Patents by Inventor Joseph A. Van Gompel

Joseph A. Van Gompel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230100659
    Abstract: One or more embodiments described herein relate to abatement systems for reducing Br2 and Cl2 in semiconductor processes. In embodiments described herein, semiconductor etch processes are performed within process chambers. Thereafter, fluorinated greenhouse gases (F-GHGs), HBr, and Cl2 gases exit the process chamber and enter a plasma reactor. Reagent gases are delivered from a reagent gas delivery apparatus to the plasma reactor to mix with the process gases. Radio frequency (RF) power is applied to the plasma reactor, which adds energy and “excites” the gases within the process chamber. When HBr is energized, it forms Br2. Br2 and Cl2 are corrosive and toxic. However, the addition of H2O in the plasma reactor quenches the Br2 and Cl2 emissions, as the H atoms recombine with the Br atoms and the Cl atoms to form HBr and HCl. HBr and HCl are readily water-soluble and removed through a wet scrubber.
    Type: Application
    Filed: December 7, 2022
    Publication date: March 30, 2023
    Inventors: Joseph Van GOMPEL, James L'HEUREUX
  • Patent number: 11551917
    Abstract: One or more embodiments described herein relate to abatement systems for reducing Br2 and Cl2 in semiconductor processes. In embodiments described herein, semiconductor etch processes are performed within process chambers. Thereafter, fluorinated greenhouse gases (F-GHGs), HBr, and Cl2 gases exit the process chamber and enter a plasma reactor. Reagent gases are delivered from a reagent gas delivery apparatus to the plasma reactor to mix with the process gases. Radio frequency (RF) power is applied to the plasma reactor, which adds energy and “excites” the gases within the process chamber. When HBr is energized, it forms Br2. Br2 and Cl2 are corrosive and toxic. However, the addition of H2O in the plasma reactor quenches the Br2 and Cl2 emissions, as the H atoms recombine with the Br atoms and the Cl atoms to form HBr and HCl. HBr and HCl are readily water-soluble and removed through a wet scrubber.
    Type: Grant
    Filed: February 18, 2020
    Date of Patent: January 10, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Joseph A. Van Gompel, James L'Heureux
  • Publication number: 20220341821
    Abstract: The present disclosure relates to systems and methods for detecting anomalies in a semiconductor processing system. According to certain embodiments, one or more external sensors are mounted to a sub-fab component, communicating with the processing system via a communication channel different than a communication channel utilized by the sub-fab component and providing extrinsic sensor data that the sub-fab component is not configured to provide. The extrinsic sensor data may be combined with sensor data from a processing tool of the system and/or intrinsic sensor data of the sub-fab component to form virtual sensor data. In the event the virtual data exceeds or falls below a threshold, an intervention or a maintenance signal is dispatched, and in certain embodiments, an intervention or maintenance action is taken by the system.
    Type: Application
    Filed: April 26, 2021
    Publication date: October 27, 2022
    Inventors: Ryan T. DOWNEY, Hemant P. MUNGEKAR, James L'HEUREUX, Andreas NEUBER, Michael W. JOHNSON, Joseph A. VAN GOMPEL, Gino Gerardo CRISPIERI, Tony H. TONG, Maxime CAYER, John L. KOENIG, Mike M. HUANG
  • Publication number: 20220332575
    Abstract: A method and apparatus for generation of fluorine gas (F2) in situ at the point of use is provided. The portable fluorine generator includes a dilution system disposed within a housing and operable to mix a feed gas comprising fluorine with an inert gas. The portable fluorine generator further includes a plasma reactor unit disposed within the housing and operable to separate fluorine (F2) from the feed gas comprising fluorine.
    Type: Application
    Filed: April 14, 2021
    Publication date: October 20, 2022
    Inventor: Joseph A. VAN GOMPEL
  • Publication number: 20200273682
    Abstract: One or more embodiments described herein relate to abatement systems for reducing Br2 and Cl2 in semiconductor processes. In embodiments described herein, semiconductor etch processes are performed within process chambers. Thereafter, fluorinated greenhouse gases (F-GHGs), HBr, and Cl2 gases exit the process chamber and enter a plasma reactor. Reagent gases are delivered from a reagent gas delivery apparatus to the plasma reactor to mix with the process gases. Radio frequency (RF) power is applied to the plasma reactor, which adds energy and “excites” the gases within the process chamber. When HBr is energized, it forms Br2. Br2 and Cl2 are corrosive and toxic. However, the addition of H2O in the plasma reactor quenches the Br2 and Cl2 emissions, as the H atoms recombine with the Br atoms and the Cl atoms to form HBr and HCl. HBr and HCl are readily water-soluble and removed through a wet scrubber.
    Type: Application
    Filed: February 18, 2020
    Publication date: August 27, 2020
    Inventors: Joseph A. VAN GOMPEL, James L'HEUREUX
  • Publication number: 20180221816
    Abstract: Embodiments of the present disclosure generally relate techniques for abating N2O gas present in the effluent of semiconductor manufacturing processes. In one embodiment, a method includes injecting hydrogen gas or ammonia gas into a plasma source, and an effluent containing N2O gas and the hydrogen or ammonia gas are energized and reacted to form an abated material. By using the hydrogen gas or the ammonia gas, the destruction and removal efficiency (DRE) of the N2O gas is at least 50 percent while the concentration of nitric oxide (NO) and/or nitrogen dioxide (NO2) in the abated material is substantially reduced, such as at most 5000 parts per million (ppm) by volume.
    Type: Application
    Filed: February 2, 2018
    Publication date: August 9, 2018
    Inventors: Joseph A. VAN GOMPEL, Dustin W. HO, Zheng YUAN, James L'HEUREUX, Ryan T. DOWNEY
  • Patent number: 7838025
    Abstract: Disclosed are methods and products such as wet wipes and absorbents capable of providing a skin health benefit when utilized in the intended fashion. More specifically, the products described herein comprise an agent, such as a botanical extract, which is capable of increasing the activity of sphingomyelinase according to a Sphingomyelinase Activity Screening Test and/or decreasing the activity of ceramidase according to a Ceramidase Activity Screening Test. By increasing the activity of sphingomyelinase and/or decreasing the activity of ceramidase, the agents in combination with the products described herein are able to maintain or increase the level of ceramides in the skin leading to improved skin health.
    Type: Grant
    Filed: October 21, 2008
    Date of Patent: November 23, 2010
    Assignee: Kimberly-Clark Worldwide, Inc.
    Inventors: David W. Koenig, Jamie Joseph Van Gompel
  • Patent number: 7585518
    Abstract: Disclosed are methods and products such as wet wipes and absorbents capable of providing a skin health benefit when utilized in the intended fashion. More specifically, the products described herein comprise an agent, such as a botanical extract, which is capable of increasing the activity of sphingomyelinase according to a Sphingomyelinase Activity Screening Test and/or decreasing the activity of ceramidase according to a Ceramidase Activity Screening Test. By increasing the activity of sphingomyelinase and/or decreasing the activity of ceramidase, the agents in combination with the products described herein are able to maintain or increase the level of ceramides in the skin leading to improved skin health.
    Type: Grant
    Filed: November 19, 2002
    Date of Patent: September 8, 2009
    Assignee: Kimberly-Clark Worldwide, Inc.
    Inventors: David W. Koenig, Jamie Joseph Van Gompel
  • Publication number: 20090053286
    Abstract: Disclosed are methods and products such as wet wipes and absorbents capable of providing a skin health benefit when utilized in the intended fashion. More specifically, the products described herein comprise an agent, such as a botanical extract, which is capable of increasing the activity of sphingomyelinase according to a Sphingomyelinase Activity Screening Test and/or decreasing the activity of ceramidase according to a Ceramidase Activity Screening Test. By increasing the activity of sphingomyelinase and/or decreasing the activity of ceramidase, the agents in combination with the products described herein are able to maintain or increase the level of ceramides in the skin leading to improved skin health.
    Type: Application
    Filed: October 21, 2008
    Publication date: February 26, 2009
    Applicant: KIMBERLY-CLARK WORLDWIDE, INC.
    Inventors: David W. Koenig, Jamie Joseph Van Gompel
  • Publication number: 20040096485
    Abstract: Disclosed are methods and products such as wet wipes and absorbents capable of providing a skin health benefit when utilized in the intended fashion. More specifically, the products described herein comprise an agent, such as a botanical extract, which is capable of increasing the activity of sphingomyelinase according to a Sphingomyelinase Activity Screening Test and/or decreasing the activity of ceramidase according to a Ceramidase Activity Screening Test. By increasing the activity of sphingomyelinase and/or decreasing the activity of ceramidase, the agents in combination with the products described herein are able to maintain or increase the level of ceramides in the skin leading to improved skin health.
    Type: Application
    Filed: November 19, 2002
    Publication date: May 20, 2004
    Applicant: Kimberly-Clark Worldwide, Inc.
    Inventors: David W. Koenig, Jamie Joseph Van Gompel
  • Patent number: 6193843
    Abstract: Cationic polysaccharide derivatives are prepared by reacting a polysaccharide with a polycationic reagent having one polysaccharide reactive group and at least two cationic groups. Suitable reagents include polycationic alkyl, aryl, alkaryl, cycloaliphatic, or heterocyclic amines, some of which are novel compositions. The polycationic polysaccharide derivatives prepared from these reagents are useful in the manufacture of paper.
    Type: Grant
    Filed: June 1, 1994
    Date of Patent: February 27, 2001
    Assignee: National Starch and Chemical Investment Holding Corporation
    Inventors: John (Ji-Hsiung) Tsai, Peter T. Trzasko, Michael T. Philbin, Robert L. Billmers, Martin M. Tessler, Joseph A. Van Gompel, Morton W. Rutenberg
  • Patent number: 5227481
    Abstract: Cationic polysaccharide derivatives are prepared by reacting a polysaccharide with a polycationic reagent having one polysaccharide reactive group and at least two cationic groups. Suitable reagents include polycationic alkyl, aryl, alkaryl, cycloaliphatic, or heterocyclic amines, some of which are novel compositions. The polycationic polysaccharide derivatives prepared from these reagents are useful in the manufacture of paper.
    Type: Grant
    Filed: April 9, 1991
    Date of Patent: July 13, 1993
    Assignee: National Starch and Chemical Investment Holding Corporation
    Inventors: John J. Tsai, Peter T. Trzasko, Michael T. Philbin, Robert L. Billmers, Martin M. Tessler, Joseph A. Van Gompel, Morton W. Rutenberg