Patents by Inventor Jose Juan De Jesus Toriz-Garcia

Jose Juan De Jesus Toriz-Garcia has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Exposure apparatus and methods
    Patent number: 9046874
    Abstract: A light beam collimated by illumination optics (4) from a radiation source (6) illuminates the surface of a wave front modulator (8) such as an Spatial Light Modulator (SLM) or Computer Generated Hologram photomask (CGH). The resulting wave travels via projection optics (10) to the substrate (12), passing through a projection lens assembly (14). The SLM (8) is programmed or CGH configured with a modulation pattern that is determined by the substrate (12) topography and desired pattern. The substrate topography is provided by Digital Holography (DH) surface profilometery performed by a DH microscope (18), which provides geometrical or topographical input to the CGH calculation routines (16). An arrangement for vertical or sloping surface patterning has a grating (22) superimposed onto the CGH pattern (24) to generate +1 and ?1 orders.
    Type: Grant
    Filed: July 30, 2009
    Date of Patent: June 2, 2015
    Assignees: University of Durham, University of Sheffield
    Inventors: Peter Anthony Ivey, Richard Peter McWilliam, Alan Purvis, Gavin Lewis Williams, Nicholas Luke Seed, Richard Ian Curry, Jose Juan De Jesus Toriz-Garcia
  • HOLOGRAPHY
    Publication number: 20130120813
    Abstract: An iterative algorithm for hologram design with multiple output image planes arranged in close proximity to create continuous patterns within an imaging volume is disclosed. These may then be used for photolithography on 3D surfaces, or for generation of holograms for use in consumer devices.
    Type: Application
    Filed: March 15, 2011
    Publication date: May 16, 2013
    Inventors: Joshua James Cowling, Richard McWilliam, Alan Purvis, Florian Bryce Soulard, Peter Ivey, Nicholas Luke Seed, Gavin Lewis Williams, Jose Juan De Jesus Toriz-Garcia
  • EXPOSURE APPARATUS AND METHODS
    Publication number: 20110292363
    Abstract: A light beam collimated by illumination optics (4) from a radiation source (6) illuminates the surface of a wave front modulator (8) such as an Spatial Light Modulator (SLM) or Computer Generated Hologram photomask (CGH). The resulting wave travels via projection optics (10) to the substrate (12), passing through a projection lens assembly (14). The SLM (8) is programmed or CGH configured with a modulation pattern that is determined by the substrate (12) topography and desired pattern. The substrate topography is provided by Digital Holography (DH) surface profilometery performed by a DH microscope (18), which provides geometrical or topographical input to the CGH calculation routines (16). An arrangement for vertical or sloping surface patterning has a grating (22) superimposed onto the CGH pattern (24) to generate +1 and ?1 orders.
    Type: Application
    Filed: July 30, 2009
    Publication date: December 1, 2011
    Inventors: Peter Anthony Ivey, Richard Peter McWilliam, Alan Purvis, Gavin Lewis Williams, Nicholas Luke Seed, Richard Ian Curry, Jose Juan De Jesus Toriz-Garcia