Patents by Inventor Jordan Jur

Jordan Jur has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Extreme ultraviolet light source
    Patent number: 10064261
    Abstract: An initial pulse of radiation is generated; a section of the initial pulse of radiation is extracted to form a modified pulse of radiation, the modified pulse of radiation including a first portion and a second portion, the first portion being temporally connected to the second portion, and the first portion having a maximum energy that is less than a maximum energy of the second portion; the first portion of the modified pulse of radiation is interacted with a target material to form a modified target; and the second portion of the modified pulse of radiation is interacted with the modified target to generate plasma that emits extreme ultraviolet (EUV) light.
    Type: Grant
    Filed: October 23, 2017
    Date of Patent: August 28, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Yezheng Tao, John Tom Stewart, IV, Jordan Jur, Daniel Brown, Alexander A. Schafgans, Jason M. Arcand, Andrew LaForge
  • EXTREME ULTRAVIOLET LIGHT SOURCE
    Publication number: 20180124906
    Abstract: An initial pulse of radiation is generated; a section of the initial pulse of radiation is extracted to form a modified pulse of radiation, the modified pulse of radiation including a first portion and a second portion, the first portion being temporally connected to the second portion, and the first portion having a maximum energy that is less than a maximum energy of the second portion; the first portion of the modified pulse of radiation is interacted with a target material to form a modified target; and the second portion of the modified pulse of radiation is interacted with the modified target to generate plasma that emits extreme ultraviolet (EUV) light.
    Type: Application
    Filed: October 23, 2017
    Publication date: May 3, 2018
    Inventors: Yezheng Tao, John Tom Stewart, IV, Jordan Jur, Daniel Brown
  • Extreme ultraviolet light source utilizing a target of finite extent
    Patent number: 9826616
    Abstract: An initial pulse of radiation is generated; a section of the initial pulse of radiation is extracted to form a modified pulse of radiation, the modified pulse of radiation including a first portion and a second portion, the first portion being temporally connected to the second portion, and the first portion having a maximum energy that is less than a maximum energy of the second portion; the first portion of the modified pulse of radiation is interacted with a target material to form a modified target; and the second portion of the modified pulse of radiation is interacted with the modified target to generate plasma that emits extreme ultraviolet (EUV) light.
    Type: Grant
    Filed: May 6, 2016
    Date of Patent: November 21, 2017
    Assignee: ASML Netherlands B.V.
    Inventors: Yezheng Tao, John Tom Stewart, IV, Jordan Jur, Daniel Brown
  • EXTREME ULTRAVIOLET LIGHT SOURCE
    Publication number: 20160255708
    Abstract: An initial pulse of radiation is generated; a section of the initial pulse of radiation is extracted to form a modified pulse of radiation, the modified pulse of radiation including a first portion and a second portion, the first portion being temporally connected to the second portion, and the first portion having a maximum energy that is less than a maximum energy of the second portion; the first portion of the modified pulse of radiation is interacted with a target material to form a modified target; and the second portion of the modified pulse of radiation is interacted with the modified target to generate plasma that emits extreme ultraviolet (EUV) light.
    Type: Application
    Filed: May 6, 2016
    Publication date: September 1, 2016
    Inventors: Yezheng Tao, John Tom Stewart, IV, Jordan Jur, Daniel Brown
  • Extreme ultraviolet light source
    Patent number: 9357625
    Abstract: An initial pulse of radiation is generated; a section of the initial pulse of radiation is extracted to form a modified pulse of radiation, the modified pulse of radiation including a first portion and a second portion, the first portion being temporally connected to the second portion, and the first portion having a maximum energy that is less than a maximum energy of the second portion; the first portion of the modified pulse of radiation is interacted with a target material to form a modified target; and the second portion of the modified pulse of radiation is interacted with the modified target to generate plasma that emits extreme ultraviolet (EUV) light.
    Type: Grant
    Filed: July 7, 2014
    Date of Patent: May 31, 2016
    Assignee: ASML Netherlands B.V.
    Inventors: Yezheng Tao, John Tom Stewart, IV, Jordan Jur, Andrew LaForge, Daniel Brown, Jason M. Arcand, Alexander A. Schafgans, Michael A. Purvis
  • EXTREME ULTRAVIOLET LIGHT SOURCE
    Publication number: 20160007434
    Abstract: An initial pulse of radiation is generated; a section of the initial pulse of radiation is extracted to form a modified pulse of radiation, the modified pulse of radiation including a first portion and a second portion, the first portion being temporally connected to the second portion, and the first portion having a maximum energy that is less than a maximum energy of the second portion; the first portion of the modified pulse of radiation is interacted with a target material to form a modified target; and the second portion of the modified pulse of radiation is interacted with the modified target to generate plasma that emits extreme ultraviolet (EUV) light.
    Type: Application
    Filed: July 7, 2014
    Publication date: January 7, 2016
    Inventors: Yezheng Tao, John Tom Stewart, IV, Jordan Jur, Andrew LaForge, Daniel Brown, Jason M. Arcand, Alexander A. Schafgans, Michael A. Purvis