Abstract: Provided is a positive electrode active material which includes an inner region that is a region from the center of the positive electrode active material particle to R/2, and an outer region that is a region from R/2 to the surface of the positive electrode active material particle, wherein R is a distance from the center of the positive electrode active material particle to the surface thereof. The positive electrode active material further includes 25% to 80% of crystallites C with respect to a total number of crystallites in the outer region. The crystallites C have a high crystallite long-axis orientation degree of 0.5 to 1 and a low crystallite c-axis orientation degree less than 0.5. Thus, the positive electrode active material has high capacity characteristics and a small amount of gas generated.

Abstract: Provided is a positive electrode active material which includes an inner region that is a region from the center of the positive electrode active material particle to R/2; and an outer region that is a region from R/2 to the surface of the positive electrode active material particle, wherein R is a distance from the center of the positive electrode active material particle to the surface thereof. The positive electrode active material further includes 30% to 80% of crystallites A with respect to a total number of crystallites in the outer region of the positive electrode active material, the crystallites A having high crystallite long-axis orientation degree and crystallite c-axis orientation degree. Thus, the positive electrode active material can achieve excellent capacity characteristics and service life characteristics.

Abstract: Provided is an exhaust gas treatment apparatus that treats exhaust gas generated from semiconductor process and directed to a vacuum pump. Exhaust gas treatment apparatus includes a plasma generating unit for generating plasma, a reaction chamber in which perfluoride is decomposed by the plasma to generate a decomposition gas, and gas supplying unit for supplying the decomposition gas from the reaction chamber to a processing chamber in which the exhaust gas from the semiconductor process is introduced and treated exhaust gas is discharged to the vacuum pump. Decomposition gas reacts with the exhaust gas in the processing chamber to suppress generation of salt in solid state by a component of the exhaust gas.

Abstract: The present inventive concept relates to a device for treating an exhaust gas, and more particularly, to a plasma device capable of, even when connected to a vacuum pump, extending a lifetime of an electrode of a plasma torch. In the plasma device according to the present inventive concept, since an orifice is installed in a connection unit for connection with a vacuum pump to prevent a decrease in pressure of the vacuum pump, a pressure of a plasma reaction unit including the plasma torch of the plasma device can be maintained similar to normal pressure, thereby reducing the wear of a tungsten electrode in the plasma torch to extend a lifetime of the electrode.

Abstract: A universal buck for a sled test is provided. The buck includes a support plate, and a plurality of pillars that are mounted on the support plate. Additionally, a roof is mounted on at least some of the plurality of pillars and a wind shield is mounted between pillars disposed on a front side among the plurality of pillars and a front end of the roof. The plurality of pillars, the roof, and the wind shield are mounted to be adjustable in position on the support plate.

Abstract: A universal buck for a sled test includes a support plate rotatably installed to adjust a yawing angle of the support plate, a plurality of pillars mounted on the support plate, a roof mounted on at least some of the plurality of pillars, and a windshield mounted between pillars disposed on a front side among the plurality of pillars and a front end of the roof, wherein the plurality of pillars, the roof, and the windshield are mounted to be adjustable in position on the support plate.

Abstract: A universal buck for a sled test is provided. The buck includes a support plate, and a plurality of pillars that are mounted on the support plate. Additionally, a roof is mounted on at least some of the plurality of pillars and a wind shield is mounted between pillars disposed on a front side among the plurality of pillars and a front end of the roof. The plurality of pillars, the roof, and the wind shield are mounted to be adjustable in position on the support plate.

Abstract: A universal buck for a sled test includes a support plate rotatably installed to adjust a yawing angle of the support plate, a plurality of pillars mounted on the support plate, a roof mounted on at least some of the plurality of pillars, and a windshield mounted between pillars disposed on a front side among the plurality of pillars and a front end of the roof, wherein the plurality of pillars, the roof, and the windshield are mounted to be adjustable in position on the support plate.

Abstract: Disclosed is a nitrogen oxide reduction device using dielectric barrier discharge plasma. The plasma nitrogen oxide reduction device may limitedly emit nitrogen oxide with a form of NO2 at a final outlet of the plasma nitrogen oxide reduction device by arranging a combustion unit, a wet treatment unit, and a plasma oxidizing unit in a housing. The emitted nitrogen oxide is finally treated in a wet scrubber operated as a reducer at a final exhaust end.