Patents by Inventor Joost Jeroen
Joost Jeroen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11789369Abstract: An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.Type: GrantFiled: December 23, 2021Date of Patent: October 17, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Martinus Hendrikus Antonius Leenders, Nicolaas Rudolf Kemper, Joost Jeroen Ottens
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Publication number: 20230274906Abstract: An improved system and method for inspection of a sample using a particle beam inspection apparatus, and more particularly, to systems and methods of scanning a sample with a plurality of charged particle beams. An improved method of scanning an area of a sample using N charged particle beams, wherein N is an integer greater than or equal to two, and wherein the area of the sample comprises a plurality of scan sections of N consecutive scan lines, includes moving the sample in a first direction. The method also includes scanning, with a first charged particle beam of the N charged particle beams, first scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the first charged particle beam. The method further includes scanning, with a second charged particle beam of the N charged particle beams, second scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the second charged particle beam.Type: ApplicationFiled: September 1, 2022Publication date: August 31, 2023Applicant: ASML Netherlands B.V.Inventors: Martinus Gerardus, Maria, Johannes MAASSEN, Joost Jeroen OTTENS, Long MA, Youfei JIANG, Weihua YIN, Wei-Te LI, Xuedong LIU
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Publication number: 20230273533Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.Type: ApplicationFiled: April 13, 2023Publication date: August 31, 2023Applicant: ASML NETHERLANDS B.V.Inventors: NICOLAAS TEN KATE, Joost Jeroen Ottens, Bastiaan Andreas Wilhelmus Hubertus Knarren, Robbert Jan Voogd, Giovanni Francisco Nino, Marinus Jan Remie, Johannes Henricus Wilhelmus Jacobs, Thibault Simon Mathieu Laurent, Johan Gertrudis Cornelis Kunnen
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Patent number: 11669021Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.Type: GrantFiled: March 11, 2022Date of Patent: June 6, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Koen Jacobus Johannes Maria Zaal, Joost Jeroen Ottens
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Publication number: 20230127070Abstract: Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.Type: ApplicationFiled: December 22, 2022Publication date: April 27, 2023Applicant: ASML Netherlands B.V.Inventors: Nicolaas Rudolf KEMPER, Sjoerd Nicolaas Lambertus DONDERS, Joost Jeroen OTTENS, Edwin Cornelis KADIJK, Sergei SHULEPOV
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Patent number: 11630399Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.Type: GrantFiled: March 18, 2022Date of Patent: April 18, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Nicolaas Ten Kate, Joost Jeroen Ottens, Bastiaan Andreas Wilhelmus Hubertus Knarren, Robbert Jan Voogd, Giovanni Francisco Nino, Marinus Jan Remie, Johannes Henricus Wilhelmus Jacobs, Thibault Simon Mathieu Laurent, Johan Gertrudis Cornelis Kunnen
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Patent number: 11537038Abstract: Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.Type: GrantFiled: December 11, 2020Date of Patent: December 27, 2022Assignee: ASML NETHERLANDS B.V.Inventors: Nicolaas Rudolf Kemper, Sjoerd Nicolaas Lambertus Donders, Joost Jeroen Ottens, Edwin Cornelis Kadijk, Sergei Shulepov
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Patent number: 11469076Abstract: An improved system and method for inspection of a sample using a particle beam inspection apparatus, and more particularly, to systems and methods of scanning a sample with a plurality of charged particle beams. An improved method of scanning an area of a sample using N charged particle beams, wherein Nis an integer greater than or equal to two, and wherein the area of the sample comprises a plurality of scan sections of N consecutive scan lines, includes moving the sample in a first direction. The method also includes scanning, with a first charged particle beam of the N charged particle beams, first scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the first charged particle beam. The method further includes scanning, with a second charged particle beam of the N charged particle beams, second scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the second charged particle beam.Type: GrantFiled: June 7, 2019Date of Patent: October 11, 2022Assignee: ASML Netherlands B.V.Inventors: Martinus Gerardus Maria Johannes Massen, Joost Jeroen Ottens, Long Ma, Youfei Jiang, Weihua Yin, Wei-Te Li, Xuedong Liu
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Patent number: 11385553Abstract: A method of measuring overlay uses a plurality of asymmetry measurements from locations (LOI) on a pair of sub-targets (1032, 1034) formed on a substrate (W). For each sub-target, the plurality of asymmetry measurements are fitted to at least one expected relationship (1502, 1504) between asymmetry and overlay, based on a known bias variation deigned into the sub-targets. Continuous bias variation in one example is provided by varying the pitch of top and bottom gratings (P1/P2). Bias variations between the sub-targets of the pair are equal and opposite (P2/P1). Overlay (OV) is calculated based on a relative shift (xs) between the fitted relationships for the two sub-targets. The step of fitting asymmetry measurements to at least one expected relationship includes wholly or partially discounting measurements (1506, 1508, 1510) that deviate from the expected relationship and/or fall outside a particular segment of the fitted relationship.Type: GrantFiled: May 3, 2021Date of Patent: July 12, 2022Assignee: ASML Netherlands B.V.Inventors: Zili Zhou, Nitesh Pandey, Olger Victor Zwier, Patrick Warnaar, Maurits Van Der Schaar, Elliott Gerard McNamara, Arie Jeffrey Den Boef, Paul Christiaan Hinnen, Murat Bozkurt, Joost Jeroen Ottens, Kaustuve Bhattacharyya, Michael Kubis
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Patent number: 11378893Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.Type: GrantFiled: November 13, 2020Date of Patent: July 5, 2022Assignee: ASML NETHERLANDS B.V.Inventors: Theodorus Petrus Maria Cadee, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Erik Roelof Loopstra, Aschwin Lodewijk Hendricus Johannes Van Meer, Jeroen Johannes Sophia Maria Mertens, Christianus Gerardus Maria De Mol, Marcel Johannus Elisabeth Hubertus Muitjens, Antonius Johannus Van Der Net, Joost Jeroen Ottens, Johannes Anna Quaedackers, Maria Elisabeth Reuhman-Huisken, Marco Koert Stavenga, Patricius Aloysius Jacobus Tinnemans, Martinus Cornelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Frederik Eduard De Jong, Koen Goorman, Boris Menchtchikov, Herman Boom, Stoyan Nihtianov, Richard Moerman, Martin Frans Pierre Smeets, Bart Leonard Peter Schoondermark, Franciscus Johannes Joseph Janssen, Michel Riepen
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Publication number: 20220206400Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.Type: ApplicationFiled: March 18, 2022Publication date: June 30, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Nicolaas TEN KATE, Joost Jeroen OTTENS, Bastiaan Andreas Wilhelmus Hubertus KNARREN, Robbert Jan VOOGD, Giovanni Francisco NINO, Marinus Jan REMIE, Johannes Henricus Wilhelmus JACOBS, Thibault Simon Mathieu LAURENT, Johan Gertrudis Cornelis KUNNEN
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Publication number: 20220197154Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.Type: ApplicationFiled: March 11, 2022Publication date: June 23, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Koen Jacobus Johannes Maria ZAAL, Joost Jeroen OTTENS
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Publication number: 20220113641Abstract: An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.Type: ApplicationFiled: December 23, 2021Publication date: April 14, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Martinus Hendrikus Antonius Leenders, Nicolaas Rudolf Kemper, Joost Jeroen Ottens
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Patent number: 11281115Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.Type: GrantFiled: January 6, 2020Date of Patent: March 22, 2022Assignee: ASML NETHERLANDS B.V.Inventors: Nicolaas Ten Kate, Joost Jeroen Ottens, Bastiaan Andreas Wilhelmus Hubertus Knarren, Robbert Jan Voogd, Giovanni Francisco Nino, Marinus Jan Remie, Johannes Henricus Wilhelmus Jacobs, Thibault Simon Mathieu Laurent, Johan Gertrudis Cornelis Kunnen
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Patent number: 11275316Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.Type: GrantFiled: August 27, 2020Date of Patent: March 15, 2022Assignee: ASML NETHERLANDS B.V.Inventors: Koen Jacobus Johannes Maria Zaal, Joost Jeroen Ottens
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Patent number: 11209738Abstract: An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.Type: GrantFiled: September 4, 2020Date of Patent: December 28, 2021Assignee: ASML NETHERLANDS B.V.Inventors: Martinus Hendrikus Antonius Leenders, Nicolaas Rudolf Kemper, Joost Jeroen Ottens
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Publication number: 20210255553Abstract: A method of measuring overlay uses a plurality of asymmetry measurements from locations (LOI) on a pair of sub-targets (1032, 1034) formed on a substrate (W). For each sub-target, the plurality of asymmetry measurements are fitted to at least one expected relationship (1502, 1504) between asymmetry and overlay, based on a known bias variation deigned into the sub-targets. Continuous bias variation in one example is provided by varying the pitch of top and bottom gratings (P1/P2). Bias variations between the sub-targets of the pair are equal and opposite (P2/P1). Overlay (OV) is calculated based on a relative shifht (xs) between the fitted relationships for the two sub-targets. The step of fitting asymmetry measurements to at least one expected relationship includes wholly or partially discounting measurements (1506, 1508, 1510) that deviate from the expected relationship and/or fall outside a particular segment of the fitted relationship.Type: ApplicationFiled: May 3, 2021Publication date: August 19, 2021Applicant: ASML Netherlands B.V.Inventors: Zili ZHOU, Nitesh PANDEY, Olger Victor ZWIER, Patrick WARNAAR, Maurits VAN DER SCHAAR, Elliott Gerard MC NAMARA, Arie Jeffrey DEN BOEF, Paul Christiaan HINNEN, Murat BOZKURT, Joost Jeroen OTTENS, Kaustuve BHATTACHARYYA, Michael KUBIS
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Publication number: 20210217582Abstract: An improved system and method for inspection of a sample using a particle beam inspection apparatus, and more particularly, to systems and methods of scanning a sample with a plurality of charged particle beams. An improved method of scanning an area of a sample using N charged particle beams, wherein Nis an integer greater than or equal to two, and wherein the area of the sample comprises a plurality of scan sections of N consecutive scan lines, includes moving the sample in a first direction. The method also includes scanning, with a first charged particle beam of the N charged particle beams, first scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the first charged particle beam. The method further includes scanning, with a second charged particle beam of the N charged particle beams, second scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the second charged particle beam.Type: ApplicationFiled: June 7, 2019Publication date: July 15, 2021Inventors: Martinus Gerardus, Maria, Johannes MAASSEN, Joost Jeroen OTTENS, Long MA, Youfei JIANG, Weihua YIN, Wei-Te LI, Xuedong LIU
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Publication number: 20210173294Abstract: Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.Type: ApplicationFiled: December 11, 2020Publication date: June 10, 2021Applicant: ASML Netherlands B.V.Inventors: Nicolaas Rudolf KEMPER, Sjoerd Nicolaas Lambertus DONDERS, Joost Jeroen OTTENS, Edwin Cornelis KADIJK, Sergei SHULEPOV
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Patent number: 10996570Abstract: A method of measuring overlay uses a plurality of asymmetry measurements from locations (LOI) on a pair of sub-targets (1032, 1034) formed on a substrate (W). For each sub-target, the plurality of asymmetry measurements are fitted to at least one expected relationship (1502, 1504) between asymmetry and overlay, based on a known bias variation deigned into the sub-targets. Continuous bias variation in one example is provided by varying the pitch of top and bottom gratings (P1/P2). Bias variations between the sub-targets of the pair are equal and opposite (P2/P1). Overlay (OV) is calculated based on a relative shift (xs) between the fitted relationships for the two sub-targets. The step of fitting asymmetry measurements to at least one expected relationship includes wholly or partially discounting measurements (1506, 1508, 1510) that deviate from the expected relationship and/or fall outside a particular segment of the fitted relationship.Type: GrantFiled: October 7, 2019Date of Patent: May 4, 2021Assignee: ASML Netherlands B.V.Inventors: Zili Zhou, Nitesh Pandey, Olger Victor Zwier, Patrick Warnaar, Maurits Van Der Schaar, Elliott Gerard McNamara, Arie Jeffrey Den Boef, Paul Christiaan Hinnen, Murat Bozkurt, Joost Jeroen Ottens, Kaustuve Bhattacharyya, Michael Kubis