Abstract: According to embodiments of the present invention, there is provided a tube filter production device including a tube filter exterior forming case into which one or more filter tows are introduced and from which a tubular rod formed from the one or more filter tows is discharged, a tube filter forming bar extending in an inner region of the tube filter exterior forming case in order to form a hollow of the tubular rod, and a steam chamber having at least one steam nozzle in communication with the inner region of the tube filter exterior forming case and configured to supply steam to the one or more filter tows through the steam nozzle, wherein the tube filter forming bar has a duct extending in a longitudinal direction of the tube filter forming bar and a flavoring nozzle formed in a downstream end region of the tube filter forming bar to deliver a flavoring liquid or a moisturizing liquid supplied through the duct to the hollow of the tubular rod.

Abstract: Provided are a transmitter and a method for transmitting a data block in a wireless communication system. The method comprises the following steps: deciding the number of bits (s) and encoders (NES) to allocate to one axis of a signal constellation; encoding an information bit based on the s and the NES and generating a coded block; parsing the coded block based on the s and the NES and generating a plurality of frequency sub-blocks; and transmitting the plurality of frequency sub-blocks to a receiver.

Abstract: Copolymers containing N-vinyllactam derivatives protected at 3-position are provided and represented by the following formula. The copolymers are used as a photoresist material suitable for deep uv process so that high sensitivity and resolution can be obtained. In addition, ultrafine circuits can be formed and an exceptional improvement in PED stability can be accomplished by use of the photoresist.

Abstract: Copolymers containing N-vinyllactam derivatives protected at 3-position are provided and represented by the following formula. The copolymers are used as a photoresist material suitable for deep uv process so that high sensitivity and resolution can be obtained. In addition, ultrafine circuits can be formed and an exceptional improvement in PED stability can be accomplished by use of the photoresist.