Patents by Inventor Jong-Pyo Kim

Jong-Pyo Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240150725
    Abstract: The present disclosure relates to a novel bacteriophage having ability to specifically kill Clostridium perfringens and an antibacterial composition comprising the same. The novel bacteriophage CJ_CP_20-25 has the effect of specifically killing Clostridium perfringens, exhibits excellent acid resistance and heat resistance, and can thus be widely used in antibiotics, feed additives, drinking water additives, feed, drinking water, disinfectants, or cleaning agents for the prevention or treatment of infectious diseases caused by Clostridium perfringens.
    Type: Application
    Filed: June 15, 2021
    Publication date: May 9, 2024
    Applicant: CJ CheilJedang Corporation
    Inventors: Jong Soo JEON, Ji Eun KIM, Jun Ok MOON, Jong Pyo CHAE, Yu Jin KIM, Seung Eun LEE
  • Publication number: 20240141302
    Abstract: The present application relates to a novel bacteriophage having enterotoxigenic Escherichia coli-specific bactericidal effect and an antibacterial composition comprising same, the novel bacteriophage CJ_Eco_20-4 having enterotoxigenic Escherichia coli-specific bactericidal effect, and being superbly acid and heat resistant to allow wide use in antibiotics, feed and additives therefor, beverages and additives therefor, disinfectants, detergents, and the like to prevent or treat infectious diseases caused by enterotoxigenic Escherichia coli.
    Type: Application
    Filed: June 15, 2021
    Publication date: May 2, 2024
    Applicant: CJ CheilJedang Corporation
    Inventors: Jong Soo JEON, Ji Eun KIM, Jun Ok MOON, Jong Pyo CHAE, Yu Jin KIM, Seung Eun LEE, Jin Seung PARK
  • Publication number: 20240147592
    Abstract: The present disclosure relates to a light emitting diode (LED) driving device that may expand a usable range of LED current and battery voltage by reducing heat generation of an integrated circuit, and an LED lighting device including the same, which may include a current controller that constantly controls an LED current flowing through an LED string and an IC heat dissipation part connected to a node between the LED string and the current controller to dissipate IC heat of the current controller, wherein when a battery voltage supplied to the LED string increases, the IC heat dissipation part reduces a first LED current flowing from the LED string to the current controller and simultaneously increases a second LED current flowing from the LED string to the current controller via the IC heat dissipation part, thereby reducing the IC heat generation of the current controller.
    Type: Application
    Filed: November 1, 2023
    Publication date: May 2, 2024
    Applicant: LX SEMICON CO., LTD.
    Inventors: Byung Jun SEO, Ji Hwan KIM, Young Jin WOO, Jong Min LEE, Ju Pyo HONG
  • Publication number: 20240131092
    Abstract: The present application relates to a novel bacteriophage having Clostridium perfringens-specific bactericidal effect and an antibacterial composition comprising same, the novel bacteriophage CJ_CP_20-11-1 having Clostridium perfringens-specific bactericidal effect, and being superbly acid and heat resistant to allow wide use in antibiotics, feed and additives therefor, beverages and additives therefor, disinfectants, detergents, and the like to prevent or treat infectious diseases caused by Clostridium perfringens.
    Type: Application
    Filed: June 14, 2021
    Publication date: April 25, 2024
    Applicant: CJ CheilJedang Corporation
    Inventors: Jong Soo JEON, Ji Eun KIM, Jun Ok MOON, Jong Pyo CHAE, Yu Jin KIM, Seung Eun LEE
  • Publication number: 20230271233
    Abstract: The present invention provides a system for collecting tripper room fugitive dust of a power plant coal transfer facility, wherein the system includes an entrance dust collection module disposed at the entrance of a tripper room to block dust; a tripper car configured to move along a transfer conveyor disposed inside the tripper room and transfer fuel introduced through the entrance to silos; and a main dust collection module configured prevent spread of dust by removing dust in response to movement of the tripper car and adjusting the pressure at the point where dust is generated.
    Type: Application
    Filed: July 28, 2020
    Publication date: August 31, 2023
    Inventors: Heok Soo JEON, Byeong Cheol KWAK, Jong Pyo KIM, Su Young CHOI
  • Publication number: 20210301804
    Abstract: According to an embodiment, a multi-cooling type cold trap according to the present disclosure includes a main body unit in which an inflow space having a material to be condensed flown therein is formed, a circulation unit which is disposed in the inflow space of the main body unit and circulates cooling water for condensing the material to be condensed, and a supply unit which supplies the cooling water to the circulation unit after lowering temperature of the cooling water in stages.
    Type: Application
    Filed: September 28, 2020
    Publication date: September 30, 2021
    Inventors: Jong Pyo Kim, Jong Geon Kim, Kwaungsin Park, Byoung Ho Jeon
  • Patent number: 10274584
    Abstract: The present invention relates to an apparatus and method for generating a bidirectional chirp signal by using a phase accumulation polynomial, and the apparatus for generating a bidirectional chirp signal according to an embodiment may include an extraction unit extracting time interval information from the output of a frequency accumulator, a polynomial handling unit applying the phase accumulation polynomial to the extracted time interval information to generate a polynomial output value, and a bidirectional chirp signal output unit outputting a bidirectional chirp signal on the basis of the generated polynomial output value.
    Type: Grant
    Filed: November 20, 2014
    Date of Patent: April 30, 2019
    Assignee: KOREA AEROSPACE RESEARCH INSTITUTE
    Inventors: Sang Burm Ryu, Jeong Hwan Yang, Jong Pyo Kim, Young Jin Won, Young Jun Cho, Chul Kang, Sang Kon Lee
  • Publication number: 20160370457
    Abstract: The present invention relates to an apparatus and method for generating a bidirectional chirp signal by using a phase accumulation polynomial, and the apparatus for generating a bidirectional chirp signal according to an embodiment may include an extraction unit extracting time interval information from the output of a frequency accumulator, a polynomial handling unit applying the phase accumulation polynomial to the extracted time interval information to generate a polynomial output value, and a bidirectional chirp signal output unit outputting a bidirectional chirp signal on the basis of the generated polynomial output value.
    Type: Application
    Filed: November 20, 2014
    Publication date: December 22, 2016
    Applicant: KOREA AEROSPACE RESEARCH INSTITUTE
    Inventors: Sang Burm Ryu, Jeong Hwan Yang, Jong Pyo Kim, Young Jin Won, Young Jun Cho, Chul Kang, Sang Kon Lee
  • Publication number: 20160325233
    Abstract: Provided are a polyurethane resin composition for a hollow fiber membrane potting agent, and a hollow fiber membrane module, and more particularly, a polyurethane resin composition for a hollow fiber membrane potting agent, which includes a polyurethane resin and a hydrophilic additive to have excellent resistance to internal/external pressure, and also to have excellent sealing performance, antifouling property, etc., and a hollow fiber membrane module including a cured product thereof.
    Type: Application
    Filed: November 10, 2014
    Publication date: November 10, 2016
    Inventors: Su Gyeong BAE, Kwan Soo LEE, Jong Pyo KIM
  • Publication number: 20160185634
    Abstract: The present invention relates to an air diffuser including an air diffusing pipe in which at least two pore groups including two or more pores are formed, and a membrane bioreactor including the same.
    Type: Application
    Filed: August 8, 2014
    Publication date: June 30, 2016
    Inventors: Mi-Hwa BAEK, Hong Jin JANG, Jong Pyo KIM, Jin Won LEE, Gyung-Bo KANG, Sung Ryul PARK
  • Patent number: 8303704
    Abstract: A siloxane based coating composition having excellent dyeability, abrasion resistance, glossiness and transparency, a preparation method thereof, and an optical lens coated by the coating composition are suggested. The siloxane based coating composition includes organo silane compound, inorganic oxide (H-index filler), solvent and a dyeing improving material. The dyeing improving material adopts nitric acid, hydrochloric acid, phosphoric acid, sodium nitrate, potassium nitrate, silver nitrate, or the like. The siloxane based coating composition shows excellent dyeability owing to the dyeing improving material, excellent abrasion resistance owing to the organo silane compound, and excellent glossiness and transparency, so it may be applied as a coating film on a surface of a plastic lens such as optical lens, industrial safety lens and leisure-purpose goggle that require high transparency.
    Type: Grant
    Filed: November 15, 2007
    Date of Patent: November 6, 2012
    Assignee: LG Chem, Ltd.
    Inventors: Sang-Hyuk Im, Do-Hyun Jin, Jong-Pyo Kim, Young-Jun Hong, Seung-Heon Lee
  • Patent number: 8115262
    Abstract: A dielectric multilayer structure of a microelectronic device, in which a leakage current characteristic and a dielectric constant are improved, is provided in an embodiment. The dielectric multilayer structure includes a lower dielectric layer, which is made of amorphous silicate (M1-xSixOy) or amorphous silicate nitride (M1-xSixOyNz), and an upper dielectric layer which is formed on top of the lower dielectric layer and which is made of amorphous metal oxide (M?Oy) or amorphous metal oxynitride (M?OyNz).
    Type: Grant
    Filed: July 6, 2009
    Date of Patent: February 14, 2012
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jong-Pyo Kim, Jong-Ho Lee, Hyung-Suk Jung, Jung-Hyoung Lee
  • Patent number: 7928482
    Abstract: A gate structure includes a gate insulation layer pattern, a gate electrode, a first spacer and a protecting layer pattern. The gate insulation layer pattern is on a substrate. The gate electrode is on the gate insulation layer pattern, the gate electrode including a lower portion having a first width, a central portion having a second width smaller than the first width and an upper portion having a third width. The first spacer is on a lower sidewall of the gate electrode. The protecting layer pattern is on a central sidewall of the gate electrode.
    Type: Grant
    Filed: April 2, 2009
    Date of Patent: April 19, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Min-Chul Sun, Jong-Pyo Kim
  • Patent number: 7745292
    Abstract: A method of making a semiconductor device is disclosed. A mask if formed over a first and a second region of a semiconductor body, and a vertical diffusion barrier is formed in a region between the first and second regions. A mask is then formed over the second region and the first region is left unmasked. The semiconductor body is exposed to a dopant, so that the first region is doped and the second region is blocked from the dopant by the mask and by the vertical diffusion barrier.
    Type: Grant
    Filed: October 15, 2007
    Date of Patent: June 29, 2010
    Assignees: Infineon Technologies AG, Samsung Electronics Co., Ltd.
    Inventors: Jingyu Lian, Jong Pyo Kim
  • Publication number: 20100064939
    Abstract: A siloxane based coating composition having excellent dyeability, abrasion resistance, glossiness and transparency, a preparation method thereof, and an optical lens coated by the coating composition are suggested. The siloxane based coating composition includes organo silane compound, inorganic oxide (H-index filler), solvent and a dyeing improving material. The dyeing improving material adopts nitric acid, hydrochloric acid, phosphoric acid, sodium nitrate, potassium nitrate, silver nitrate, or the like. The siloxane based coating composition shows excellent dyeability owing to the dyeing improving material, excellent abrasion resistance owing to the organo silane compound, and excellent glossiness and transparency, so it may be applied as a coating film on a surface of a plastic lens such as optical lens, industrial safety lens and leisure-purpose goggle that require high transparency.
    Type: Application
    Filed: November 15, 2007
    Publication date: March 18, 2010
    Applicant: LG CHEM, LTD.
    Inventors: Sang-Hyuk Im, Do-Hyun Jin, Jong-Pyo Kim, Young-Jun Hong, Seung-Heon Lee
  • Patent number: 7651729
    Abstract: There are provided methods of fabricating a metal silicate layer on a semiconductor substrate using an atomic layer deposition technique. The methods include performing a metal silicate layer formation cycle at least one time in order to form a metal silicate layer having a desired thickness. The metal silicate layer formation cycle includes an operation of repeatedly performing a metal oxide layer formation cycle K times and an operation of repeatedly performing a silicon oxide layer formation cycle Q times. K and Q are integers ranging from 1 to 10 respectively. The metal oxide layer formation cycle includes the steps of supplying a metal source gas to a reactor containing the substrate, exhausting the metal source gas remaining in a reactor to clean the inside of the reactor, and then supplying an oxide gas into the reactor.
    Type: Grant
    Filed: May 12, 2005
    Date of Patent: January 26, 2010
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Yun-Seok Kim, Jong-Pyo Kim, Ha-Jin Lim, Jae-Eun Park, Hyung-Suk Jung, Jong-Ho Lee, Jong-Ho Yang
  • Publication number: 20090267129
    Abstract: A dielectric multilayer structure of a microelectronic device, in which a leakage current characteristic and a dielectric constant are improved, is provided in an embodiment. The dielectric multilayer structure includes a lower dielectric layer, which is made of amorphous silicate (M1-xSixOy) or amorphous silicate nitride (M1-xSixOyNz), and an upper dielectric layer which is formed on top of the lower dielectric layer and which is made of amorphous metal oxide (M'Oy) or amorphous metal oxynitride (M'OyNz).
    Type: Application
    Filed: July 6, 2009
    Publication date: October 29, 2009
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Jong-Pyo KIM, Jong-Ho LEE, Hyung-Suk JUNG, Jung-Hyoung LEE
  • Publication number: 20090250774
    Abstract: A gate structure includes a gate insulation layer pattern, a gate electrode, a first spacer and a protecting layer pattern. The gate insulation layer pattern is on a substrate. The gate electrode is on the gate insulation layer pattern, the gate electrode including a lower portion having a first width, a central portion having a second width smaller than the first width and an upper portion having a third width. The first spacer is on a lower sidewall of the gate electrode. The protecting layer pattern is on a central sidewall of the gate electrode.
    Type: Application
    Filed: April 2, 2009
    Publication date: October 8, 2009
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Sun Min-Chul, Jong-Pyo Kim
  • Patent number: 7588989
    Abstract: A dielectric multilayer structure of a microelectronic device, in which a leakage current characteristic and a dielectric constant are improved, is provided in an embodiment. The dielectric multilayer structure includes a lower dielectric layer, which is made of amorphous silicate (M1-xSixOy) or amorphous silicate nitride (M1-xSixOyNz), and an upper dielectric layer which is formed on top of the lower dielectric layer and which is made of amorphous metal oxide (M?Oy) or amorphous metal oxynitride (M?OyNz).
    Type: Grant
    Filed: September 13, 2005
    Date of Patent: September 15, 2009
    Assignee: Samsung Electronic Co., Ltd.
    Inventors: Jong-Pyo Kim, Jong-Ho Lee, Hyung-Suk Jung, Jung-Hyoung Lee
  • Publication number: 20090098692
    Abstract: A method of making a semiconductor device is disclosed. A mask if formed over a first and a second region of a semiconductor body, and a vertical diffusion barrier is formed in a region between the first and second regions. A mask is then formed over the second region and the first region is left unmasked. The semiconductor body is exposed to a dopant, so that the first region is doped and the second region is blocked from the dopant by the mask and by the vertical diffusion barrier.
    Type: Application
    Filed: October 15, 2007
    Publication date: April 16, 2009
    Inventors: Jingyu Lian, Jong Pyo Kim