Patents by Inventor Jon T. Clinton

Jon T. Clinton has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Assay apparatuses, methods and reagents
    Patent number: 11982871
    Abstract: Apparatuses, systems, method, reagents, and kits for conducting assays as well as process for their preparation are described. They are particularly well suited for conducting automated analysis in a multi-well plate assay format.
    Type: Grant
    Filed: October 1, 2021
    Date of Patent: May 14, 2024
    Assignee: MESO SCALE TECHNOLOGIES, LLC.
    Inventors: Ian Chamberlin, Charles M. Clinton, Eli N. Glezer, Bandele Jeffrey-Coker, Manish Kochar, Sandor Kovacs, D. T. Le, Aaron Leimkuehler, George Sigal, Leo Tabakin, Jon Willoughby
  • Polymer chuck with heater and method of manufacture
    Patent number: 6094334
    Abstract: An electrostatic chuck 20 for holding a substrate 25 in a process chamber 30 comprises an electrostatic member 115 comprising a polymer 120 covering an electrode 125, the polymer 120 having a receiving surface 135 for receiving the substrate 25. A heater 130 abutting the polymer 120 is provided to heat the substrate 25 during processing of the substrate 25. The heater 130 has a resistance that is sufficiently low to heat the substrate 25 without causing excessive thermal degradation of the polymer 120.
    Type: Grant
    Filed: March 2, 1999
    Date of Patent: July 25, 2000
    Assignee: Applied Materials, Inc.
    Inventors: Surinder S. Bedi, Shamouil Shamouilian, Syed H. Askari, Arnold Kholodenko, Jon T. Clinton, Alexander M. Veytser, Liang-Guo Wang, You Wang
  • Puncture resistant electrostatic chuck
    Patent number: 5986875
    Abstract: A puncture resistant electrostatic chuck (20) is described. The chuck (20) comprises at least one electrode (25); and a composite insulator (30) covering the electrode. The composite insulator comprises a matrix material having a conformal holding surface (50) capable of conforming to the substrate (35) under application of an electrostatic force generated by the electrode to reduce leakage of heat transfer fluid held between the substrate and the holding surface. A hard puncture resistant layer, such a layer of fibers or an aromatic polyamide layer, is positioned below the holding surface (50) and is sufficiently hard to increase the puncture resistance of the composite insulator.
    Type: Grant
    Filed: January 29, 1998
    Date of Patent: November 16, 1999
    Assignee: Applied Materials, Inc.
    Inventors: Arik Donde, Hyman J. Levinstein, Robert W. Wu, Andreas Hegedus, Edwin C. Weldon, Shamouil Shamouilian, Jon T. Clinton, Surinder S. Bedi
  • Puncture resistant electrostatic chuck
    Patent number: 5729423
    Abstract: A puncture resistant electrostatic chuck (20) is described. The chuck (20) comprises at least one electrode (25); and a composite insulator (30) covering the electrode. The composite insulator comprises a matrix material having a conformal holding surface (50) capable of conforming to the substrate (35) under application of an electrostatic force generated by the electrode to reduce leakage of heat transfer fluid held between the substrate and the holding surface. A hard puncture resistant layer, such a layer of fibers or an aromatic polyamide layer, is positioned below the holding surface (50) and is sufficiently hard to increase the puncture resistance of the composite insulator.
    Type: Grant
    Filed: November 25, 1996
    Date of Patent: March 17, 1998
    Assignee: Applied Materials, Inc.
    Inventors: Arik Donde, Hyman J. Levinstein, Robert W. Wu, Andreas Hegedus, Edwin C. Weldon, Shamouil Shamouilian, Jon T. Clinton, Surinder S. Bedi