light having a second wavelength, the first and second wavelengths being different; an amplifier configured to amplify the first beam of light and the second beam of light to produce, respectively, a first amplified light beam and a second amplified light beam; and an optical isolator between the source and the amplifier, the optical isolator including: a plurality of dichroic optical elements, and an optical modulator between two of the dichroic optical elements.Type: GrantFiled: December 15, 2015Date of Patent: November 28, 2017Assignee: ASML Netherlands B.V.Inventors: Yezheng Tao, Daniel John William Brown, Alexander Anthony Schafgans, Palash Parijat Das
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Publication number: 20170099721Abstract: An optical source for a photolithography tool includes a source configured to emit a first beam of light and a second beam of light, the first beam of light having a first wavelength, and the second beam of light having a second wavelength, the first and second wavelengths being different; an amplifier configured to amplify the first beam of light and the second beam of light to produce, respectively, a first amplified light beam and a second amplified light beam; and an optical isolator between the source and the amplifier, the optical isolator including: a plurality of dichroic optical elements, and an optical modulator between two of the dichroic optical elements.Type: ApplicationFiled: December 15, 2015Publication date: April 6, 2017Inventors: Yezheng Tao, Daniel John William Brown, Alexander Anthony Schafgans, Palash Parijat Das
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Patent number: 9462668Abstract: Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.Type: GrantFiled: October 2, 2015Date of Patent: October 4, 2016Assignee: ASML Netherlands B.V.Inventors: Yezheng Tao, Robert Jay Rafac, Igor Vladimirovich Fomenkov, Daniel John William Brown, Daniel James Golich
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Publication number: 20160192468Abstract: A target material is provided at a target location, the target material including a material that emits extreme ultraviolet light when converted to plasma, and the target material extending in a first extent along a first direction and in a second extent along a second direction; an amplified light beam is directed along a direction of propagation toward the target location; and the amplified light beam is focused in a focal plane, where the target location is outside of the focal plane and an interaction between the amplified light beam and the target material converts at least part of the target material to plasma that emits EUV light.Type: ApplicationFiled: December 28, 2015Publication date: June 30, 2016Inventors: Robert Jay Rafac, Richard L. Sandstrom, Daniel John William Brown, Kai-Chung Hou
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Publication number: 20160165709Abstract: A method and apparatus for protecting the seed laser a laser produced plasma (LPP) extreme ultraviolet (EUV) light system are disclosed. An isolation stage positioned on an optical path diverts light reflected from further components in the LPP EUV light system from reaching the seed laser. The isolation stage comprises two AOMs that are separated by a delay line. The AOMs, when open, direct light onto the optical path and, when closed, direct light away from the optical path. The delay introduced by the delay line is determined so that the opening and the closing of the AOMs can be timed to direct a forward-moving pulse onto the optical path and to divert reflected light at other times. The isolation stage can be positioned between gain elements to prevent amplified reflected light from reaching the seed laser and other potentially harmful effects.Type: ApplicationFiled: December 5, 2014Publication date: June 9, 2016Inventors: Yezheng Tao, Daniel John William Brown, Daniel J. Golich, Michael Kats, John T. Stewart, Rostislav Rokitski
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Publication number: 20160029471Abstract: Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.Type: ApplicationFiled: October 2, 2015Publication date: January 28, 2016Inventors: Yezheng Tao, Robert Jay Rafac, Igor Vladimirovich Fomenkov, Daniel John William Brown, Daniel James Golich
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Publication number: 20040140907Abstract: A user programmable universal industrial wireless control system for remotely controlling industrial equipment. The industrial control system includes relay systems that are connected with a stopping and starting system of the industrial equipment. The industrial control system, according to the signals received from the transmitter, causes the relay systems to be either energized or de-energized as required to start and/or stop the industrial equipment. The relay systems are user programmable to be either momentary, maintained, or have timer functions.Type: ApplicationFiled: January 22, 2003Publication date: July 22, 2004Inventors: Alfred John Morin, John William Brown
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Patent number: 4030765Abstract: This invention is directed to an apparatus having a number of individual storage compartments for a plurality of game pieces. The pieces are used in a number of board games. Some pieces are unique to one game, and some pieces are common to two or more games. Selection of desired game pieces is obtained by placing a template, with discretely positioned holes cut therein, over the storage apparatus, blocking access to all compartments except those containing the desired pieces for the particular game. Those desired pieces can then be removed either manually or by turning the apparatus upside down allowing the pieces to fall out. The template is then left in place until the pieces are again ready for storage, thus facilitating the replacement of the pieces into their proper compartments in the storage apparatus.Type: GrantFiled: February 18, 1976Date of Patent: June 21, 1977Inventor: John William Brown