Abstract: Aspects of various embodiments are directed to sensor apparatuses and methods thereof. An example sensor apparatus includes a capacitor and sensor circuitry. The capacitor includes a first substrate having a first electrode, a second substrate having a second electrode, and a dielectric layer. The dielectric layer has a plurality of apertures arranged in a pattern, the first and second electrode being separated by the dielectric layer and arranged with an overlapping area with respect to one another. The sensor circuitry is coupled to the capacitor and configured and arranged to detect normal and shear forces applied to the sensor apparatus based on changes in capacitance derived from changes in at least one of a distance between the first and second electrodes and the overlapping area of the first and second electrodes.

Abstract: Aspects of various embodiments are directed to sensor apparatuses and methods thereof. An example sensor apparatus includes a capacitor and sensor circuitry. The capacitor includes a first substrate having a first electrode, a second substrate having a second electrode, and a dielectric layer. The dielectric layer has a plurality of dielectric structures arranged in a pattern, the first and second electrode being separated by the dielectric layer and arranged with an overlapping area with respect to one another. The sensor circuitry is coupled to the capacitor and configured and arranged to detect normal and shear forces applied to the sensor apparatus based on changes in capacitance derived from changes in at least one of a distance between first and second electrodes and the overlapping area of the first and second electrodes.

Abstract: Certain examples are directed to an apparatus having a stretchable synthetic membrane material and series of patterned conductive or semiconductive sections. The stretchable synthetic membrane material may be provided with the series of patterned sections being integrated in or against the material (e.g., on similarly-configured robotic digits operating as a pair). One or more of these sections are electrically coupled to sensor circuitry which may also be secured to or embedded in the material. As the apparatus moves relative to an external object, various environmental parameters may be sensed via at least one sensor as the object and the digit(s) approach one another. Depending on how the sensor circuitry is configured, such parameters may include one or more of proximity, capacitance, temperature, impedance, contact with the object, and movement of the robotic member relative to the external object.

Abstract: Aspects of various embodiments are directed to sensor apparatuses and methods thereof. An example sensor apparatus includes a capacitor and sensor circuitry. The capacitor includes a first substrate having a first electrode, a second substrate having a second electrode, and a dielectric layer. The dielectric layer has a plurality of apertures arranged in a pattern, the first and second electrode being separated by the dielectric layer and arranged with an overlapping area with respect to one another. The sensor circuitry is coupled to the capacitor and configured and arranged to detect normal and shear forces applied to the sensor apparatus based on changes in capacitance derived from changes in at least one of a distance between the first and second electrodes and the overlapping area of the first and second electrodes.

Abstract: Aspects of various embodiments are directed to sensor apparatuses and methods thereof. An example sensor apparatus includes a capacitor and sensor circuitry. The capacitor includes a first substrate having a first electrode, a second substrate having a second electrode, and a dielectric layer. The dielectric layer has a plurality of dielectric structures arranged in a pattern, the first and second electrode being separated by the dielectric layer and arranged with an overlapping area with respect to one another. The sensor circuitry is coupled to the capacitor and configured and arranged to detect normal and shear forces applied to the sensor apparatus based on changes in capacitance derived from changes in at least one of a distance between first and second electrodes and the overlapping area of the first and second electrodes.