Patents by Inventor JOSEPH L. HESS

JOSEPH L. HESS has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20170256501
    Abstract: A method of determining a lateral misregistration between levels of a semiconductor structure comprises imaging at least one first alignment mark in a first level of the structure and at least one second alignment mark in a second level of the structure. A digital image of the first and second alignment marks is formed, each of which are defined by a set of points having an x-value and a y-value. The x-values and y-values of points defining the first alignment mark and points defining the second alignment mark are averaged to determine a center of the first alignment mark and a center of the second alignment mark. An x-coordinate and a y-coordinate of the center of the first alignment mark is subtracted from the respective x-coordinate and y-coordinate of the center of the second alignment mark to determine a lateral misregistration between the first level and the second level.
    Type: Application
    Filed: March 7, 2016
    Publication date: September 7, 2017
    Inventors: Yang Chao, Joseph L. Hess, Keith E. Ypma, Kurt J. Bossart
  • Patent number: 9754895
    Abstract: A method of determining a lateral misregistration between levels of a semiconductor structure comprises imaging at least one first alignment mark in a first level of the structure and at least one second alignment mark in a second level of the structure. A digital image of the first and second alignment marks is formed, each of which are defined by a set of points having an x-value and a y-value. The x-values and y-values of points defining the first alignment mark and points defining the second alignment mark are averaged to determine a center of the first alignment mark and a center of the second alignment mark. An x-coordinate and a y-coordinate of the center of the first alignment mark is subtracted from the respective x-coordinate and y-coordinate of the center of the second alignment mark to determine a lateral misregistration between the first level and the second level.
    Type: Grant
    Filed: March 7, 2016
    Date of Patent: September 5, 2017
    Assignee: Micron Technology, Inc.
    Inventors: Yang Chao, Joseph L. Hess, Keith E. Ypma, Kurt J. Bossart
  • Publication number: 20120110944
    Abstract: A fastener for fastening at least a pair of elongated members to a support structure includes a first arm having a first portion sized to be received within an edge grove or a slot of one elongated member, a second portion disposed substantially perpendicular to the first portion and a third portion disposed at an acute angle to a surface of the support structure prior to use of the fastener, wherein the first portion extends in a first direction from the second portion. There is also a second arm having a portion thereof extending in a second direction being opposite to the first direction, the portion of the second arm is sized to be received within an edge grove or a slot of another elongated member juxtaposed with the one elongated member.
    Type: Application
    Filed: November 10, 2011
    Publication date: May 10, 2012
    Inventor: JOSEPH L. HESS