Patents by Inventor Joseph Arthur Kraus
Joseph Arthur Kraus has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240087924Abstract: The present invention provides a multi-chamber plasma processing system. A load lock chamber having an atmospheric gate valve and a vacuum gate valve is operatively connected to a transport chamber through the vacuum gate valve. A process chamber is mounted on the load lock chamber wherein the process chamber has only one gate valve that is positioned between the transport chamber and the process chamber. The process chamber does not have an atmospheric gate valve. A substrate handling robot is mounted within the transport chamber and operatively communicates with the load lock chamber through the vacuum gate valve and operatively communicates with the process chamber through the only gate valve of the process chamber.Type: ApplicationFiled: April 21, 2023Publication date: March 14, 2024Applicant: HINE AUTOMATION, LLCInventor: Joseph Arthur Kraus
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Patent number: 8676375Abstract: An automated cassette-to-cassette substrate handling system includes a cassette storage module for storing a plurality of substrates in cassettes before and after processing. A substrate carrier storage module stores a plurality of substrate carriers. A substrate carrier loading/unloading module loads substrates from the cassette storage module onto the plurality of substrate carriers and unloads substrates from the plurality of substrate carriers to the cassette storage module. A transport mechanism transports the plurality of substrates between the cassette storage module and the plurality of substrate carriers and transports the plurality of substrate carriers between the substrate carrier loading/unloading module and a processing chamber. A vision system recognizes recesses in the plurality of substrate carriers corresponding to empty substrate positions in the substrate carrier.Type: GrantFiled: February 27, 2012Date of Patent: March 18, 2014Assignee: Veeco Instruments Inc.Inventors: Joseph Arthur Kraus, Jeremy James Boyer, Joseph Mack, Michael DeChellis, Michael Koo
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Patent number: 8562746Abstract: A structure for a chemical vapor deposition reactor includes a support element defining oppositely-facing substantially planar upper and lower surfaces and a vertical rotational axis substantially perpendicular to the upper and lower surfaces, and a plurality of carrier sections releasably engaged with the support element. Each carrier section can include oppositely-facing substantially planar top and bottom surfaces and at least one aperture extending between the top and bottom surfaces. The carrier sections can be disposed on the support element with the bottom surfaces of the carrier sections facing toward the upper surface of the support element, so that wafers can be held in the apertures of the carrier sections with one surface of each wafer confronting the support element and an opposite surface exposed at the top surface of the carrier sections.Type: GrantFiled: December 15, 2010Date of Patent: October 22, 2013Assignee: Veeco Instruments Inc.Inventors: Alexander I. Gurary, Joseph Arthur Kraus, Ajit Paranjpe, William E. Quinn, David Albert Crewe
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Publication number: 20130226335Abstract: An automated cassette-to-cassette substrate handling system includes a cassette storage module for storing a plurality of substrates in cassettes before and after processing. A substrate carrier storage module stores a plurality of substrate carriers. A substrate carrier loading/unloading module loads substrates from the cassette storage module onto the plurality of substrate carriers and unloads substrates from the plurality of substrate carriers to the cassette storage module. A transport mechanism transports the plurality of substrates between the cassette storage module and the plurality of substrate carriers and transports the plurality of substrate carriers between the substrate carrier loading/unloading module and a processing chamber. A vision system recognizes recesses in the plurality of substrate carriers corresponding to empty substrate positions in the substrate carrier.Type: ApplicationFiled: February 27, 2012Publication date: August 29, 2013Applicant: VEECO INSTRUMENTS INC.Inventors: Joseph Arthur Kraus, Jeremy James Boyer, Michael DeChellis, Michael Koo
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Publication number: 20120156374Abstract: A structure for a chemical vapor deposition reactor includes a support element defining oppositely-facing substantially planar upper and lower surfaces and a vertical rotational axis substantially perpendicular to the upper and lower surfaces, and a plurality of carrier sections releasably engaged with the support element. Each carrier section can include oppositely-facing substantially planar top and bottom surfaces and at least one aperture extending between the top and bottom surfaces. The carrier sections can be disposed on the support element with the bottom surfaces of the carrier sections facing toward the upper surface of the support element, so that wafers can be held in the apertures of the carrier sections with one surface of each wafer confronting the support element and an opposite surface exposed at the top surface of the carrier sections.Type: ApplicationFiled: December 15, 2010Publication date: June 21, 2012Applicant: Veeco Instruments Inc.Inventors: Alexander I. Gurary, Joseph Arthur Kraus, Ajit Paranjpe, William E. Quinn, David Albert Crewe
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Patent number: 6841200Abstract: A method and apparatus for transferring a substrate between a first environment having a first pressure and a second environment having a vacuum pressure is provided. In one embodiment, the apparatus comprises a chamber body having a first port disposed in a first wall and a second port disposed in a second wall that seals the chamber from the first and second environments. A cooling plate, a first substrate holder and a second substrate holder are disposed within the chamber body. The cooling plate is disposed at the bottom of the chamber body. The first port and the second port are sequentially opened and the pressure within the load lock regulated to allow substrate to pass through the load lock. A window is disposed in the top of the chamber body that allows a metrology device to view the chamber volume.Type: GrantFiled: March 17, 2003Date of Patent: January 11, 2005Assignee: Applied Materials, Inc.Inventors: Joseph Arthur Kraus, James David Strassner
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Patent number: 6776567Abstract: In a first aspect, a valve/sensor assembly is provided that includes a door assembly. The door assembly has (1) a first position adapted to seal an opening of a chamber; (2) a second position adapted to allow at least a blade of a substrate handler to extend through the opening of the chamber; and (3) a mounting mechanism adapted to couple the door assembly to the chamber. The valve/sensor assembly also includes a sensor system having a transmitter and a receiver adapted to detect a presence of a substrate and to communicate through at least a portion of the door assembly. Systems, methods and computer program products are provided in accordance with this and other aspects.Type: GrantFiled: April 1, 2003Date of Patent: August 17, 2004Assignee: Applied Materials, Inc.Inventors: Brian Johnson, Edward Ng, Justin Mauck, Edward R. Dykes, Joseph Arthur Kraus
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Publication number: 20030202865Abstract: A wafer handler having a central body with a first end and a central axis of rotation is provided. A first end effector, adapted to support a first wafer, is rotatably coupled to the first end of the central body so as to define a first axis of rotation between the central body and the first end effector. Optionally, a second end effector adapted to support a second wafer is rotatably coupled to the second end of the central body so as to define a second axis of rotation between the central body and the second end effector. When the central body is rotated about the central axis of rotation in a first direction over a first angular distance, the first end effector simultaneously rotates about the first axis of rotation and the optional second end effector rotates about the second axis of rotation. Both end effectors are rotated over a second angular distance that is greater than the first angular distance. One or more of the end effectors may be pocketless.Type: ApplicationFiled: April 25, 2002Publication date: October 30, 2003Applicant: Applied Materials, Inc.Inventors: Hari Ponnekanti, Vinay K. Shah, Michael Robert Rice, Victor Belitsky, Damon Cox, Robert B. Lowrance, Joseph Arthur Kraus, Jeffrey C. Hudgens
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Publication number: 20030167612Abstract: A method and apparatus for transferring a substrate between a first environment having a first pressure and a second environment having a vacuum pressure is provided. In one embodiment, the apparatus comprises a chamber body having a first port disposed in a first wall and a second port disposed in a second wall that seals the chamber from the first and second environments. A cooling plate, a first substrate holder and a second substrate holder are disposed within the chamber body. The cooling plate is disposed at the bottom of the chamber body. The first port and the second port are sequentially opened and the pressure within the load lock regulated to allow substrate to pass through the load lock. A window is disposed in the top of the chamber body that allows a metrology device to view the chamber volume.Type: ApplicationFiled: March 17, 2003Publication date: September 11, 2003Applicant: APPLIED MATERIALS, INC.Inventors: Joseph Arthur Kraus, James David Strassner
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Publication number: 20030167102Abstract: In a first aspect, a valve/sensor assembly is provided that includes a door assembly. The door assembly has (1) a first position adapted to seal an opening of a chamber; (2) a second position adapted to allow at least a blade of a substrate handler to extend through the opening of the chamber; and (3) a mounting mechanism adapted to couple the door assembly to the chamber. The valve/sensor assembly also includes a sensor system having a transmitter and a receiver adapted to detect a presence of a substrate and to communicate through at least a portion of the door assembly. Systems, methods and computer program products are provided in accordance with this and other aspects.Type: ApplicationFiled: April 1, 2003Publication date: September 4, 2003Applicant: Applied Materials, Inc.Inventors: Brian Johnson, Edward Ng, Justin Mauck, Edward R. Dykes, Joseph Arthur Kraus
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Patent number: 6558509Abstract: A method and apparatus for transferring a substrate between a first environment having a first pressure and a second environment having a vacuum pressure is provided. In one embodiment, the apparatus comprises a chamber body having a first port disposed in a first wall and a second port disposed in a second wall that seals the chamber from the first and second environments. A cooling plate, a first substrate holder and a second substrate holder are disposed within the chamber body. The cooling plate is disposed at the bottom of the chamber body. The first port and the second port area sequentially opened and the pressure within the load lock regulated to allow substrate to pass through the load lock. A window is disposed in the top of the chamber body that allows a metrology device to view the chamber volume.Type: GrantFiled: July 16, 2001Date of Patent: May 6, 2003Assignee: Applied Materials, Inc.Inventors: Joseph Arthur Kraus, James David Strassner
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Patent number: 6553280Abstract: In a first aspect, a valve/sensor assembly is provided that includes a door assembly. The door assembly has (1) a first position adapted to seal an opening of a chamber; (2) a second position adapted to allow at least a blade of a substrate handler to extend through the opening of the chamber; and (3) a mounting mechanism adapted to couple the door assembly to the chamber. The valve/sensor assembly also includes a sensor system having a transmitter and a receiver adapted to detect a presence of a substrate and to communicate through at least a portion of the door assembly. Systems, methods and computer program products are provided in accordance with this and other aspects.Type: GrantFiled: June 30, 2001Date of Patent: April 22, 2003Assignee: Applied Materials, Inc.Inventors: Brian Johnson, Edward Ng, Justin Mauck, Edward R. Dykes, Joseph Arthur Kraus
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Publication number: 20020081177Abstract: In a first aspect, a valve/sensor assembly is provided that includes a door assembly. The door assembly has (1) a first position adapted to seal an opening of a chamber; (2) a second position adapted to allow at least a blade of a substrate handler to extend through the opening of the chamber; and (3) a mounting mechanism adapted to couple the door assembly to the chamber. The valve/sensor assembly also includes a sensor system having a transmitter and a receiver adapted to detect a presence of a substrate and to communicate through at least a portion of the door assembly. Systems, methods and computer program products are provided in accordance with this and other aspects.Type: ApplicationFiled: June 30, 2001Publication date: June 27, 2002Inventors: Brian Johnson, Edward Ng, Justin Mauck, Edward R. Dykes, Joseph Arthur Kraus
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Publication number: 20020005168Abstract: A method and apparatus for transferring a substrate between a first environment having a first pressure and a second environment having a vacuum pressure is provided. In one embodiment, the apparatus comprises a chamber body having a first port disposed in a first wall and a second port disposed in a second wall that seals the chamber from the first and second environments. A cooling plate, a first substrate holder and a second substrate holder are disposed within the chamber body. The cooling plate is disposed at the bottom of the chamber body. The first port and the second port are sequentially opened and the pressure within the load lock regulated to allow substrate to pass through the load lock. A window is disposed in the top of the chamber body that allows a metrology device to view the chamber volume.Type: ApplicationFiled: July 16, 2001Publication date: January 17, 2002Applicant: Applied Materials, Inc.Inventors: Joseph Arthur Kraus, James David Strassner