Abstract: Applicants have discovered an apparatus and method effective for use in rendering an optical fiber resistant to losses caused by high-radiation environments such as in outerspace. The apparatus comprises an optical fiber, a housing surrounding the optical fiber defining an enclosed space between the exterior surface of the fiber and the housing, and a concentration of deuterium or hydrogen gases disposed within the enclosed space.

Abstract: A method of making an x-ray mask intended to expose photoresist upon a layer which is to be etched to a nominal dimension, whereby effects such as global divergence, local divergence, and dose non-uniformity are compensated by adjusting the feature dimension in the mask. The compensation is achieved by varying the dose provided by an electron beam which is used to define the feature upon the x-ray mask or by adding or subtracting pixels during writing of the pattern with an electron beam. The dose is varied by changing the electron beam current or the rate at which the electron beam scans the field. The features are typically those encountered in the processing of a semiconductor wafer wherein the smallest dimension is 250 nm or less.

Abstract: An x-ray lithography system is disclosed in which x-rays are generated by directing a high energy laser beam against a metal target to form an x-ray emitting plasma. The x-rays from the plasma are then directed through a mask towards a resist covered wafer to cause a patterned exposure on the wafer resist coating. The mask, the portion of the target which the laser beam strikes and the portion of the wafer to be exposed are all within an evacuated chamber. The laser, prior to entering the chamber, is split into two separate beams, each of which are focused and directed through a window in the side of the chamber towards the same spot on the target. Apparatus, including an air bearing, seal and positioner, is provided to move the target at periodic intervals. Similar apparatus is provided to move the wafer from exposure section to exposure section.