Abstract: Particles are encapsulated with a layer or sequence of layers. The particles can be flakes and the layers can form an optical interference stack for use as an optically variable pigment, among other purposes. In a particular embodiment a highly reflective metal layer is deposited around a glass flake with specular surfaces. The particles can be produced using a variety of deposition systems. In a particular embodiment, a downstream plasma-enhanced chemical vapor deposition system achieves high deposition rates while avoiding contamination of the plasma source with deposition products.

Abstract: A pretreatment method for use in manufacturing an improved optical component comprises (i) providing a polymeric optical substrate; and (ii) exposing the polymeric optical substrate to electromagnetic energy having a wavelength of about 30 nm to about 350 nm. The exposure of the polymeric optical substrate to the electromagnetic energy substantially improves adhesion between the substrate and an optical coating deposited onto the substrate following pretreatment. The invention addresses the significant need for coated plastic optics by providing a method to achieve reliable adhesion of optical coatings placed on polymeric optical substrates. Specifically, this invention enables improved adhesion for even highly curved or shaped parts which have been historically more difficult to coat. The pretreatment method is particularly useful for molded substrates such as molded polymethylmethacrylate.

Abstract: The present invention is directed to methods and apparatus for depositing optical thin film coatings simultaneously onto both sides of at least one substrate in a dual-frequency plasma-enhanced chemical vapor deposition vacuum reaction chamber utilizing microwave and radio frequency energies. The substrate can be a continuous substrate, such as a flexible polymer web, or it can be one or more discrete substrates, such as rigid plastic, glass, or glass/polymer composite substrates. The substrate can be processed in a stationary or an in-line processing mode. In addition, the coatings deposited simultaneously onto both sides of the substrate can be identical, i.e. symmetrical, or different, i.e., non-symmetrical. The plasma attributes and reaction conditions on either side of the substrate can be independently controlled to provide either identical or different coating compositions and properties on the two sides of the substrate.