Abstract: An agricultural harvester including a header assembly, includes: a multicoupler storage assembly including: a multicoupler assembly including a plurality of at least one of hydraulic connectors and electrical connectors; and a cradle mechanism configured for storing the multicoupler assembly and for selectively pivoting between a receiving position associated with the cradle mechanism receiving the multicoupler assembly and a storage position associated with the cradle mechanism storing the multicoupler assembly.

Abstract: A laser tag gaming system is provided comprising a plurality of laser tag gaming apparatuses. Each laser tag gaming apparatus has a laser tag gun and a laser tag target, which can be wirelessly paired to one another. Gaming functionality can only be achieved upon receipt of a successful pair condition at a pairing circuit of each of the laser tag gun and laser tag target, which is lost if either of the laser tag gun and laser tag target is deactivated. This reduces the chances of players cheating by resetting their laser tag target.

Abstract: A draper cutting platform for use with an agricultural harvester includes a pair of side platform sections, with each side platform section including a side belt. A center platform section is disposed in an area between the side platform sections. The center platform section includes at least one alignment device and at least one latch. A center conveyor assembly is removably attached to the center platform section, and carries a center belt. The center conveyor assembly includes at least one mating alignment device and at least one mating latch.

Abstract: A draper cutting platform for use with an agricultural harvester includes a pair of side platform sections, with each side platform section including a side belt. A center platform section is disposed in an area between the side platform sections. The center platform section includes at least one alignment device and at least one latch. A center conveyor assembly is removably attached to the center platform section, and carries a center belt. The center conveyor assembly includes at least one mating alignment device and at least one mating latch.

Abstract: The present invention relates to a negative photoresist composition comprising, a) at least one alkali-soluble polymer, where the polymer comprises at least one unit of structure 1, where, R? is selected independently from hydrogen, (C1-C4)alkyl, chlorine, bromine and m is an integer from 1 to 4; b) at least one monomer of structure 1, where, W is a multivalent linking group, R1 to R6 are independently selected from hydrogen, hydroxyl, (C1-C20) alkyl and chlorine, X1 and X2 are independently oxygen or N—R7, where R7 is hydrogen or (C1-C20) alkyl, and n is and integer equal to or greater than 1, and c) at least one photoinitiator. The invention also relates to a process for imaging the negative photoresist composition.

Abstract: The present invention provides a polysilazane-treating solvent which has excellent dissolving power and stability, has no influence on a substrate as an underlying layer and the properties of a polysilazane, is excellent in shape of cut edge, and further has high safety to the human body. The treating solvent comprises a solvent selected from the group consisting of tetralin, p-menthane, p-cymene, ?-pinene, 1,8-cineol, and mixtures thereof, and a polysilazane treatment method using the same. This solvent may further comprise a solvent selected from the group consisting of aliphatic hydrocarbons, alicyclic hydrocarbons, and mixtures thereof.

Abstract: The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.

Abstract: The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.

Abstract: The present invention relates to bottom antireflective coatings.

Abstract: The present invention relates to a negative photoresist composition comprising, a) at least one alkali-soluble polymer, where the polymer comprises at least one unit of structure 1, where, R? is selected independently from hydrogen, (C1-C4)alkyl, chlorine, bromine and m is an integer from 1 to 4; b) at least one monomer of structure 1, where, W is a multivalent linking group, R1 to R6 are independently selected from hydrogen, hydroxyl, (C1-C20) alkyl and chlorine, X1 and X2 are independently oxygen or N—R7, where R7 is hydrogen or (C1-C20) alkyl, and n is and integer equal to or greater than 1, and c) at least one photoinitiator. The invention also relates to a process for imaging the negative photoresist composition.

Abstract: The present invention relates to an undercoating composition for a photoresist comprising a polymer which is insoluble in an aqueous alkali developer but becomes soluble prior to development, and a photoacid generator which produces a strong acid upon exposure to radiation, and further where the polymer is transparent at the exposure radiation. The invention also relates to a process for imaging the undercoating composition.

Abstract: Disclosed is a process for forming an image on a substrate, comprising the steps of: (a) coating on the substrate a first layer of a radiation sensitive, antireflective composition; (b) coating a second layer of a photoresist composition onto the first layer of the antireflective composition; (c) selectively exposing the coated substrate from step (b) to actinic radiation; and (d) developing the exposed coated substrate from step (c) to form an image; wherein both the photoresist composition and the antireflective composition are exposed in step (c); both are developed in step (d) using a single developer; wherein the antireflective composition of step (a) is a first minimum bottom antireflective coating (B.A.R.C.) composition, having a solids content of up to about 8% solids, and a maximum coating thickness of the coated substrate of ?/2n wherein ? is the wavelength of the actinic radiation of step (c) and n is the refractive index of the B.A.R.C. composition.

Abstract: The present invention relates to novel negative-working, photoimageable, and aqueous developable antireflective coating compositions and their use in image processing by forming a thin layer of the novel antireflective coating composition between a reflective substrate and a photoresist coating. The negative bottom photoimageable antireflective coating composition is capable of being developed in an alkaline developer and is coated below a negative photoresist.

Abstract: The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.

Abstract: The present invention relates to bottom antireflective coatings.