Abstract: A trocar assembly can include a cannula, a seal cartridge, and an obturator. The seal cartridge is configured to be releasably coupled to the cannula and to be disposed at least partially within the cannula in a coupled configuration of the seal cartridge. The obturator is configured to directly latch to the cannula and to extends through the cannula and the seal cartridge in a coupled configuration of the obturator.

Abstract: A method is described for determining lens aberrations using a test reticle and a standard metrology tool. The method provides test patterns, preferably in the form of standard overlay metrology test patterns, that include blazed gratings having orientation and pitch selected to sample desired portions of the lens pupil. The method measures relative shifts in the imaged test patterns using standard metrology tools to provide both magnitude and sign of the aberrations. The metrology tools need not be modified if standard test patterns are used, but can be adapted to obtain additional information. The test reticles may be formed with multiple test patterns having a range of orientations and pitch in order to compute any desired order of lens aberration. Alternatively, single test patterns may be used to determine both the magnitude and sign of lower order lens aberrations, such as defocus or coma.

Abstract: A method is described for determining lens aberrations using a test reticle and a standard metrology tool. The method provides test patterns, preferably in the form of standard overlay metrology test patterns, that include blazed gratings having orientation and pitch selected to sample desired portions of the lens pupil. The method measures relative shifts in the imaged test patterns using standard metrology tools to provide both magnitude and sign of the aberrations. The metrology tools need not be modified if standard test patterns are used, but can be adapted to obtain additional information. The test reticles may be formed with multiple test patterns having a range of orientations and pitch in order to compute any desired order of lens aberration. Alternatively, single test patterns may be used to determine both the magnitude and sign of lower order lens aberrations, such as defocus or coma.

Abstract: Exposures of a photosensitive material through an array of blazed gratings illuminate a lens asymmetrically to detect effects of a plurality of azimuthal aberrations including coma, astigmatism, and three-leaf and four-leaf clover aberrations. A plurality of such exposures of the array of blazed gratings at slightly differing focus allows detection of focus shift due to any aberrations present in the lens. Upon development of the plurality of exposures, contrast of each area is measured, for example, by reflection or scattering from the relief in the developed photosensitive material and the aberrations thus detected can be simulated by effective summation of individual aberration effects.

Abstract: A test photomask comprising a fresnel zone target (FZT) pattern may be used to verify the adjustment of a precision projector illumination system of an image projection system. The method comprises the steps of creating the FZT pattern on a photomask, projecting a pupil diagram onto an image plane using the FZT pattern, and evaluating the pupil diagram to determine the illumination system adjustment.

Abstract: A device to measure a phase shift of a step in a reticle is disclosed. The phase shift measuring device has a common path interferometer for receiving light from a light source and providing two point images separated from each other by an adjustable distance. A microscope having an objective focuses two point images to form two focused points along a reticle surface of the reticle. The reticle is moved between first and second positions, wherein at the first position, light beams from the two focused points enter the reticle surface, and wherein at the second position, the light beams from the two focused points enter a step surface of the step A detector receives light from the reticle for detection of the step phase shift.

Abstract: The preferred embodiments of the present invention provide a method and apparatus for visually inspecting features on a wafer that are smaller than can be optically resolved using normally using visible light. By providing a method for visually inspecting the features, the overall performance of the fabrication system can be determined. The preferred method patterns resist with two patterns having different spatial frequencies. The patterns combine to form a pattern in the resist that exhibits Moire beats. The Moire beat spatial frequency of the resulting pattern is significantly lower than the two spatial frequencies used, and thus can be visually inspected using light in the visible regions.

Abstract: An optical system and technique for monitoring a monotonic change in the thickness of a transparent film by means of optical interference, and for eliminating ambiguity in the identification of absolute film thickness. The system is particularly adapted for monitoring the etching of a dielectric film of uncertain initial thickness in microelectronic fabrication. The technique utilizes a white light source directed upon the film. Reflected light, modified by optical interference in the dielectric film, is monitored by photodetectors at two distinct wavelengths. The cyclic patterns of intensity change at the two wavelengths are compared to identify unambiguously the absolute thickness of the film, although the initial uncertainty in film thickness may have corresponded to several cycles of either wavelength pattern alone.

Abstract: An improved interferometer system for detecting the etch rate of an opaque material, such as silicon or metal. The system includes means for producing two parallel beams of light, with one beam being directed to the surface of the opaque material, and the other beam being directed to the surface of an adjacent masking material of transparent nature. The rate of etch of the opaque material is detected from the interference pattern changes between the first beam and the second beam. The system utilizes a novel arrangement of beam splitters which results in equal path lengths for the respective beams and further includes a viewing light which is passed by a system of dichroic filters to enable observation of the focus spot.

Abstract: The present invention is directed to an optical system particularly adapted for measuring the linewidth of conductors. The particular arrangement of the various components of the optical system provide a simple system with high resolution for use in measuring very small linewidths. The optical system of the present invention utilizes a DC signal which is simpler and easier to control than an AC signal used with some optical measurement systems. More particularly, the optical system of the present invention utilizes a principle used for accurate focusing or for topographical measurements to enhance the ability of the optical system to measure small linewidths.The optical system of the claimed invention includes a high intensity light source 18, such as a laser. Means are provided for defining and focusing a spot of the light source upon a surface 12 having features to be measured.