Patents by Inventor Joseph Laganza
Joseph Laganza has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 7339653Abstract: A method and apparatus for maintaining an optical gap between optical structures in a photolithography system is described. A frame defines first and second opposing surfaces. The first opposing surface defines a first opening and the second opposing surface defines a second opening. A plurality of spacing members are spaced apart on the first opposing surface around the first opening. The spacing members have substantially co-planar surfaces configured to mate with a surface of a first optical structure. A bonding agent seals a space around the first opening between the first opposing surface and the first optical structure. The frame thereby encloses the optical gap between the first optical structure and a second optical structure.Type: GrantFiled: February 6, 2007Date of Patent: March 4, 2008Assignee: ASML Holding N.V.Inventors: Joseph Laganza, Jorge Ivaldi
-
Patent number: 7278817Abstract: An apparatus and method of transferring and loading a reticle onto a receiving station (for example, a reticle exposure stage). The reticle is first retrieved from a storage facility with an end effector having a reticle plate coupled to a mounting plate. The mounting plate connects the end effector to a robotic arm. The reticle is aligned in an out-of-plane position in an off-line alignment station. The alignment is in compliance with the alignment requirement at the receiving station. The reticle is mounted onto the reticle plate after undergoing the alignment at the off-line alignment station. The reticle is then transferred from the off-line alignment station to the receiving station while maintaining the previous alignment at the off-line alignment station. The apparatus further provides rigidity of the mounted reticle to ensure compliance with the alignment requirement at the receiving station.Type: GrantFiled: January 24, 2006Date of Patent: October 9, 2007Assignee: ASML Holding N.V.Inventors: Glenn M. Friedman, Peter Kochersperger, Joseph Laganza
-
Publication number: 20070127000Abstract: A method and apparatus for maintaining an optical gap between optical structures in a photolithography system is described. A frame defines first and second opposing surfaces. The first opposing surface defines a first opening and the second opposing surface defines a second opening. A plurality of spacing members are spaced apart on the first opposing surface around the first opening. The spacing members have substantially co-planar surfaces configured to mate with a surface of a first optical structure. A bonding agent seals a space around the first opening between the first opposing surface and the first optical structure. The frame thereby encloses the optical gap between the first optical structure and a second optical structure.Type: ApplicationFiled: February 6, 2007Publication date: June 7, 2007Applicant: ASML HOLDING N.V.Inventors: Joseph Laganza, Jorge Ivaldi
-
Patent number: 7173689Abstract: A method and apparatus for maintaining an optical gap between optical structures in a photolithography system is described. A frame defines first and second opposing surfaces. The first opposing surface defines a first opening and the second opposing surface defines a second opening. A plurality of spacing members are spaced apart on the first opposing surface around the first opening. The spacing members have substantially co-planar surfaces configured to mate with a surface of a first optical structure. A bonding agent seals a space around the first opening between the first opposing surface and the first optical structure. The frame thereby encloses the optical gap between the first optical structure and a second optical structure.Type: GrantFiled: November 12, 2004Date of Patent: February 6, 2007Assignee: ASML Holding N.V.Inventors: Joseph Laganza, Jorge Ivaldi
-
Publication number: 20060182605Abstract: An apparatus and method of transferring and loading a reticle onto a receiving station (for example, a reticle exposure stage). The reticle is first retrieved from a storage facility with an end effector having a reticle plate coupled to a mounting plate. The mounting plate connects the end effector to a robotic arm. The reticle is aligned in an out-of-plane position in an off-line alignment station. The alignment is in compliance with the alignment requirement at the receiving station. The reticle is mounted onto the reticle plate after undergoing the alignment at the off-line alignment station. The reticle is then transferred from the off-line alignment station to the receiving station while maintaining the previous alignment at the off-line alignment station. The apparatus further provides rigidity of the mounted reticle to ensure compliance with the alignment requirement at the receiving station.Type: ApplicationFiled: January 24, 2006Publication date: August 17, 2006Applicant: ASML Holding N.V.Inventors: Glenn Friedman, Peter Kochersperger, Joseph Laganza
-
Publication number: 20060109448Abstract: A method is provided to reduce differences between the way in which reticle chucking forces and gravity force act upon the reticle during use and during assembly of the pellicle, and to combine this with a similar reduction concerning pellicle chucking forces and gravity force acting upon the pellicle during bonding to the reticle and during quality control of the pellicle. The shape of the pellicle is measured for control in the same orientation of the pellicle with respect to gravity force as during use of the pellicle, and during bonding the pellicle and the reticle are held in the same way and in the same orientation as during control of the pellicle and use of the reticle in the lithographic apparatus, respectively.Type: ApplicationFiled: November 23, 2004Publication date: May 25, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Richard Bruls, Joseph Laganza, Tammo Uitterdijk, Herman Boom
-
Patent number: 7004715Abstract: An apparatus and method of transferring and loading a reticle onto a receiving station (for example, a reticle exposure stage). The reticle is first retrieved from a storage facility with an end effector having an reticle plate coupled to a mounting plate. The mounting plate connects the end effector to a robotic arm. The reticle is aligned in an out-of-plane position in an off-line alignment station. The alignment is in compliance with the alignment requirement at the receiving station. The reticle is mounted onto the reticle plate after undergoing the alignment at the off-line alignment station. The reticle is then transferred from the off-line alignment station to the receiving station while maintaining the previous alignment at the off-line alignment station. The apparatus further provides rigidity of the mounted reticle to ensure compliance with the alignment requirement at the receiving station.Type: GrantFiled: January 9, 2002Date of Patent: February 28, 2006Assignee: ASML Holding N.V.Inventors: Glenn M. Friedman, Peter Kochersperger, Joseph Laganza
-
Publication number: 20050151955Abstract: A method and apparatus for maintaining a purged optical gap between a pellicle and a reticle in a photolithography system. A frame between a reticle and a pellicle maintains the purged optical gap. The frame defines first and second opposing surfaces. The first opposing surface defines a first opening, and is configured to mate with the pellicle. The second opposing surface defines a second opening, and is configured to mate with the reticle to enclose the optical gap between the pellicle and the reticle. At least one edge of the frame has an opening therethrough. A porous sintered material fills each opening through an edge of the frame.Type: ApplicationFiled: January 13, 2005Publication date: July 14, 2005Applicant: ASML Holding N.V.Inventors: Joseph Laganza, Jorge Ivaldi, Florence Luo
-
Publication number: 20050088637Abstract: A method and apparatus for maintaining an optical gap between optical structures in a photolithography system is described. A frame defines first and second opposing surfaces. The first opposing surface defines a first opening and the second opposing surface defines a second opening. A plurality of spacing members are spaced apart on the first opposing surface around the first opening. The spacing members have substantially co-planar surfaces configured to mate with a surface of a first optical structure. A bonding agent seals a space around the first opening between the first opposing surface and the first optical structure. The frame thereby encloses the optical gap between the first optical structure and a second optical structure.Type: ApplicationFiled: November 12, 2004Publication date: April 28, 2005Inventors: Joseph Laganza, Jorge Ivaldi
-
Patent number: 6847434Abstract: A method and apparatus for maintaining a purged optical gap between a pellicle and a reticle in a photolithography system. A frame between a reticle and a pellicle maintains the purged optical gap. The frame defines first and second opposing surfaces. The first opposing surface defines a first opening, and is configured to mate with the pellicle. The second opposing surface defines a second opening, and is configured to mate with the reticle to enclose the optical gap between the pellicle and the reticle. At least one edge of the frame has an opening therethrough. A porous sintered material fills each opening through an edge of the frame.Type: GrantFiled: December 9, 2002Date of Patent: January 25, 2005Assignee: ASML Holding N.V.Inventors: Joseph Laganza, Jorge Ivaldi, Florence Luo
-
Patent number: 6822731Abstract: A method and apparatus for maintaining an optical gap between optical structures in a photolithography system is described. A frame defines first and second opposing surfaces. The first opposing surface defines a first opening and the second opposing surface defines a second opening. A plurality of spacing members are spaced apart on the first opposing surface around the first opening. The spacing members have substantially co-planar surfaces configured to mate with a surface of a first optical structure. A bonding agent seals a space around the first opening between the first opposing surface and the first optical structure. The frame thereby encloses the optical gap between the first optical structure and a second optical structure.Type: GrantFiled: June 18, 2003Date of Patent: November 23, 2004Assignee: ASML Holding N.V.Inventors: Joseph Laganza, Jorge Ivaldi
-
Publication number: 20030129051Abstract: An apparatus and method of transferring and loading a reticle onto a receiving station (for example, a reticle exposure stage). The reticle is first retrieved from a storage facility with an end effector having an reticle plate coupled to a mounting plate. The mounting plate connects the end effector to a robotic arm. The reticle is aligned in an out-of-plane position in an off-line alignment station. The alignment is in compliance with the alignment requirement at the receiving station. The reticle is mounted onto the reticle plate after undergoing the alignment at the off-line alignment station. The reticle is then transferred from the off-line alignment station to the receiving station while maintaining the previous alignment at the off-line alignment station. The apparatus further provides rigidity of the mounted reticle to ensure compliance with the alignment requirement at the receiving station.Type: ApplicationFiled: January 9, 2002Publication date: July 10, 2003Applicant: ASML US, Inc.Inventors: Glenn M. Friedman, Peter Kochersperger, Joseph Laganza
-
Publication number: 20030123042Abstract: A method and apparatus for maintaining a purged optical gap between a pellicle and a reticle in a photolithography system. A frame between a reticle and a pellicle maintains the purged optical gap. The frame defines first and second opposing surfaces. The first opposing surface defines a first opening, and is configured to mate with the pellicle. The second opposing surface defines a second opening, and is configured to mate with the reticle to enclose the optical gap between the pellicle and the reticle. At least one edge of the frame has an opening therethrough. A porous sintered material fills each opening through an edge of the frame.Type: ApplicationFiled: December 9, 2002Publication date: July 3, 2003Inventors: Joseph Laganza, Jorge Ivaldi, Florence Luo
-
Patent number: 5727685Abstract: A cassette or box for containing and holding a planar substrate such as a reticle having a clamp bar coupled to corner supports by a spring or flexure and a linkage. A clamp bar is pivotally attached to bottom corner supports and a spring or flexure and linked to a top corner support, such that movement of the load bar causes the corner supports to pivot away from a reticle being held only at the corners. An elevation bar is also used to preposition the reticle in one direction. The present invention greatly facilitates the positioning and handling of a reticle as used in photolithography to manufacture semiconductor devices. Additionally, the present invention greatly reduces particulate contamination.Type: GrantFiled: July 24, 1996Date of Patent: March 17, 1998Assignee: SVG Lithography Systems, Inc.Inventors: Joseph Laganza, Hoon-Yeng Yap, Teodorico A. Cruz, Erik Magnussen, Craig S. Dunning