Patents by Inventor Joseph Daniel Gillespie
Joseph Daniel Gillespie has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9036326Abstract: An electrostatic clamp is provided having a clamping plate, wherein the clamping plate has a central region and an annulus region. A plurality of gas supply orifices are defined in the central region of the clamping plate, wherein the plurality of gas supply orifices are in fluid communication with a pressurized gas supply, and wherein the pressurized gas supply is configured to provide a cushion of gas between the clamping surface and the workpiece in the central region of the clamping plate via the plurality of gas supply orifices. One or more gas return orifices defined in one or more of the central region and annulus region of the clamping plate, wherein the one or more gas return orifices are in fluid communication with a vacuum source, therein generally defining an exhaust path for the cushion of gas.Type: GrantFiled: April 30, 2008Date of Patent: May 19, 2015Assignee: Axcelis Technologies, Inc.Inventors: William David Lee, Marvin Raymond LaFontaine, Ashwin Madhukar Purohit, Joseph Daniel Gillespie, Donovan Beckel, Teng Chao Tao, Alexander Henry Slocum, Samir Nayfeh
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Patent number: 8426829Abstract: An ion implanter has an implant wheel with a plurality of wafer carriers distributed about a periphery of the wheel. Each wafer carrier has a heat sink for removing heat from a wafer on the carrier during the implant process by thermal contact between the wafer and the heat sink. The wafer carriers have wafer retaining fences formed as cylindrical rollers with axes in the respective wafer support planes of the wafer carriers. The cylindrical surfaces of the rollers provide wafer abutment surfaces which can move transversely to the wafer support surfaces so that no transverse loading is applied by the fences to wafer edges as the wafer is pushed against the heat sink by centrifugal force. The wafer support surfaces comprise layers of elastomeric material and the movable abutment surfaces of the fences allow even thermal coupling with the heat sink over the whole area of the wafer.Type: GrantFiled: September 30, 2010Date of Patent: April 23, 2013Assignee: GTAT CorporationInventors: William H Leavitt, Theodore H Smick, Joseph Daniel Gillespie, William H Park, Paul Eide, Drew Arnold, Geoffrey Ryding
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Patent number: 8324599Abstract: An ion implanter has an implant wheel with a plurality of wafer carriers distributed about a periphery of the wheel. Each wafer carrier has a heat sink for removing heat from a wafer on the carrier during the implant process by thermal contact between the wafer and the heat sink. A respective wafer lift structure on each carrier is moveable between first and second positions, with the wafer supported spaced away from the heat sink and in thermal contact with the heat sink respectively. The lift structure is operated to move between the first and second positions wheel the implant is rotating. This allows control of wafer temperature during the implant process by adjusting the thermal contact between wafers and heat sinks.Type: GrantFiled: September 29, 2009Date of Patent: December 4, 2012Assignee: Twin Creeks Technologies, Inc.Inventors: Theodore H. Smick, Joseph Daniel Gillespie
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Patent number: 7982197Abstract: A hydrogen ion implanter for the exfoliation of silicon from silicon wafers uses a large scan wheel carrying 50+ wafers around its periphery and rotating about an axis. In one embodiment, the axis of rotation of the wheel is fixed and the wheel is formed with tensioned spokes supporting a rim carrying the wafer supports. The spokes may be used for carrying cooling fluid to and from the wafer supports. Detachable connections in the cooling fluid conduits in the vacuum chamber may comprise tandem seals with an intermediate chamber between them which can be vented outside the vacuum chamber, or independently vacuum pumped. In one embodiment, a ribbon beam of hydrogen ions is directed down on a peripheral edge of the wheel. The ribbon beam extends over the full radial width of wafers on the wheel.Type: GrantFiled: June 30, 2009Date of Patent: July 19, 2011Assignee: Twin Creeks Technologies, Inc.Inventors: Theodore H. Smick, Geoffrey Ryding, Kenneth Harry Purser, Joseph Daniel Gillespie
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Publication number: 20110073781Abstract: An ion implanter has an implant wheel with a plurality of wafer carriers distributed about a periphery of the wheel. Each wafer carrier has a heat sink for removing heat from a wafer on the carrier during the implant process by thermal contact between the wafer and the heat sink. The wafer carriers have wafer retaining fences formed as cylindrical rollers with axes in the respective wafer support planes of the wafer carriers. The cylindrical surfaces of the rollers provide wafer abutment surfaces which can move transversely to the wafer support surfaces so that no transverse loading is applied by the fences to wafer edges as the wafer is pushed against the heat sink by centrifugal force. The wafer support surfaces comprise layers of elastomeric material and the movable abutment surfaces of the fences allow even thermal coupling with the heat sink over the whole area of the wafer.Type: ApplicationFiled: September 30, 2010Publication date: March 31, 2011Applicant: TWIN CREEKS TECHNOLOGIES, INC.Inventors: William H. Leavitt, Theodore H. Smick, Joseph Daniel Gillespie, William H. Park, Paul Eide, Drew Arnold, Geoffrey Ryding
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Publication number: 20110073779Abstract: An ion implanter has an implant wheel with a plurality of wafer carriers distributed about a periphery of the wheel. Each wafer carrier has a heat sink for removing heat from a wafer on the carrier during the implant process by thermal contact between the wafer and the heat sink. A respective wafer lift structure on each carrier is moveable between first and second positions, with the wafer supported spaced away from the heat sink and in thermal contact with the heat sink respectively. The lift structure is operated to move between the first and second positions wheel the implant is rotating. This allows control of wafer temperature during the implant process by adjusting the thermal contact between wafers and heat sinks.Type: ApplicationFiled: September 29, 2009Publication date: March 31, 2011Applicant: TWIN CREEKS TECHNOLOGIES, INC.Inventors: Theodore H. Smick, Joseph Daniel Gillespie
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Publication number: 20100327189Abstract: A hydrogen ion implanter for the exfoliation of silicon from silicon wafers uses a large scan wheel carrying 50+ wafers around its periphery and rotating about an axis. In one embodiment, the axis of rotation of the wheel is fixed and the wheel is formed with tensioned spokes supporting a rim carrying the wafer supports. The spokes may be used for carrying cooling fluid to and from the wafer supports. Detachable connections in the cooling fluid conduits in the vacuum chamber may comprise tandem seals with an intermediate chamber between them which can be vented outside the vacuum chamber, or independently vacuum pumped. In one embodiment, a ribbon beam of hydrogen ions is directed down on a peripheral edge of the wheel. The ribbon beam extends over the full radial width of wafers on the wheel.Type: ApplicationFiled: June 30, 2009Publication date: December 30, 2010Applicant: TWIN CREEKS TECHNOLOGIES, INC.Inventors: Geoffrey Ryding, Theodore H. Smick, Kenneth Harry Purser, Joseph Daniel Gillespie
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Publication number: 20090273878Abstract: An electrostatic clamp is provided having a clamping plate, wherein the clamping plate has a central region and an annulus region. A plurality of gas supply orifices are defined in the central region of the clamping plate, wherein the plurality of gas supply orifices are in fluid communication with a pressurized gas supply, and wherein the pressurized gas supply is configured to provide a cushion of gas between the clamping surface and the workpiece in the central region of the clamping plate via the plurality of gas supply orifices. One or more gas return orifices defined in one or more of the central region and annulus region of the clamping plate, wherein the one or more gas return orifices are in fluid communication with a vacuum source, therein generally defining an exhaust path for the cushion of gas.Type: ApplicationFiled: April 30, 2008Publication date: November 5, 2009Applicant: Axcelis Technologies, Inc.Inventors: William David Lee, Marvin Raymond LaFontaine, Ashwin Madhukar Purohit, Joseph Daniel Gillespie, Donovan Beckel, Teng Chao Tao, Alexander Henry Slocum, Samir Nayfeh