Patents by Inventor Joseph A. Van Gompel
Joseph A. Van Gompel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20230100659Abstract: One or more embodiments described herein relate to abatement systems for reducing Br2 and Cl2 in semiconductor processes. In embodiments described herein, semiconductor etch processes are performed within process chambers. Thereafter, fluorinated greenhouse gases (F-GHGs), HBr, and Cl2 gases exit the process chamber and enter a plasma reactor. Reagent gases are delivered from a reagent gas delivery apparatus to the plasma reactor to mix with the process gases. Radio frequency (RF) power is applied to the plasma reactor, which adds energy and “excites” the gases within the process chamber. When HBr is energized, it forms Br2. Br2 and Cl2 are corrosive and toxic. However, the addition of H2O in the plasma reactor quenches the Br2 and Cl2 emissions, as the H atoms recombine with the Br atoms and the Cl atoms to form HBr and HCl. HBr and HCl are readily water-soluble and removed through a wet scrubber.Type: ApplicationFiled: December 7, 2022Publication date: March 30, 2023Inventors: Joseph Van GOMPEL, James L'HEUREUX
-
Patent number: 11551917Abstract: One or more embodiments described herein relate to abatement systems for reducing Br2 and Cl2 in semiconductor processes. In embodiments described herein, semiconductor etch processes are performed within process chambers. Thereafter, fluorinated greenhouse gases (F-GHGs), HBr, and Cl2 gases exit the process chamber and enter a plasma reactor. Reagent gases are delivered from a reagent gas delivery apparatus to the plasma reactor to mix with the process gases. Radio frequency (RF) power is applied to the plasma reactor, which adds energy and “excites” the gases within the process chamber. When HBr is energized, it forms Br2. Br2 and Cl2 are corrosive and toxic. However, the addition of H2O in the plasma reactor quenches the Br2 and Cl2 emissions, as the H atoms recombine with the Br atoms and the Cl atoms to form HBr and HCl. HBr and HCl are readily water-soluble and removed through a wet scrubber.Type: GrantFiled: February 18, 2020Date of Patent: January 10, 2023Assignee: Applied Materials, Inc.Inventors: Joseph A. Van Gompel, James L'Heureux
-
Publication number: 20220341821Abstract: The present disclosure relates to systems and methods for detecting anomalies in a semiconductor processing system. According to certain embodiments, one or more external sensors are mounted to a sub-fab component, communicating with the processing system via a communication channel different than a communication channel utilized by the sub-fab component and providing extrinsic sensor data that the sub-fab component is not configured to provide. The extrinsic sensor data may be combined with sensor data from a processing tool of the system and/or intrinsic sensor data of the sub-fab component to form virtual sensor data. In the event the virtual data exceeds or falls below a threshold, an intervention or a maintenance signal is dispatched, and in certain embodiments, an intervention or maintenance action is taken by the system.Type: ApplicationFiled: April 26, 2021Publication date: October 27, 2022Inventors: Ryan T. DOWNEY, Hemant P. MUNGEKAR, James L'HEUREUX, Andreas NEUBER, Michael W. JOHNSON, Joseph A. VAN GOMPEL, Gino Gerardo CRISPIERI, Tony H. TONG, Maxime CAYER, John L. KOENIG, Mike M. HUANG
-
Publication number: 20220332575Abstract: A method and apparatus for generation of fluorine gas (F2) in situ at the point of use is provided. The portable fluorine generator includes a dilution system disposed within a housing and operable to mix a feed gas comprising fluorine with an inert gas. The portable fluorine generator further includes a plasma reactor unit disposed within the housing and operable to separate fluorine (F2) from the feed gas comprising fluorine.Type: ApplicationFiled: April 14, 2021Publication date: October 20, 2022Inventor: Joseph A. VAN GOMPEL
-
Publication number: 20200273682Abstract: One or more embodiments described herein relate to abatement systems for reducing Br2 and Cl2 in semiconductor processes. In embodiments described herein, semiconductor etch processes are performed within process chambers. Thereafter, fluorinated greenhouse gases (F-GHGs), HBr, and Cl2 gases exit the process chamber and enter a plasma reactor. Reagent gases are delivered from a reagent gas delivery apparatus to the plasma reactor to mix with the process gases. Radio frequency (RF) power is applied to the plasma reactor, which adds energy and “excites” the gases within the process chamber. When HBr is energized, it forms Br2. Br2 and Cl2 are corrosive and toxic. However, the addition of H2O in the plasma reactor quenches the Br2 and Cl2 emissions, as the H atoms recombine with the Br atoms and the Cl atoms to form HBr and HCl. HBr and HCl are readily water-soluble and removed through a wet scrubber.Type: ApplicationFiled: February 18, 2020Publication date: August 27, 2020Inventors: Joseph A. VAN GOMPEL, James L'HEUREUX
-
Publication number: 20180221816Abstract: Embodiments of the present disclosure generally relate techniques for abating N2O gas present in the effluent of semiconductor manufacturing processes. In one embodiment, a method includes injecting hydrogen gas or ammonia gas into a plasma source, and an effluent containing N2O gas and the hydrogen or ammonia gas are energized and reacted to form an abated material. By using the hydrogen gas or the ammonia gas, the destruction and removal efficiency (DRE) of the N2O gas is at least 50 percent while the concentration of nitric oxide (NO) and/or nitrogen dioxide (NO2) in the abated material is substantially reduced, such as at most 5000 parts per million (ppm) by volume.Type: ApplicationFiled: February 2, 2018Publication date: August 9, 2018Inventors: Joseph A. VAN GOMPEL, Dustin W. HO, Zheng YUAN, James L'HEUREUX, Ryan T. DOWNEY
-
Patent number: 7838025Abstract: Disclosed are methods and products such as wet wipes and absorbents capable of providing a skin health benefit when utilized in the intended fashion. More specifically, the products described herein comprise an agent, such as a botanical extract, which is capable of increasing the activity of sphingomyelinase according to a Sphingomyelinase Activity Screening Test and/or decreasing the activity of ceramidase according to a Ceramidase Activity Screening Test. By increasing the activity of sphingomyelinase and/or decreasing the activity of ceramidase, the agents in combination with the products described herein are able to maintain or increase the level of ceramides in the skin leading to improved skin health.Type: GrantFiled: October 21, 2008Date of Patent: November 23, 2010Assignee: Kimberly-Clark Worldwide, Inc.Inventors: David W. Koenig, Jamie Joseph Van Gompel
-
Patent number: 7585518Abstract: Disclosed are methods and products such as wet wipes and absorbents capable of providing a skin health benefit when utilized in the intended fashion. More specifically, the products described herein comprise an agent, such as a botanical extract, which is capable of increasing the activity of sphingomyelinase according to a Sphingomyelinase Activity Screening Test and/or decreasing the activity of ceramidase according to a Ceramidase Activity Screening Test. By increasing the activity of sphingomyelinase and/or decreasing the activity of ceramidase, the agents in combination with the products described herein are able to maintain or increase the level of ceramides in the skin leading to improved skin health.Type: GrantFiled: November 19, 2002Date of Patent: September 8, 2009Assignee: Kimberly-Clark Worldwide, Inc.Inventors: David W. Koenig, Jamie Joseph Van Gompel
-
Publication number: 20090053286Abstract: Disclosed are methods and products such as wet wipes and absorbents capable of providing a skin health benefit when utilized in the intended fashion. More specifically, the products described herein comprise an agent, such as a botanical extract, which is capable of increasing the activity of sphingomyelinase according to a Sphingomyelinase Activity Screening Test and/or decreasing the activity of ceramidase according to a Ceramidase Activity Screening Test. By increasing the activity of sphingomyelinase and/or decreasing the activity of ceramidase, the agents in combination with the products described herein are able to maintain or increase the level of ceramides in the skin leading to improved skin health.Type: ApplicationFiled: October 21, 2008Publication date: February 26, 2009Applicant: KIMBERLY-CLARK WORLDWIDE, INC.Inventors: David W. Koenig, Jamie Joseph Van Gompel
-
Publication number: 20040096485Abstract: Disclosed are methods and products such as wet wipes and absorbents capable of providing a skin health benefit when utilized in the intended fashion. More specifically, the products described herein comprise an agent, such as a botanical extract, which is capable of increasing the activity of sphingomyelinase according to a Sphingomyelinase Activity Screening Test and/or decreasing the activity of ceramidase according to a Ceramidase Activity Screening Test. By increasing the activity of sphingomyelinase and/or decreasing the activity of ceramidase, the agents in combination with the products described herein are able to maintain or increase the level of ceramides in the skin leading to improved skin health.Type: ApplicationFiled: November 19, 2002Publication date: May 20, 2004Applicant: Kimberly-Clark Worldwide, Inc.Inventors: David W. Koenig, Jamie Joseph Van Gompel
-
Patent number: 6193843Abstract: Cationic polysaccharide derivatives are prepared by reacting a polysaccharide with a polycationic reagent having one polysaccharide reactive group and at least two cationic groups. Suitable reagents include polycationic alkyl, aryl, alkaryl, cycloaliphatic, or heterocyclic amines, some of which are novel compositions. The polycationic polysaccharide derivatives prepared from these reagents are useful in the manufacture of paper.Type: GrantFiled: June 1, 1994Date of Patent: February 27, 2001Assignee: National Starch and Chemical Investment Holding CorporationInventors: John (Ji-Hsiung) Tsai, Peter T. Trzasko, Michael T. Philbin, Robert L. Billmers, Martin M. Tessler, Joseph A. Van Gompel, Morton W. Rutenberg
-
Patent number: 5227481Abstract: Cationic polysaccharide derivatives are prepared by reacting a polysaccharide with a polycationic reagent having one polysaccharide reactive group and at least two cationic groups. Suitable reagents include polycationic alkyl, aryl, alkaryl, cycloaliphatic, or heterocyclic amines, some of which are novel compositions. The polycationic polysaccharide derivatives prepared from these reagents are useful in the manufacture of paper.Type: GrantFiled: April 9, 1991Date of Patent: July 13, 1993Assignee: National Starch and Chemical Investment Holding CorporationInventors: John J. Tsai, Peter T. Trzasko, Michael T. Philbin, Robert L. Billmers, Martin M. Tessler, Joseph A. Van Gompel, Morton W. Rutenberg